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The Analysis of Ti Nano-Films Prepared by Ion Beam Deposition

Ti nano-films are deposited on a NaCl(001) single crystal substrate by ion beam sputtering from a Ti target, and then annealed. Ti crystallites on a NaCl(001) substrate with increase in the substrate temperature and annealing have the preferred orientation (1-101) and (0001).

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0721105-175517
Date21 July 2005
CreatorsChang, Han-yun
ContributorsHsing-lu Huang, Der-shin Gan, Pou-yan Shen
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0721105-175517
Rightscampus_withheld, Copyright information available at source archive

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