Submitted by Automa??o e Estat?stica (sst@bczm.ufrn.br) on 2017-09-19T20:22:47Z No. of bitstreams: 1 IgorOliveiraNascimento_TESE.pdf: 5575757 bytes, checksum: c19dabd04c4f5dd3dd95968e649af7af (MD5) / Approved for entry into archive by Arlan Eloi Leite Silva (eloihistoriador@yahoo.com.br) on 2017-09-20T21:21:32Z (GMT) No. of bitstreams: 1 IgorOliveiraNascimento_TESE.pdf: 5575757 bytes, checksum: c19dabd04c4f5dd3dd95968e649af7af (MD5) / Made available in DSpace on 2017-09-20T21:21:32Z (GMT). No. of bitstreams: 1 IgorOliveiraNascimento_TESE.pdf: 5575757 bytes, checksum: c19dabd04c4f5dd3dd95968e649af7af (MD5) Previous issue date: 2017-06-23 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior (CAPES) / Filmes finos de nitreto de tit?nio foram depositados em superf?cies de sil?cio e de vidro, utilizando as t?cnicas de deposi??o: descarga em Gaiola Cat?dica e Magnetron Sputtering, a fim de verificar a influ?ncia da corrente e da temperatura na taxa de deposi??o, na estequiometria dos filmes finos e nas propriedades estruturais dos filmes finos. As deposi??es por Gaiola Cat?dica foram realizadas nas configura??es gaiola alta, gaiola baixa e por uma inova??o da t?cnica utilizando a gaiola dupla, em atmosfera gasosa composta de 75% de hidrog?nio e 25% de nitrog?nio, sob temperaturas de 300?C e 350?C, e tempos de deposi??es de 2 e 4 horas. As deposi??es foram realizadas em Magnetron Sputtering em atmosfera gasosa composta de 75% de arg?nio e 25% de nitrog?nio, utilizando correntes de 0,40 A e 0,50 A, nos tempos de deposi??es de 2 e 4 horas. Para a caracteriza??o dos filmes finos de nitreto de tit?nio, utilizou-se a espectroscopia Rama (RAMAN) que forneceu a medida direta das energias dos nodos da primeira ordem dos ?tomos constituintes dos filmes finos. Os espectros mostraram interdifusividade at?mica que comprovaram a forma??o de nitreto de tit?nio o que permitiu o c?lculo da raz?o da concentra??o N/Ti, As an?lises de difra??o de raios-X (DRX) comprovaram que os filmes finos obtidos s?o compostos por TiN, apresentando varia??es nos planos cristalinos indicando a n?o exist?ncia de um plano preferencial para o crescimento dos filmes, A espectroscopia de energia de dispers?o (EDS) analisou quantitativamente a composi??o dos filmes finos de nitreto de tit?nio, A microscopia eletr?nica de varredura (MEV) evidenciou a estrutura dos filmes finos de nitreto de tit?nio e foi poss?vel calcular as espessuras dos mesmos, A microscopia de for?a at?mica (AFM) mostrou algumas caracter?sticas microestruturais como a diferen?a entre picos e vales da topografia dos filmes finos de nitreto de tit?nio. De maneira geral, os filmes finos de nitreto de tit?nio depositados por Gaiola Cat?dica apresentaram menor cristalinidade devido ? baixa quantidade de nitrog?nio na atmosfera e, evidenciaram que quanto mais elevada a temperatura, maior ser? a espessura do filme fino. Os filmes finos depositados por Magnetron Sputtering apresentaram crescimento na espessura com o aumento da corrente e s?o mais estequiom?tricos. / Thin films of titanium nitride deposited on silicon surfaces and glass deposition techniques using: Download cathodic cage and Magnetron Sputtering to verify the influence of flow and temperature in the deposition rate in stoichiometry of thin films and structural properties of thin films. Deposits of cathodic cage was carried out in high cage configurations and cage low an innovation of the technique using atmospheric gas double cage consisted of 75% hydrogen and 25% nitrogen to temperatures of 300 ? C and 350 ? C Y deposits both 2 and 4 hours. The deposits were made in an atmosphere of sputter gas Magnetrons consisting of 75% argon and 25% nitrogen using current 0.40 A and 0.50 A in the deposition time of 2 and 4 hours. Rama spectroscopy (Raman), which makes available for the characterization of thin layers of titanium nitride direct measurement of the energy of the node of the first order of the constituent atom of the thin films. The spectra showed interdifusivity atomic of the titan nitride formation that the calculation of the concentration ratio N / Ti, X-ray diffraction analysis (XRD) showed that the thin films obtained from TiN is composite with variations of the crystal planes indicating the non-existence of preference plan for The growth of films, microscopy of the energy dispersion spectroscopy (EDS) quantitatively analysed the composition of the thin films of titanium nitride, electron scanning (MEV) structure highlight thin films of titanium nitride was able to calculate the thickness thereof, the scanning force microscopy (AFM) showed microstructural properties, Which is the difference between the peaks and valleys of the topography of the thin films of titanium nitride. In general, thin films deposited by cathodic titanium nitride cage deposited a lower crystallinity due to the small amount of nitrogen in the atmosphere, and showed that the higher the temperature, the greater the thickness of the thin film. Thin films deposited by Magnetron Sputtering have increased thickness with increasing current and are stoichiometric.

