Submitted by Automa??o e Estat?stica (sst@bczm.ufrn.br) on 2016-01-26T17:36:30Z No. of bitstreams: 1 ThiagoVictorRodriguesDeMedeiros_DISSERT.pdf: 3828773 bytes, checksum: a71182f41a89dc6ac4d09bef70dac843 (MD5) / Approved for entry into archive by Arlan Eloi Leite Silva (eloihistoriador@yahoo.com.br) on 2016-01-27T21:54:39Z (GMT) No. of bitstreams: 1 ThiagoVictorRodriguesDeMedeiros_DISSERT.pdf: 3828773 bytes, checksum: a71182f41a89dc6ac4d09bef70dac843 (MD5) / Made available in DSpace on 2016-01-27T21:54:39Z (GMT). No. of bitstreams: 1 ThiagoVictorRodriguesDeMedeiros_DISSERT.pdf: 3828773 bytes, checksum: a71182f41a89dc6ac4d09bef70dac843 (MD5) Previous issue date: 2014-11-20 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior - CAPES / Conselho Nacional de Desenvolvimento Cient?fico e Tecnol?gico - CNPq / A nitreta??o por plasma vem sendo utilizada nas aplica??es industriais e tecnol?gicas em larga escala por apresentar uma melhora nas propriedades mec?nicas, tribol?gicas, dentre outras. A fim de solucionar problemas decorrentes na nitreta??o convencional, como por exemplo, os an?is de restri??o (efeito de borda), foram desenvolvidos t?cnicas com catodos diferenciados. No presente trabalho, estudou-se superf?cies de tit?nio comercialmente puro (Grau II), modificadas por tratamento de nitreta??o a plasma atrav?s de diferentes configura??es de c?todos (catodo oco, gaiola cat?dica com uma gaiola e gaiola cat?dica com duas gaiolas) variando a temperatura em 350, 400 e 430oC, com o objetivo de obter uma otimiza??o da superf?cie para aplica??es tecnol?gicas, avaliando de forma geral qual o tratamento mostrou melhores resultados no substrato. As amostras foram caracterizadas atrav?s das t?cnicas de ensaios de Microscopia de For?a At?mica (AFM), Espectroscopia Raman, Microdureza, Difra??o de Raios-X (DRX), al?m de uma an?lise macrosc?pica. Desta forma, puderam-se avaliar propriedades do tratamento como rugosidade, topografia, presen?a de elementos intersticiais, dureza, homogeneidade, uniformidade e espessura da camada nitretada. Observou-se que todas as amostras expostas a nitreta??o foram modificadas em rela??o ? amostra padr?o (sem tratamento), logo, apresentando aumento da dureza superficial, presen?a de TiN constatadas tanto por DRX como por Raman, e uma altera??o significativa na rugosidade das amostras tratadas. Constatou-se que o tratamento em c?todo oco, apesar de apresentar o menor valor de microdureza entre as amostras tratadas, foi o que apresentou a menor rugosidade superficial, apesar de nessa configura??o as amostras sofrerem uma agressividade f?sica maior do tratamento. / The plasma nitriding has been used in industrial and technological applications for large-scale show an improvement in the mechanical, tribological, among others. In order to solve problems arising in the conventional nitriding, for example, rings constraint (edge effect) techniques have been developed with different cathodes. In this work, we studied surfaces of commercially pure titanium (Grade II), modified by plasma nitriding treatment through different settings cathodes (hollow cathode, cathodic cage with a cage and cathodic cage with two cages) varying the temperature 350, 400 and 430oC, with the goal of obtaining a surface optimization for technological applications, evaluating which treatment generally showed better results under the substrate. The samples were characterized by the techniques of testing for Atomic Force Microscopy (AFM), Raman spectroscopy, microhardness, X-ray diffraction (XRD), and a macroscopic analysis. Thus, we were able to evaluate the processing properties, such as roughness, topography, the presence of interstitial elements, hardness, homogeneity, uniformity and thickness of the nitrided layer. It was observed that all samples were exposed to nitriding modified relative to the control sample (no treatment) thus having increased surface hardness, the presence of TiN observed by XRD as per both Raman and a significant change in the roughness of the treated samples . It was found that treatment in hollow cathode, despite having the lowest value of microhardness between treated samples, was presented the lowest surface roughness, although this configuration samples suffer greater physical aggressiveness of treatment

