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Previous issue date: 2013-01-17 / The aim of this study was to evaluate and compare stress distribution around implants using platform switching technique with conventional diameters, using the photoelasticity method in internal and external hex-type implants. Five models were fabricated using photoelastic resin kit FLEXIBLE G3 (POLIPOX Ind. E Com, Sao Paulo Brazil) with a single-body implant in each of them. These models were as follows: MODEL A - 4.1mm platform with 4.1mm external hex implant-abutment connection; MODEL B - 5.0mm platform with 4.1mm external hex implant-abutment connection; MODEL C - 5.0mm platform with 5.0-mm external hex implant-abutment connection; MODEL D - 4.5mm platform with 4.5mm internal hex implant-abutment connection; and MODEL E - 4.5mm platform 3.8mm internal hex implant-abutment connection. An axial load of 100N was applied in a plane polariscope to verify isochromatic fringes. The images were photographed with a digital camera CANON EOS DIGITAL REBEL XTI and viewed with software specially developed for this study. The values for total maximum shear stress for implant HISW was 20.16 kPa, HI 20.64 kPa, 21.84 kPa HESW, HE 21.70 kPa and 20.74 kPa for control implant. The internal hex implant showed better load distribution and lower stress values when the platform switching technique was used and no system was able to eliminate stress on some thirds. / O objetivo deste estudo foi avaliar e comparar a distribui??o de tens?es de implantes utilizando a t?cnica da plataforma switching com os di?metros convencionais, atrav?s do m?todo da fotoelasticidade, em implantes do tipo hex?gono externo e hex?gono interno. Cinco modelos foram constru?dos com a resina fotoel?stica KIT FLEX?VEL G3 (POLIPOX Ind. E Com., S?o Paulo Brasil), com um implante unit?rio em cada um deles. Estes modelos foram MODELO A plataforma de 4.1mm HE/pilar de 4.1mm, MODELO B plataforma de 5.0mm HE/pilar de 4.1mm, MODELO C plataforma de 5.0mm HE/ pilar de 5.0mm, MODELO D plataforma de 4.5mm HI/pilar de 4.5mm e MODELO E plataforma de 4.5mm HI/pilar de 3.8mm. Uma carga axial de 100N foi aplicada em um polarisc?pio plano para a verifica??o da franjas isocrom?ticas. As imagens foram fotografadas com uma c?mera digital CANON EOS DIGITAL REBEL XTI e visualizadas com o software especialmente desenvolvido para este trabalho. Os valores de tens?o m?xima cisalhante total para o implante HISW foi de 20,16KPa, HI 20,64KPa, HESW 21,84KPa, HE 21,70KPa e para o implante controle 20,74KPa. O implante de hex?gono interno apresentou uma melhor distribui??o de carga e menores valores de tens?o com a utiliza??o da t?cnica plataforma switching, sendo que nenhum sistema foi capaz de eliminar tens?o em algum dos ter?os.
| Identifer | oai:union.ndltd.org:IBICT/oai:tede2.pucrs.br:tede/1212 |
| Date | 17 January 2013 |
| Creators | Barbieri, Guilherme Machado |
| Contributors | Burnett Junior, Luiz Henrique |
| Publisher | Pontif?cia Universidade Cat?lica do Rio Grande do Sul, Programa de P?s-Gradua??o em Odontologia, PUCRS, BR, Faculdade de Odontologia |
| Source Sets | IBICT Brazilian ETDs |
| Language | Portuguese |
| Detected Language | English |
| Type | info:eu-repo/semantics/publishedVersion, info:eu-repo/semantics/doctoralThesis |
| Format | application/pdf |
| Source | reponame:Biblioteca Digital de Teses e Dissertações da PUC_RS, instname:Pontifícia Universidade Católica do Rio Grande do Sul, instacron:PUC_RS |
| Rights | info:eu-repo/semantics/openAccess |
| Relation | -8096554818733665164, 500, 600, 4673435736271820140 |
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