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Study of Niobium Doped TiO2 Films Prepared by Liquid Phase Deposition

TiO2 is a fascinating material proving its usefulness in a wide range of applications. In photocatalytic and gas sensitization applications, it has been utilized as a stable semiconductor for the organic matter of waste water cleaning and impetus on environmental consciousness the need for highly efficient combustion engines, controlled industrial processes and monitoring the hazardous gas level in the environment.
Nanocrystalline TiO2 modified with Nb incorporation has been produced by LPD technique that deposited at 40 oC with (NH4)2TiF6 for 0.2 M, and 0.6 M for boric acid and a few mount of Nb solution. The deposition rate can be controlled perfectly about 40-50 nm/h. The addition of Nb stabilizes the anatase phase and retards the grain growth during high temperature annealing.
XRD and RAMAN spectra of undoped and Nb doped samples show that the undoped one has converted to rutile at 900 oC, meanwhile the doped one remains anatase phase. Nanocrystalline films stabilize at 800 oC with grain size of about 7 nm have successfully been synthesized by the additives of Nb, which appear to be an adequate dopant to improve the photocatalytic and gas sensor performances. The ability of niobium introduction is of retarding the anatase to rutile transformation and hindering its grain growth.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0719105-133230
Date19 July 2005
CreatorsFang, Shih-chang
ContributorsMing-Kwei Lee, Mei-Ying Chang, Tsu-Hsin Chang, Kuo-Mei Chen
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageEnglish
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0719105-133230
Rightsnot_available, Copyright information available at source archive

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