Return to search

Electron beam induced carbon nanomasking used for selective electrochemical reactions on semiconductor surfaces

Erlangen, Nürnberg, University, Diss., 2002. / Dateien im PDF-Format.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/76652121
Date January 1900
CreatorsDjenizian, Thierry.
Publisher[S.l. : s.n.,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceLF

Page generated in 0.0016 seconds