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Microstructural characterization of titanium nitride and aluminum alloy thin films as a function of variation in processing parameters in silicon based semiconductor devices

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1. https://stars.library.ucf.edu/rtd/2107

Identifer	oai:union.ndltd.org:ucf.edu/oai:stars.library.ucf.edu:rtd-3106
Date	01 January 1999
Creators	Drown MacDonald, Jennifer L.
Publisher	STARS
Source Sets	University of Central Florida
Language	English
Detected Language	English
Type	text
Source	Retrospective Theses and Dissertations