Submitted by Automa??o e Estat?stica (sst@bczm.ufrn.br) on 2018-04-03T14:24:41Z No. of bitstreams: 1 FernandaDeMeloFernandes_DISSERT.pdf: 2913111 bytes, checksum: dcf264c0d70fe0bcde8d2a01549b8221 (MD5) / Approved for entry into archive by Arlan Eloi Leite Silva (eloihistoriador@yahoo.com.br) on 2018-04-10T19:05:53Z (GMT) No. of bitstreams: 1 FernandaDeMeloFernandes_DISSERT.pdf: 2913111 bytes, checksum: dcf264c0d70fe0bcde8d2a01549b8221 (MD5) / Made available in DSpace on 2018-04-10T19:05:54Z (GMT). No. of bitstreams: 1 FernandaDeMeloFernandes_DISSERT.pdf: 2913111 bytes, checksum: dcf264c0d70fe0bcde8d2a01549b8221 (MD5) Previous issue date: 2018-01-22 / A deposi??o de filmes finos por plasma melhora v?rias propriedades f?sicas, qu?micas e biol?gicas de superf?cies que contribuem para o enobrecimento dos materiais. O objetivo do trabalho ? estudar a cin?tica de deposi??o de filmes finos de cobre em substratos de vidro e tecido, utilizando a t?cnica da gaiola cat?dica, alterando a espessura da tampa da gaiola e sua rela??o com a varia??o da pot?ncia do tratamento. Devido ? alta temperatura no interior da gaiola, as amostras de tecidos, foram fixadas no flange superior do reator, j? o vidro foi posicionado tanto dentro quanto fora da gaiola, sendo assim, ser? analisado a deposi??o do jato interno e externo da gaiola cat?dica. Filmes finos de cobre caracterizam-se como bom condutor el?trico e t?rmico, o que justifica seu uso em microeletr?nica, e segundo a U.S. Environmental Agency (EPA) existem 282 tipos de ligas de cobre bactericidas, habilitando sua utiliza??o em ambientes est?ril. Assim, realizou-se deposi??es de filmes finos de cobre sobre amostras de vidro, poliamida e poli?ster, variando os par?metros do processo e a espessura da tampa da gaiola. Realizou-se a caracteriza??o por difra??o de Raio-X (DRX), Espectroscopia de Fluoresc?ncia Raios X (FRX), Microscopia Eletr?nica de Varredura com Emiss?o de Campo (MEV - FEG) com Microan?lise por Espectroscopia por Energia Dispersiva (EDS), Transmit?ncia e Espectroscopia de Fotoel?trons Excitados por Raios-X (XPS). Os resultados mostraram que, ap?s o tratamento, todas as amostras, tanto vidro como tecido, obtiveram cobre em sua estrutura, ou seja, foi poss?vel realizar deposi??o nos substratos independentemente da localiza??o do mesmo, em rela??o a gaiola. No entanto, as amostras internas obtiveram maior taxa de deposi??o. / The deposition of thin films by plasma improves various physical, chemical and biological properties of surfaces that contribute to the ennoblement of the materials. The objective of this work is to study the deposition kinetics of thin films of copper on glass and fabric substrates using the cathodic cage technique, changing the thickness of the cage lid and its relation with the variation of the power of the treatment. Owing to the high temperature inside the cage, the tissue samples were fixed to the upper flange of the reactor, and the glass was positioned both inside and outside the cage, thus analyzing the deposition of the internal jet and external the cathodic cage. Copper thin films are characterized as good electrical and thermal conductors, which justify their use in microelectronics, and according to the U.S. Environmental Agency (EPA) there are 282 types of bactericidal copper alloys, enabling their use in sterile environments. Thus, depositions of thin films of copper were carried out on glass, polyamide and polyester samples, varying the process parameters and the thickness of the cage lid. The characterization was performed by X-ray diffraction (XRD), X-Ray Fluorescence Spectroscopy (FRX), Field-Scanning Scanning Electron Microscopy (SEM) with Microanalysis by Dispersive Energy Spectroscopy (EDS), Transmittance and Spectroscopy of X-Ray Excited Photoelectrons (XPS). The results showed that, after treatment, all samples, both glass and fabric, obtained copper in their structure, that is, it was possible to perform deposition on the substrates regardless of the location of the same, relative to the cage. However, the internal samples obtained a higher rate of deposition.

