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Depozice Ga a GaN nanostruktur na grafenový substrát / Depositon Ga and GaN nanostructures on graphen substrate

This diploma thesis is focused on deposition Ga and GaN structures on graphene fabricated by method of mechanical exfoliation. For mechanical exfoliation was used new method with using DGL Gel-Film with kinetically controlled adhesion. Ga is deposited by Molecular beam epitaxy with using eusion cell in UHV conditions. GaN was obtained by post-nitridation of Ga islands. These structures were investigated with optical microscope, SEM, Raman spectroscopy and photoluminiscence.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:319287
Date January 2017
CreatorsHammerová, Veronika
ContributorsVáňa, Rostislav, Mach, Jindřich
PublisherVysoké učení technické v Brně. Fakulta strojního inženýrství
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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