Submitted by Automa??o e Estat?stica (sst@bczm.ufrn.br) on 2016-12-29T16:57:51Z No. of bitstreams: 1 RamsesOttoCunhaLima_TESE.pdf: 5128279 bytes, checksum: 673d7bbf7a9133df4af9de1eb8b9d2d9 (MD5) / Approved for entry into archive by Arlan Eloi Leite Silva (eloihistoriador@yahoo.com.br) on 2017-01-02T19:01:32Z (GMT) No. of bitstreams: 1 RamsesOttoCunhaLima_TESE.pdf: 5128279 bytes, checksum: 673d7bbf7a9133df4af9de1eb8b9d2d9 (MD5) / Made available in DSpace on 2017-01-02T19:01:32Z (GMT). No. of bitstreams: 1 RamsesOttoCunhaLima_TESE.pdf: 5128279 bytes, checksum: 673d7bbf7a9133df4af9de1eb8b9d2d9 (MD5) Previous issue date: 2016-06-10 / A demanda pelo aumento da produ??o na ind?stria de fabrica??o por usinagem tem conduzido a pesquisas que promovam a melhoria do desempenho das ferramentas de corte. Assim, cada vez mais, estas suportam as condi??es severas impostas pelo processo de usinagem. Entretanto, por melhor que estejam definidos os par?metros de corte adotados, a ferramenta ir? sofrer desgaste devido ?s solicita??es tribol?gicas do sistema e ter? que ser substitu?da, interrompendo a produ??o. Isto motivou o processo de revestimentos das mesmas com filmes duros que conferem ?s ferramentas propriedades que, somadas ?s do material do seu substrato, prolongam sua vida ?til. Estes revestimentos, geralmente s?o realizados de maneira est?tica, resultando na necessidade de mais de um tratamento de deposi??o para que um inserto seja completamente revestido. T?cnicas de deposi??o por plasma como ASPN (Nitreta??o ? Plasma em Tela Ativa) tem sido bem aceitas industrialmente por conseguirem resolver estes inconvenientes. A Nitreta??o a Plasma em Gaiola Cat?dica (CCPN), desenvolvida com base na ASPN, promovem melhor ades?o do revestimento no substrato sem a necessidade de uma limpeza pr?via r?gida e ainda permitem bom controle das fases depositadas pela produ??o de ?ons e, consequentemente, do efeito de c?todo oco. Por?m esta t?cnica ainda mant?m a limita??o de n?o permitir a aplica??o tridimensional do revestimento, ou seja, em todas as superf?cies da amostra, pr?tica comumente aplicada a insertos de metal duro para usinagem. Este trabalho tem por objetivo propor uma nova forma de deposi??o de revestimentos para estas ferramentas pela aplica??o da t?cnica de Nitreta??o a Plasma em Gaiola Cat?dica Rotat?ria (RCCPN). Esta nova t?cnica de deposi??o, baseada na CCPN, possibilita que todas as faces da amostra recebam o filme durante o mesmo tratamento, devido ? rota??o da gaiola em torno do eixo do reator, o que promove maior uniformidade ? camada depositada, al?m de permitir o tratamento em lotes de pe?as. Para tanto, insertos de metal duro para torneamento foram revestidos por pela t?cnica RCCPN, mantendo-se corrente, tens?o, press?o e propor??o dos gases fixos, e variando-se apenas o tempo do tratamento. Estes, foram conduzidos a ensaios de torneamento, bem como de caracteriza??o por microdureza Vickers, DRX com incid?ncia rasante e MEV/EDS para avalia??o das propriedades mec?nicas do revestimento e sua ades?o ao substrato, bem com uniformidade do filme depositado. Como resultado foi poss?vel obter camadas dos filmes depositados mais uniformes do que as verificadas em tratamento com CCPN, com valores de dureza 40% maiores do que as medidas em insertos sem revestimentos. / The demand for increased production in machining industry has led to research that promote the improvement of cutting tools performance. Thus, increasingly, they support the harsh conditions imposed by the machining process. However, as good as the adopted cutting parameters are set, the tool will wear out due to tribological applications of the system and will need replacement, interrupting production. This motivated the coating process of the cutting tools with films that confer them properties that, together with the material of its substrate, extends its useful life. Such coatings are generally performed in a static manner, resulting in the need for more than one deposition treatment to assure that an insert is completely coated.Plasma deposition techniques as ASPN (Active Screen Plasma Nitriding) solve these drawbacks and still allow optimal control of deposited phases. The Cathodic Cage Plasma Nitriding (CCPN) process, developed