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Impact of strain on electronic defects in (Mg,Zn)O thin films

We have investigated the impact of strain on the incorporation and the properties of extended and
point defects in (Mg,Zn)O thin films by means of photoluminescence, X-ray diffraction, deep-level
transient spectroscopy (DLTS), and deep-level optical spectroscopy. The recombination line Y2,
previously detected in ZnO thin films grown on an Al-doped ZnO buffer layer and attributed to tensile
strain, was exclusively found in (Mg,Zn)O samples being under tensile strain and is absent in
relaxed or compressively strained thin films. Furthermore a structural defect E3′ can be detected
via DLTS measurements and is only incorporated in tensile strained samples. Finally it is shown
that the omnipresent deep-level E3 in ZnO can only be optically recharged in relaxed ZnO samples.

Identiferoai:union.ndltd.org:DRESDEN/oai:qucosa:de:qucosa:31192
Date09 August 2018
CreatorsSchmidt, Florian, Müller, Stefan, von Wenckstern, Holger, Benndorf, Gabriele, Pickenhain, Rainer, Grundmann, Marius
PublisherAmerican Institute of Physics, Universität Leipzig
Source SetsHochschulschriftenserver (HSSS) der SLUB Dresden
LanguageEnglish
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/publishedVersion, doc-type:article, info:eu-repo/semantics/article, doc-type:Text
Rightsinfo:eu-repo/semantics/openAccess
Relation0021-8979, 1089-7550, 103703

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