A study on electrical and material characteristics of hafnium oxide with silicon interface passivation on III-V substrate for future scaled CMOS technology

Description

Thesis (Ph. D.)--University of Texas at Austin, 2008. / Vita. Includes bibliographical references.

Links & Downloads

1. http://www.lib.utexas.edu/etd/d/2008/oki43579/oki43579.pdf#page=3

Tags

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/244251100
Date	January 1900
Creators	Ok, Injo,
Publisher	[Austin, Tex. : University of Texas Libraries,
Source Sets	OCLC
Language	English
Detected Language	English