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High performance InP-based HEMTs with dry etched gate recess /

Diss. no. 12900 techn. sc. SFIT Zurich. / Literaturverz.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/636662130
Date January 1998
CreatorsDuran, Halit C. Duran, Halit Celâleddin.
Publisher[S.l.] : [s.n.],
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceZugriff über: http://e-collection.ethbib.ethz.ch/show?type=diss&nr=12900

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