Optical lithography is an indispensible step in the process flow of Design for Manufacturability (DFM). Optical lithography simulation is a compute intensive task and simulation performance, or lack thereof can be a determining factor in time to market. Thus, the efficiency of lithography simulation is of paramount importance. Coherent decomposition is a popular simulation technique for aerial imaging simulation. In this thesis, we propose an approximate simulation technique based on the 2D wavelet transform and use a number of optimization methods to further improve polygon edge detection. Results show that the proposed method suffers from an average error of less than 6% when compared with the coherent decomposition method. The benefits of the proposed method are (i) > 20X increase in performance and more importantly (ii) it allows very large circuits to be simulated while some commercial tools are severely capacity limited and cannot even simulate a circuit as small as ISCAS-85 benchmark C17. Approximate simulation is quite attractive for layout optimization where it may be used in a loop and may even be acceptable for final layout verification.
| Identifer | oai:union.ndltd.org:UMASS/oai:scholarworks.umass.edu:theses-1495 |
| Date | 01 January 2010 |
| Creators | Rodrigues, Rance |
| Publisher | ScholarWorks@UMass Amherst |
| Source Sets | University of Massachusetts, Amherst |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | Masters Theses 1911 - February 2014 |
Page generated in 0.002 seconds