Multiple laser beam interference allows to produce periodic light patterns in the order of the wavelength of light. A simulation program helps to identify different patterns and to investigate the influence of changing parameters such as e.g. the angle of incidence or the polarization. A positive photoresist (Shipley S1805) is used to create two-dimensional metallic photonic crystals by UV interference lithography.
Identifer | oai:union.ndltd.org:vtechworks.lib.vt.edu/oai:vtechworks.lib.vt.edu:10919/71551 |
Date | 12 1900 |
Creators | Mellert, Karolin |
Contributors | Applied optics |
Publisher | Rheinische Friedrich-Wilhelms-Universität Bonn |
Source Sets | VTechWorks NDLTD ETDs |
Language | German |
Detected Language | English |
Type | Thesis |
Format | application/pdf, application/pdf |
Rights | In Copyright, http://rightsstatements.org/vocab/InC/1.0/ |
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