based on ASPN, promotes better adhesion of the coating to the substrate without the need for pre-cleaning and besides allow good control of the deposited phases for the production of ions and, consequently, the hollow cathode effect. But this technique still has the limitation of not allowing the tridimentional application of the coating on all surfaces of the sample, a practice commonly applied to carbide inserts for machining process. This research aims to propose a new way of coating deposition to these tools by the application of Rotary Cathodic Cage Plasma Nitriding (RCCPN). This novel deposition technique based on CCPN, enables all sample surfaces to receive the film during the same treatment, due to rotation of cage around the reactor axis, which promotes better uniformity to the deposited layer, besides it enables the treatment in batches. Therefore, cemented carbide inserts were coated by RCCPN process, keeping current, voltage, pressure, and proportion of gas fixed and varying only the treatment time. These were led to turning tests, as well as characterization by microhardness Vickers, XRD with oblique incidence angle and SEM/EDS to evaluate the mechanical properties of the coating and its adhesion to the substrate, as well as the uniformity of deposited film. As a result it was possible to obtain layers of more uniform deposited films than those observed in CCPN treatment, with hardness values 40% higher that the measures in uncoated inserts.

Submitted by Automa??o e Estat?stica (sst@bczm.ufrn.br) on 2017-09-19T20:22:47Z No. of bitstreams: 1 IgorOliveiraNascimento_TESE.pdf: 5575757 bytes, checksum: c19dabd04c4f5dd3dd95968e649af7af (MD5) / Approved for entry into archive by Arlan Eloi Leite Silva (eloihistoriador@yahoo.com.br) on 2017-09-20T21:21:32Z (GMT) No. of bitstreams: 1 IgorOliveiraNascimento_TESE.pdf: 5575757 bytes, checksum: c19dabd04c4f5dd3dd95968e649af7af (MD5) / Made available in DSpace on 2017-09-20T21:21:32Z (GMT). No. of bitstreams: 1 IgorOliveiraNascimento_TESE.pdf: 5575757 bytes, checksum: c19dabd04c4f5dd3dd95968e649af7af (MD5) Previous issue date: 2017-06-23 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior (CAPES) / Filmes finos de nitreto de tit?nio foram depositados em superf?cies de sil?cio e de vidro, utilizando as t?cnicas de deposi??o: descarga em Gaiola Cat?dica e Magnetron Sputtering, a fim de verificar a influ?ncia da corrente e da temperatura na taxa de deposi??o, na estequiometria dos filmes finos e nas propriedades estruturais dos filmes finos. As deposi??es por Gaiola Cat?dica foram realizadas nas configura??es gaiola alta, gaiola baixa e por uma inova??o da t?cnica utilizando a gaiola dupla, em atmosfera gasosa composta de 75% de hidrog?nio e 25% de nitrog?nio, sob temperaturas de 300?C e 350?C, e tempos de deposi??es de 2 e 4 horas. As deposi??es foram realizadas em Magnetron Sputtering em atmosfera gasosa composta de 75% de arg?nio e 25% de nitrog?nio, utilizando correntes de 0,40 A e 0,50 A, nos tempos de deposi??es de 2 e 4 horas. Para a caracteriza??o dos filmes finos de nitreto de tit?nio, utilizou-se a espectroscopia Rama (RAMAN) que forneceu a medida direta das energias dos nodos da primeira ordem dos ?tomos constituintes dos filmes finos. Os espectros mostraram interdifusividade at?mica que comprovaram a forma??o de nitreto de tit?nio o que permitiu o c?lculo da raz?o da concentra??o N/Ti, As an?lises de difra??o de raios-X (DRX) comprovaram que os filmes finos obtidos s?o compostos por TiN, apresentando varia??es nos planos cristalinos indicando a n?o exist?ncia de um plano preferencial para o crescimento dos filmes, A espectroscopia de energia de dispers?o (EDS) analisou quantitativamente a composi??o dos filmes finos de nitreto de tit?nio, A microscopia eletr?nica de varredura (MEV) evidenciou a estrutura dos filmes finos de nitreto de tit?nio e foi poss?vel calcular as espessuras dos mesmos, A microscopia de for?a at?mica (AFM) mostrou algumas caracter?sticas microestruturais como a diferen?a entre picos e vales da topografia dos filmes finos de nitreto de tit?nio. De maneira geral, os filmes finos de nitreto de tit?nio depositados por Gaiola Cat?dica apresentaram menor cristalinidade devido ? baixa quantidade de nitrog?nio na atmosfera