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Range, damage and annealing investigations for boron implanted at low energy into silicon

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1. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.293830

Identifer	oai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:293830
Date	January 1990
Creators	Valizadeh, Reza
Publisher	University of Salford
Source Sets	Ethos UK
Detected Language	English
Type	Electronic Thesis or Dissertation