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Filmes finos de carbono depositados por meio da técnica de magnetron sputtering usando cobalto, cobre e níquel como buffer-layers / Carbon thin films deposited by the magnetron sputtering technique using cobalt, copper and nickel as buffer-layers

Submitted by Maria Eneide de Souza Araujo (mearaujo@ipen.br) on 2015-10-08T12:18:50Z
No. of bitstreams: 0 / Made available in DSpace on 2015-10-08T12:18:50Z (GMT). No. of bitstreams: 0 / Dissertação (Mestrado em Tecnologia Nuclear) / IPEN/D / Instituto de Pesquisas Energeticas e Nucleares - IPEN-CNEN/SP

Identiferoai:union.ndltd.org:IBICT/oai:10.40.40.102:123456789/23916
Date08 October 2015
CreatorsCOSTA e SILVA, DANILO L.
ContributorsOrientador: Marina Fuser Pillis
Source SetsIBICT Brazilian ETDs
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/publishedVersion, info:eu-repo/semantics/masterThesis
Format70
Sourcereponame:Repositório Institucional do IPEN, instname:Instituto de Pesquisas Energéticas e Nucleares, instacron:IPEN
CoverageN
Rightsinfo:eu-repo/semantics/openAccess

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