e, evidenciaram que quanto mais elevada a temperatura, maior ser? a espessura do filme fino. Os filmes finos depositados por Magnetron Sputtering apresentaram crescimento na espessura com o aumento da corrente e s?o mais estequiom?tricos. / Thin films of titanium nitride deposited on silicon surfaces and glass deposition techniques using: Download cathodic cage and Magnetron Sputtering to verify the influence of flow and temperature in the deposition rate in stoichiometry of thin films and structural properties of thin films. Deposits of cathodic cage was carried out in high cage configurations and cage low an innovation of the technique using atmospheric gas double cage consisted of 75% hydrogen and 25% nitrogen to temperatures of 300 ? C and 350 ? C Y deposits both 2 and 4 hours. The deposits were made in an atmosphere of sputter gas Magnetrons consisting of 75% argon and 25% nitrogen using current 0.40 A and 0.50 A in the deposition time of 2 and 4 hours. Rama spectroscopy (Raman), which makes available for the characterization of thin layers of titanium nitride direct measurement of the energy of the node of the first order of the constituent atom of the thin films. The spectra showed interdifusivity atomic of the titan nitride formation that the calculation of the concentration ratio N / Ti, X-ray diffraction analysis (XRD) showed that the thin films obtained from TiN is composite with variations of the crystal planes indicating the non-existence of preference plan for The growth of films, microscopy of the energy dispersion spectroscopy (EDS) quantitatively analysed the composition of the thin films of titanium nitride, electron scanning (MEV) structure highlight thin films of titanium nitride was able to calculate the thickness thereof, the scanning force microscopy (AFM) showed microstructural properties, Which is the difference between the peaks and valleys of the topography of the thin films of titanium nitride. In general, thin films deposited by cathodic titanium nitride cage deposited a lower crystallinity due to the small amount of nitrogen in the atmosphere, and showed that the higher the temperature, the greater the thickness of the thin film. Thin films deposited by Magnetron Sputtering have increased thickness with increasing current and are stoichiometric.

Made available in DSpace on 2014-12-17T14:06:51Z (GMT). No. of bitstreams: 1 EtevaldoMV.pdf: 1261364 bytes, checksum: f1890a7da662c7e4523bd11ec6a3278a (MD5) Previous issue date: 2008-08-23 / In the research, steel samples tool AISI D2, treated thermally, in the conditions: relief of tension, when maximum, seasoned and seasoned was treated thermally in the temperature of revenimento and revenida had been nitrited in plasma with cathodic cage, in atmosphere of 80%N2:20%H2. One used pressure of 2,5 mbar, 400 and 480?C temperatures with treatment time of 3 and 4 hours, with the objective to evaluate its performance in pipes cut tool. It was compared that the performance of the same steel when only thermally treated, both with tension relief. It was evaluated its hardness. Microstructural aspects (the layer thickness, interface, graisn size, etc) and crystalline phases on the surface. Besides, it was verified accomplishment possibility of nitriding simultaneous to annealing treatment. The tempering samples had presented hardness levels of 600 HV, while in nitrited samples these values had been 1100 HV / Neste trabalho, amostras de a?o ferramenta AISI D2, tratadas termicamente, nas condi??es de recozida, de revenimento m?ximo e na condi??o de temperada e revenida foram nitretadas em plasma com gaiola cat?dica, em atmosfera de 80%N2:20%H2. Utilizou-se press?o de 2,5mbar, temperaturas de 400 e 480?C com tempo de tratamento de 3 e 4 horas, com o objetivo de avaliar o seu desempenho em ferramenta de corte. Comparou-se com o desempenho do mesmo a?o quando apenas tratado termicamente, ambos com al?vio de tens?o. Avaliou-se a dureza, aspectos microestruturais (espessura da camada, interface, etc) e fases cristalinas presentes na superf?cie. Al?m disso, verificou-se a possibilidade de realiza??o da nitreta??o simult?nea ao tratamento de revenido. As amostras temperadas e revenidas apresentaram n?veis de dureza de aproximadamente 600HV. Quando nitretadas a uma temperatura de 480?C durante 3h, que foram as melhores condi??es de tratamento, essas amostras apresentaram dureza superficial de 1100HV