Made available in DSpace on 2014-12-17T14:07:01Z (GMT). No. of bitstreams: 1 NataliaFD_DISSERT.pdf: 4136751 bytes, checksum: 47b384d6442f251d58542735c23ae300 (MD5) Previous issue date: 2012-02-27 / Coordena??o de Aperfei?oamento de Pessoal de N?vel Superior / Titanium nitride films were grown on glass using the Cathodic Cage Plasma Deposition technique in order to verify the influence of process parameters in optical and structural properties of the films. The plasma atmosphere used was a mixture of Ar, N2 and H2, setting the Ar and N2 gas flows at 4 and 3 sccm, respectively and H2 gas flow varied from 0, 1 to 2 sccm. The deposition process was monitored by Optical Emission Spectroscopy (OES) to investigate the influence of the active species in plasma. It was observed that increasing the H2 gas flow into the plasma the luminescent intensities associated to the species changed. In this case, the luminescence of N2 (391,4nm) species was not proportional to the increasing of the H2 gas into the reactor. Other parameters investigated were diameter and number of holes in the cage. The analysis by Grazing Incidence X-Ray Diffraction (GIXRD) confirmed that the obtained films are composed by TiN and they may have variations in the nitrogen amount into the crystal and in the crystallite size. The optical microscopy images provided information about the homogeneity of the films. The atomic force microscopy (AFM) results revealed some microstructural characteristics and surface roughness. The thickness was measured by ellipsometry. The optical properties such as transmittance and reflectance (they were measured by spectrophotometry) are very sensitive to changes in the crystal lattice of the material, chemical composition and film thicknesses. Therefore, such properties are appropriate tools for verification of this process control. In general, films obtained at 0 sccm of H2 gas flow present a higher transmittance. It can be attributed to the smaller crystalline size due to a higher amount of nitrogen in the TiN lattice. The films obtained at 1 and 2 sccm of H2 gas flow have a golden appearance and XRD pattern showed peaks characteristics of TiN with higher intensity and smaller FWHM (Full Width at Half Maximum) parameter. It suggests that the hydrogen presence in the plasma makes the films more stoichiometric and becomes it more crystalline. It was observed that with higher number of holes in the lid of the cage, close to the region between the lid and the sample and the smaller diameter of the hole, the deposited film is thicker, which is justified by the most probability of plasma species reach effectively the sample and it promotes the growth of the film / Filmes finos de nitreto de tit?nio foram crescidos sobre vidro utilizando a t?cnica de deposi??o por descarga em gaiola cat?dica a fim de averiguar a influ?ncia das vari?veis de processo nas propriedades ?pticas e estruturais do filme. Como atmosfera do plasma foi utilizada a mistura de gases Ar, N2 e H2, fixando o fluxo de Ar e N2 em 4 e 3 sccm, respectivamente, e usando fluxos de 0, 1 e 2 sccm de H2. O processo de deposi??o foi monitorado por Espectroscopia de Emiss?o ?ptica (OES) para investiga??o das esp?cies ativas no plasma. Observou-se que com o aumento fluxo de H2 as intensidades das esp?cies luminescentes no plasma sofrem altera??es e que a esp?cie N2 (391,4 nm) n?o teve um crescimento proporcional ao fluxo de H2. Outros par?metros investigados foram o di?metro e o n?mero de furos da gaiola. As an?lises de difra??o de raios X com ?ngulo de incid?ncia rasante (GIXRD) comprovaram que os filmes obtidos s?o compostos por TiN, podendo ter varia??es quanto a quantidade de nitrog?nio na rede e o tamanho de cristalito; a microscopia ?ptica forneceu dados sobre a homogeneidade, a partir da microscopia de for?a at?mica (AFM) observou-se algumas caracter?sticas microestruturais do filme e a rugosidade. A espessura foi quantificada atrav?s das an?lises de elipsometria. As propriedades ?pticas como reflet?ncia e transmit?ncia (medidas por espectrofotometria) s?o bastante sens?veis a altera??es na rede cristalina do material, composi??o qu?mica e espessura, sendo, portanto, uma boa ferramenta para verifica??o do controle do processo. De maneira geral, os filmes obtidos com fluxo de 0 sccm de H2 possuem uma maior transmit?ncia atribu?da ao menor cristalinidade decorrente da maior quantidade de nitrog?nio na rede cristalina do TiN. Os filmes obtidos nos fluxos de 1 e 2 sccm de H2 obtiveram um aspecto dourado e o difratograma apresentou picos caracter?sticos do TiN com maior intensidade e menor largura a meia altura, sugerindo que com a presen?a de hidrog?nio na atmosfera do plasma os filmes s?o mais estequiom?tricos e com maior cristalinidade. Quanto ? configura??o da gaiola observou-se que com maior quantidade de furos na tampa, maior a proximidade da tampa com a amostra e menor o di?metro do furo, maior ? a espessura do filme, o que ? justificado pela maior probabilidade das esp?cies do plasma atingirem efetivamente o substrato e promoverem o crescimento do filme