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Deposition and characterization of thin film CuAlSe2

We use molecular beam deposition (MBD) system to grow CuAlSe2 thin film. The films have been characterized by electrical measurements but also by X-ray diffraction, electron probe microanalysis, optical measurements, scanning electron microscopy and photoluminescence. It is shown that CuAlSe2 thin film is chalcopyrite structure with a band gap of 2.65eV, p-type conductivity and the smallest resistivity is 1.26¡Ñ102(

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0720104-180419
Date20 July 2004
CreatorsTsai, Shiang-hui
ContributorsBae-heng Tseng, Bing-hwait Hwang, Huey-liang Hwang, Mau-phon Houng
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0720104-180419
Rightsnot_available, Copyright information available at source archive

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