Submitted by Automa??o e Estat?stica (sst@bczm.ufrn.br) on 2018-04-03T14:24:41Z No. of bitstreams: 1 FernandaDeMeloFernandes_DISSERT.pdf: 2913111 bytes, checksum: dcf264c0d70fe0bcde8d2a01549b8221 (MD5) / Approved for entry into archive by Arlan Eloi Leite Silva (eloihistoriador@yahoo.com.br) on 2018-04-10T19:05:53Z (GMT) No. of bitstreams: 1 FernandaDeMeloFernandes_DISSERT.pdf: 2913111 bytes, checksum: dcf264c0d70fe0bcde8d2a01549b8221 (MD5) / Made available in DSpace on 2018-04-10T19:05:54Z (GMT). No. of bitstreams: 1 FernandaDeMeloFernandes_DISSERT.pdf: 2913111 bytes, checksum: dcf264c0d70fe0bcde8d2a01549b8221 (MD5) Previous issue date: 2018-01-22 / A deposi??o de filmes finos por plasma melhora v?rias propriedades f?sicas, qu?micas e biol?gicas de superf?cies que contribuem para o enobrecimento dos materiais. O objetivo do trabalho ? estudar a cin?tica de deposi??o de filmes finos de cobre em substratos de vidro e tecido, utilizando a t?cnica da gaiola cat?dica, alterando a espessura da tampa da gaiola e sua rela??o com a varia??o da pot?ncia do tratamento. Devido ? alta temperatura no interior da gaiola, as amostras de tecidos, foram fixadas no flange superior do reator, j? o vidro foi posicionado tanto dentro quanto fora da gaiola, sendo assim, ser? analisado a deposi??o do jato interno e externo da gaiola cat?dica. Filmes finos de cobre caracterizam-se como bom condutor el?trico e t?rmico, o que justifica seu uso em microeletr?nica, e segundo a U.S. Environmental Agency (EPA) existem 282 tipos de ligas de cobre bactericidas, habilitando sua utiliza??o em ambientes est?ril. Assim, realizou-se deposi??es de filmes finos de cobre sobre amostras de vidro, poliamida e poli?ster, variando os par?metros do processo e a espessura da tampa da gaiola. Realizou-se a caracteriza??o por difra??o de Raio-X (DRX), Espectroscopia de Fluoresc?ncia Raios X (FRX), Microscopia Eletr?nica de Varredura com Emiss?o de Campo (MEV - FEG) com Microan?lise por Espectroscopia por Energia Dispersiva (EDS), Transmit?ncia e Espectroscopia de Fotoel?trons Excitados por Raios-X (XPS). Os resultados mostraram que, ap?s o tratamento, todas as amostras, tanto vidro como tecido, obtiveram cobre em sua estrutura, ou seja, foi poss?vel realizar deposi??o nos substratos independentemente da localiza??o do mesmo, em rela??o a gaiola. No entanto, as amostras internas obtiveram maior taxa de deposi??o. / The deposition of thin films by plasma improves various physical, chemical and biological properties of surfaces that contribute to the ennoblement of the materials. The objective of this work is to study the deposition kinetics of thin films of copper on glass and fabric substrates using the cathodic cage technique, changing the thickness of the cage lid and its relation with the variation of the power of the treatment. Owing to the high temperature inside the cage, the tissue samples were fixed to the upper flange of the reactor, and the glass was positioned both inside and outside the cage, thus analyzing the deposition of the internal jet and external the cathodic cage. Copper thin films are characterized as good electrical and thermal conductors, which justify their use in microelectronics, and according to the U.S. Environmental Agency (EPA) there are 282 types of bactericidal copper alloys, enabling their use in sterile environments. Thus, depositions of thin films of copper were carried out on glass, polyamide and polyester samples, varying the process parameters and the thickness of the cage lid. The characterization was performed by X-ray diffraction (XRD), X-Ray Fluorescence Spectroscopy (FRX), Field-Scanning Scanning Electron Microscopy (SEM) with Microanalysis by Dispersive Energy Spectroscopy (EDS), Transmittance and Spectroscopy of X-Ray Excited Photoelectrons (XPS). The results showed that, after treatment, all samples, both glass and fabric, obtained copper in their structure, that is, it was possible to perform deposition on the substrates regardless of the location of the same, relative to the cage. However, the internal samples obtained a higher rate of deposition.

