Stuttgart, Univ., masters thesis, 2003.

A l’heure actuelle, le marché de l’électronique de puissance est dominé par les composants silicium. Néanmoins, de nouveaux matériaux comme le nitrure de gallium ont émergé dans ce domaine grâce à leurs propriétés intéressantes. Ces nouveaux composants sont principalement réalisés sur des substrats silicium ce qui induit certaines problématiques lors de leur fabrication ou au niveau de leurs performances. Nous nous sommes intéressés dans cette thèse à des approches d’un point de vue du substrat dans l’objectif de résoudre ces problématiques. Ce travail a permis notamment de mettre en place une succession de procédés technologiques afin de remplacer le substrat silicium de fabrication par d’autres matériaux pour améliorer les performances de ces composants. Cette approche a notamment permis de transférer des composants fonctionnels sur un substrat cuivre. L’impact électrique et thermique du remplacement du substrat initial par un nouveau matériau a été étudié. Ce travail ouvre ainsi la voie du report de composants en nitrure de gallium réalisés sur des substrats silicium de diamètre 200 mm ou plus. / New materials such as gallium nitride (GaN) emerge as promising candidates for power electronics. The current trend is to fabricate the AlGaN/GaN power devices directly on (111) silicon substrates. It makes the expitaxy of the GaN challenging and affects the device performances. In this work, we focus on substrate approaches to solve these problems. A transfer process was developed to replace the silicon substrate by another material to enhance electrical performances of the devices. Especially, GaN devices were transferred on copper substrates without electrical degradation. Electrical and thermal characterizations were performed to study the impact of the transfer. This work offers a first approach on the transfer of GaN devices from 8 or even 12 inches silicon substrates.

No description available.

Cette thèse expose les travaux effectués au sein du laboratoire central de l’IEMN. La finalité de ce travail est de participer a l’optimisation des transistors HEMTs de la filière AlGaN/GaN sur substrat Si(111), au niveau de leur fabrication et de leurs propriétés électroniques, qui seront a terme intégrés dans des dispositifs de puissance hyperfréquence. Ce manuscrit expose dans un premier chapitre les principales propriétés physiques, électriques et mécaniques des matériaux choisis, ainsi que le principe de fonctionnement du HEMT. Ensuite, toutes les étapes technologiques permettant la conception et la fabrication du HEMT seront décrites dans le deuxième chapitre, parmi lesquelles ont été menées plusieurs études sur leur optimisation. Une attention particulière sera portée sur les verrous technologiques rencontrés durant cette thèse. Le troisième chapitre présente l’ensemble des études effectuées sur les composants fabriqués au laboratoire. Elles s’appuient sur l’analyse des caractéristiques électriques en régime statique, pulsé, et hyperfréquence. Le dernier chapitre concerne l’étude de la fiabilité de HEMT AlGaN/GaN sur substrat SiC de même topologie. Les défauts induits par l’utilisation prolongée de ces transistors seront mis en exergue. / This thesis describes the work performed within iemn laboratory. The design, fabrication and improvement of AlGaN/GaN HEMTs on Si(111) substrate is the main goal of this work, as these transistors are aimed to be integrated in devices for microwave power applications. In the first chapter, this manuscript shows the worthwhile physical, electrical and mechanical properties of the used materials. HEMT working principle is also exposed in this part. Next, every step of the HEMT manufacturing process are described in the second chapter, including several optimization studies. Particular attention will be paid to bottlenecks encountered during the device making. The third chapter presents the whole studies done on these electronic components. Each study relies on electrical characterization in DC, pulsed and microwave modes. The final chapter regards reliability studies of AlGaN/GaN HEMT on SiC substrate having the same topology. Defects induced during more than 3000h ageing in high operating temperature will be highlighted.

<p>Gallium Nitride based devices due to their inherent material properties are considered as one of the most promising devices to realize high power, high frequency transistors with lower power consumption in next-generation applications. Although the technology has been studied since early 1970s, there is still a vast room and expectations in its yet unachieved findings. In present work the GaN technology is explored and state-of-the-art studies of GaN based HEMTs and their application in MMICs are presented. Different designs are presented and evaluated and the results are reported. In particular the HEMT performance is studied in terms of DC in addition to large signal conditions, where the device’s performance becomes function of power levels it is driven with. The peculiarities and challenges of building an automated Load-Pull setup are outlined and analysis for further improvements is presented.</p>

Gallium Nitride based devices due to their inherent material properties are considered as one of the most promising devices to realize high power, high frequency transistors with lower power consumption in next-generation applications. Although the technology has been studied since early 1970s, there is still a vast room and expectations in its yet unachieved findings. In present work the GaN technology is explored and state-of-the-art studies of GaN based HEMTs and their application in MMICs are presented. Different designs are presented and evaluated and the results are reported. In particular the HEMT performance is studied in terms of DC in addition to large signal conditions, where the device’s performance becomes function of power levels it is driven with. The peculiarities and challenges of building an automated Load-Pull setup are outlined and analysis for further improvements is presented.

Berlin, Techn. University, Diss., 2007.

Ulm, Univ. Diss., 2006.

Diss. no. 12900 techn. sc. SFIT Zurich. / Literaturverz.

Zugl.: Berlin, Techn. Univ., Diss., 2009