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Nitreta??o em plasma com gaiola cat?dica: investiga??o do mecanismo e estudo comparativo com a nitreta??o em plasma de tens?o cont?nua

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Previous issue date: 2007-12-18 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior / The ionic plasma nitriding is one of the most important plasma assisted treatment technique for surface modification, but it presents some inherent problems mainly in nitriding
pieces with complex geometries. In the last four years has appeared a plasma nitriding technique, named ASPN (Active Screen Plasma Nitriding) in which the samples and the
workload are surrounded by a metal screen on which the cathodic potential is applied. This new technique makes possible to obtain a perfect uniform nitrided layer apart from the shape of the samples. The present work is based on the development of a new nitriding plasma technique named CCPN (Cathodic Cage Plasma Nitriding) Patent PI 0603213-3 derived from ASPN, but utilizes the hollow cathode effect to increase the nitriding process efficiency. That technique has shown great improvement on the treatment of several types of steels under different process conditions, producing thicker and harder layers when compared with both, ASPN and ionic plasma nitriding, besides eliminating problems associated with the later technique. The best obtained results are due to the hollow cathode effect on the cage holes. Moreover, characteristic problems of ionic plasma nitriding are eliminated due to the fact that the luminescent discharge acts on the cage wall instead of on the samples surface, which
remains under a floating potential. In this work the enhancement of the cathodic cage nitriding layers proprieties, under several conditions for some types of steels was investigated, besides the mechanism for nitrides deposition on glass substrate, concluding that the CCPN is both a diffusion and a deposition process at the same time / A nitreta??o i?nica ? um dos processos de revestimento superficial dos mais importantes, mas apresenta alguns problemas inerentes, principalmente, na nitreta??o de pe?as com geometria complexa. Nos ?ltimos quatro anos surgiu uma nova t?cnica de nitreta??o a plasma, denominada de ASPN (Active Screen Plasma Nitriding), na qual as amostras s?o envolvidas por uma tela polarizada catodicamente e com ela ? poss?vel obter uma camada nitretada, perfeitamente uniforme, independente da forma da amostra. O nosso trabalho
baseia-se no desenvolvimento, no ?mbito do LabPlasma, de uma nova t?cnica de nitreta??o em plasma, denominada nitreta??o em gaiola cat?dica (NGC) dep?sito de patente PI 0603213-3 derivada da ASPN, mas que utiliza o efeito de c?todo oco para aumentar a efici?ncia do processo de nitreta??o. Esta t?cnica apresentou bastante efic?cia na nitreta??o de v?rios tipos de a?os, nas mais variadas condi??es de tratamento, proporcionando a obten??o
de camadas mais espessas e de maior dureza, quando comparada com a ASPN e com a nitreta??o i?nica convencional, al?m de eliminar problemas de irregularidades associados ? t?cnica convencional. Sua maior efici?ncia deve-se ? utiliza??o do efeito de c?todo oco estabelecido nas paredes dos furos da gaiola, enquanto que a elimina??o dos problemas inerentes ? t?cnica convencional, deve-se ao fato do plasma atuar na gaiola e n?o nas amostras, as quais permanecem em potencial flutuante. Neste trabalho, foram avaliadas as condi??es de otimiza??o da nitreta??o, realizada com esta t?cnica, para diferentes tipos de a?os, al?m de investigarmos os mecanismos que atuam, quando da deposi??o de nitretos em substratos de vidro, observando que a NGC ? um processo misto de difus?o e deposi??o

Identiferoai:union.ndltd.org:IBICT/oai:repositorio.ufrn.br:123456789/12709
Date18 December 2007
CreatorsSousa, R?mulo Ribeiro Magalh?es de
ContributorsCPF:09621199468, http://lattes.cnpq.br/7441669258580942, Ara?jo, Francisco Odolberto de, CPF:80752730444, Gomes, Uilame Umbelino, CPF:05012180410, http://lattes.cnpq.br/9858094266525225, Maciel, Homero Santiago, CPF:22218645653, http://lattes.cnpq.br/6357563570334700, Costa, Jos? Alzamir Pereira da, CPF:16357671720, http://lattes.cnpq.br/5592146590288686, Souza, Roberto Silva de, CPF:44466927472, http://lattes.cnpq.br/4012782800846844, Alves J?nior, Clodomiro
PublisherUniversidade Federal do Rio Grande do Norte, Programa de P?s-Gradua??o em Ci?ncia e Engenharia de Materiais, UFRN, BR, Processamento de Materiais a partir do P?; Pol?meros e Comp?sitos; Processamento de Materiais a part
Source SetsIBICT Brazilian ETDs
LanguagePortuguese
Detected LanguagePortuguese
Typeinfo:eu-repo/semantics/publishedVersion, info:eu-repo/semantics/doctoralThesis
Formatapplication/pdf
Sourcereponame:Repositório Institucional da UFRN, instname:Universidade Federal do Rio Grande do Norte, instacron:UFRN
Rightsinfo:eu-repo/semantics/openAccess

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