Made available in DSpace on 2014-12-17T14:06:48Z (GMT). No. of bitstreams: 1 JulioCPB.pdf: 2433728 bytes, checksum: 9509a2a35ebc0e4009df0a9bced418db (MD5) Previous issue date: 2007-11-14 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior / Plasma process like ionic nitriding and cathodic cage plasma nitriding are utilized in order to become hard surface of steels. The ionic nitriding is already accepted in the industry while cathodic cage plasma nitriding process is in industrial implementation stage. Those process depend of plasma parameters like electronic and ionic temperature (Te, Ti), species density (ne, ni) and of distribution function of these species. In the present work, the plasma used to those two processes has been observed through Optical Emission Spectroscopy OES technique in order to identify presents species in the treatment ambient and relatively quantify them. So plasma of typical mixtures like N2 H2 has been monitored through in order to study evolution of those species during the process. Moreover, it has been realized a systematic study about leaks, also thought OES, that accomplish the evolution of contaminant species arising because there is flux of atmosphere to inside nitriding chamber and in what conditions the species are sufficiently reduced. Finally, to describe the physic mechanism that acts on both coating techniques ionic nitriding and cathodic cage plasma nitriding / Processos a plasma como nitreta??o i?nica e nitrteta??o por gaiola cat?dica s?o utilizados para endurecimento de superf?cies de a?os. A nitreta??o i?nica sendo j? consolidada em aplica??es industriais enquanto que o processo por gaiola cat?dica ainda se encontra em est?gio de pesquisa. Esses processos dependem dos par?metros de plasma como temperatura eletr?nica e de ?ons (Te, Ti), densidade de esp?cies (ne, ni,) e da fun??o de distribui??o das mesmas. No presente trabalho, o plasma utilizado para esses dois processos foi diagnosticado utilizando a t?cnica de Espectroscopia de Emiss?o ?ptica EEO para identificar as esp?cies presentes no ambiente de tratamento e quantifica-las relativamente. Assim, plasma de mistura gasosa t?pica como N2 H2 foi monitorado, com o intuito de estudar a evolu??o dessas esp?cies durante o processo. Al?m disso, foi realizado um estudo sistem?tico, tamb?m atrav?s de EEO, que acompanha a evolu??o das esp?cies contaminantes surgidas em vazamentos de modo a buscar condi??es onde as mesmas s?o suficientemente reduzidas. Finalmente busca-se, atrav?s do diagn?stico de plasma por EEO, descrever o mecanismo f?sico de atua??o das duas t?cnicas de tratamento: nitreta??o i?nica e gaiola cat?dica

Made available in DSpace on 2014-12-17T14:06:50Z (GMT). No. of bitstreams: 1 MariaLMM.pdf: 1059040 bytes, checksum: e385dd512eb484e085eb027acc2a89fe (MD5) Previous issue date: 2008-08-22 / In this research there was an evaluation of the best conditions of nitriding in plasma within a cathodic cage at an atmosphere of 80% N2-20%H2 in samples of tool manganese steel AISI D6, cold working, treated thermally in the following conditions: tension relief, treated thermally to temperature of maximum heat, temperate heat and temperate and temperate heat. A pressure of 2.5mbar and temperatures of 400 and 300?C com treatment time of two and three hours were used to evaluate its performance as cutting tool (punch) of bicycle backs. Hardness, micro-structural aspects (layer thickness, interface, grain size etc), and crystal phases on the surface were appraised. When treated to tension relief, thermally treated to maximum heat temperature, temperature and temperate heat, the samples presented hardness levels of 243HV, 231HV, 832HV, and 653HV, respectively. The best nitrification conditions were: four hours and 300?C for heat samples. A superficial hardness of 1000HV and a 108?m thickness for the nitrided layer were found in these samples / Neste trabalho, foi realizada a avalia??o das melhores condi??es de nitreta??o em plasma com gaiola cat?dica, em atmosfera de 80%N2 - 20%H2 em amostras de a?o ferramenta para trabalho a frio AISI D6, tratado termicamente nas condi??es: al?vio de tens?o, tratado termicamente na temperatura de revenimento m?ximo, temperada e temperada e revenida. Usou-se press?o de 2,5 mbar, temperaturas de 400 e 300?C com tempo de tratamento de 3 e 4 horas, visando avaliar o seu desempenho em ferramenta de corte (pun??o) de rabeiras de bicicletas. Estimou-se a dureza, aspectos microestruturais (espessura da camada, interface, tamanho de gr?o, etc.) e fases cristalinas presentes na superf?cie. As amostras apresentaram n?veis de durezas 243HV, 231HV, 832HV e 653HV para as amostras com al?vio de tens?o, tratada termicamente na temperatura de revenimento m?ximo, temperada e temperada e revenida, respectivamente. As melhores condi??es de nitreta??o foram 4 horas a 300?C para as amostras temperadas e revenidas. As mesmas apresentaram uma dureza superficial em torno de 1000HV e 100?m de espessura para a camada nitretada

