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Modeling, optimization, and control of via formation by photosensitive polymers for MCM-D applications

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Identiferoai:union.ndltd.org:GATECH/oai:smartech.gatech.edu:1853/15017
Date12 1900
CreatorsKim, Tae Seon
PublisherGeorgia Institute of Technology
Source SetsGeorgia Tech Electronic Thesis and Dissertation Archive
Detected LanguageEnglish
TypeDissertation
RightsAccess restricted to authorized Georgia Tech users only.

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