Various carbon content hydrogenated amorphous silicon carbide (a-Si1¡ / xCx:H)
and hydrogenated amorphous silicon (a-Si:H) thin films have been deposited
on various substrates by using plasma enhanced chemical vapour deposition
(PECVD) technique. Transmission spectra of these films have been determined
within UV-Visible region and the obtained data were analysed to find related
physical constants such as / refractive indices, thicknesses, etc. Fourier transform
infrared (FT-IR) spectrometry technique has been used to determine transmission
& / reflection type spectra of these films. Obtained data were analysed to
determine bond structures of the films. E® / ects of relative concentration of ethylene
(C2H4) gas on thin film bond structure and on optical constants have been
questioned.
| Identifer | oai:union.ndltd.org:METU/oai:etd.lib.metu.edu.tr:http://etd.lib.metu.edu.tr/upload/2/12607013/index.pdf |
| Date | 01 January 2006 |
| Creators | Kilic, Ilker |
| Contributors | Katircioglu, Bayram |
| Publisher | METU |
| Source Sets | Middle East Technical Univ. |
| Language | English |
| Detected Language | English |
| Type | M.S. Thesis |
| Format | text/pdf |
| Rights | To liberate the content for METU campus |
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