Made available in DSpace on 2014-12-17T14:07:08Z (GMT). No. of bitstreams: 1 RomuloRG.pdf: 2022744 bytes, checksum: b56ca8e09a24314d1127c49f3cf2e053 (MD5) Previous issue date: 2006-03-14 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior / The ionic nitriding process presents some limitations related with the control of the thickness of the layer and its uniformity. Those limitations that happen during the process, are produced due to edge effects, damage caused by arcing arc and hollow cathode, mainly in pieces with complex geometry and under pressures in excess of 1 mbar. A new technique, denominated ASPN (active screen shapes nitriding) it has been used as alternative, for offering many advantages with respect to dc plasma conventional. The developed system presents a configuration in that the samples treated are surrounded by a large metal screen at high voltage cathodic potencials, (varying between 0 and 1200V) and currents up to 1 A. The sample is placed in floting potential or polarized at relatively lower bias voltages by an auxiliary source. As the plasma is not formed directly in the sample surface but in the metal screen, the mentioned effects are eliminated. This mechanism allows investigate ion of the transfer of nitrogen to the substrate. Optical and electronic microscopy are used to exam morphology and structure at the layer. X-ray difration for phase identification and microhardness to evaluate the efficiency of this process with respect to dc conventional nitriding / O processo de nitreta??o i?nica apresenta uma s?rie de limita??es relacionadas com o controle da espessura da camada e de sua uniformidade. Essas limita??es s?o produzidas devido a efeitos de bordas e de c?todo oco que ocorrem durante o processo, principalmente em pe?as com geometria complexa e em press?es do processo superiores a 2 mbar. Assim uma nova t?cnica, denominada ASPN (Active screen plasma nitriding) est? sendo usada como alternativa, por oferecer muitas vantagens em rela??o ao plasma dc convencional. O sistema desenvolvido apresenta uma configura??o em que as amostras a serem tratadas permanecem envolvidas por uma tela que atua como c?todo com tens?o dc variando entre 0 e 1200V e correntes de at? 1 A. A amostra pode permanecer em potencial flutuante ou ser polarizada por uma fonte auxiliar. Como o plasma n?o ? formado diretamente na superf?cie das amostras e sim na tela, os efeitos citados s?o eliminados. Este mecanismo permite investigar a transfer?ncia de nitrog?nio para o substrato por microscopia ?ptica e microscopia eletr?nica de varredura para exames da morfologia e da estrutura, difra??o de raios-X para identifica??o de fases e os ensaios de microdureza permitem avaliar a efici?ncia deste processo em rela??o ? nitreta??o dc convencional

Made available in DSpace on 2014-12-17T14:07:19Z (GMT). No. of bitstreams: 1 KleberJBR.pdf: 2080899 bytes, checksum: a6de36601fae047815a4f83a4734f672 (MD5) Previous issue date: 2007-03-22 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior / Nowadays, in the plastic industry are used mills that accomplish the recycling of residues generated in the production of its components. These mills contain cut sheets that suffer accelerated wear, once they are submitted constantly to the tribologic efforts, decreasing its useful life. To reduce this problem, it s used noble steels or takes place superficial treatments. The ionic nitriding process presents some limitations related to the uniformity of the layer in pieces with complex geometry, committing its application in pieces as knives, head offices, engagements, etc. However, the new technique of nitriding in cathodic cage eliminates some problems, as the restrictions rings, inherent to the conventional ionic nitriding. In present work, was studied the use viabilization