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Influence of the plasma chemistry and energetics on the composition and structure evolution of sputtered oxide thin films

Zugl.: Aachen, Techn. Hochsch., Diss., 2006

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/162428911
Date January 2006
CreatorsMráz, Stanislav
PublisherAachen Shaker
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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