Multiple laser beam interference allows to produce periodic light patterns in the order of the wavelength of light. A simulation program helps to identify different patterns and to investigate the influence of changing parameters such as e.g. the angle of incidence or the polarization. A positive photoresist (Shipley S1805) is used to create two-dimensional metallic photonic crystals by UV interference lithography.
| Identifer | oai:union.ndltd.org:vtechworks.lib.vt.edu/oai:vtechworks.lib.vt.edu:10919/71551 |
| Date | 12 1900 |
| Creators | Mellert, Karolin |
| Contributors | Applied optics |
| Publisher | Rheinische Friedrich-Wilhelms-Universität Bonn |
| Source Sets | VTechWorks NDLTD ETDs |
| Language | German |
| Detected Language | English |
| Type | Thesis |
| Format | application/pdf, application/pdf |
| Rights | In Copyright, http://rightsstatements.org/vocab/InC/1.0/ |
Page generated in 0.1614 seconds