of steels less noble, as SAE 1020, SAE 4320 and SAE 4340, nitreded by two different techniques, to substitute the AISI 01 steels, usually used in the cut knifes fabrication, seeking to reduce the costs and at the sane time to increase the useful life of these knifes. The steel most viable was the SAE 4340, nitrided in cathodic cage, because it presented uniformity in thickness and in the hardness of the layer, besides of increased 58% in the average its useful life / Atualmente, na ind?stria de pl?sticos s?o utilizados moinhos que realizam a reciclagem dos res?duos gerados na produ??o de seus componentes. Esses moinhos cont?m l?minas de corte que sofrem desgaste acelerado, uma vez que s?o constantemente submetidas a esfor?os tribol?gicos, diminuindo sua vida ?til. Para amenizar este problema, s?o utilizados a?os nobres ou realizam-se tratamentos superficiais nos a?os convencionais. O processo de nitreta??o i?nica apresenta uma s?rie de limita??es relacionadas com a uniformidade da camada em pe?as de geometria complexa, comprometendo sua aplica??o em pe?as como facas, matrizes, engrenagens, etc. Uma nova t?cnica de nitreta??o a plasma, denominada nitreta??o i?nica em gaiola cat?dica elimina alguns problemas, como os an?is de restri??es, inerentes a nitreta??o i?nica convencional. No presente trabalho foi estudado a viabiliza??o do uso de a?os menos nobres como SAE 1020, SAE 4320 e SAE 4340, nitretados por ambas t?cnicas de nitreta??o, em substitui??o aos a?os AISI 01, normalmente usados na fabrica??o de facas de corte, com o objetivo de reduzir os custos e ao mesmo tempo proporcionar o aumento da vida ?til dessas facas de corte. O a?o que apresentou os melhores resultados foi o SAE 4340 nitretado em gaiola cat?dica, pois apresentou uniformidade na espessura e na dureza da camada nitretada, promovendo um aumento m?dio de 58% de sua vida ?til

Made available in DSpace on 2014-12-17T15:15:04Z (GMT). No. of bitstreams: 1 AnaKGA_DISSERT.pdf: 1807771 bytes, checksum: 5500fb357c9de3200037867308a2a9b6 (MD5) Previous issue date: 2014-07-25 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior / Iron nitrite films, with hundred of nanometers thick, were deposited using the Cathodic cage plasma nitriding method, with a N2/H2 plasma, over a common glass substract. The structure, surface morphology and magnetic properties were investigated using X-ray diffractometry (XRD), atomic force microscopy (AFM) and vibrating sample magnetometer (VSM). XRD shows the formation of γ FeN phase and a combination of ζFe2N + ɛFe3N phases. The film s saturation magnetization and coercivity depends on morphology, composition, grain size and treatment temperature. Temperature raising from 250 ?C to 350 ?C were followed by an increase in saturation magnetization and film s surface coercivity on the parallel direction in relative proportion. This fact can be attributed to the grain sizes and to the different phases formed, since iron rich fases, like the ɛFe3N phase, emerges more frequently on more elevated treatment s temperature. Using this new and reasonably low cost method, it was possible to deposit films with both good adhesion and good magnetic properties, with wide application in magnetic devices / Filmes de nitreto de ferro, com centenas de nanometros de espessura foram depositados pelo m?todo de deposi??o/nitreta??o por Gaiola Cat?dica utilizando um plasma de N2/H2 sobre um substrato de vidro comum. A estrutura, morfologia da superf?cie e propriedades magn?ticas foram investigadas com o uso de Difratometria de Raio-X (DRX), Microscopia de For?a At?mica (MFA) e Magnet?metro de Amostra Vibrante (MAV). A DRX exibe a forma??o da fase γ FeN e mistura de fases ζFe2N + ɛFe3N. A magnetiza??o de satura??o e coercividade dos filmes de nitreto de ferro dependem da morfologia, composi??o, tamanho de gr?o e temperatura de tratamento. Com o aumento da temperatura de 250 para 350 ?C, a magnetiza??o de satura??o e a coercividade na dire??o paralela ? superf?cie dos filmes tamb?m aumentam em propor??o relativa. Isto pode ser atribu?do aos tamanhos de gr?os e ?s diferentes fases formadas, j? que fases ricas em ferro como ɛFe3N surgem com frequ?ncia maior em temperaturas de tratamento mais elevadas. Neste estudo foi poss?vel a deposi??o de filmes de boa ades?o e boas propriedades magn?ticas com grande aplica??o em dispositivos magn?ticos por um m?todo novo e de baixo custo