Cheung, Wing Kin = 應變及間隔效應對La0.67Sr0.33MnO3摻雜Pr0.67Ca0.33MnO3的傳導特性的影響之研究 / 張榮健. / On t.p. "0.67", "0.33" and "3" are subscripts. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2007. / Includes bibliographical references (leaves 89-93). / Text in English; abstracts in English and Chinese. / Cheung, Wing Kin = Ying bian ji jian ge xiao ying dui La0.67Sr0.33MnO3 shan za Pr0.67Ca0.33MnO3 de chuan dao te xing de ying xiang zhi yan jiu / Zhang Rongjian. / Chapter 1 --- Introduction --- p.1 / Chapter 1.1 --- Development of magnetoresistance materials --- p.1 / Chapter 1.2 --- What is magnetoresistance? --- p.1 / Chapter 1.2.1 --- Anisotropic magnetoresistance --- p.2 / Chapter 1.2.2 --- Giant magnetoresistance (GMR) --- p.3 / Chapter 1.2.3 --- Colossal magnetoresistance (CMR) --- p.4 / Chapter 1.3 --- Possible origins of CMR in manganites --- p.6 / Chapter 1.3.1 --- Tolerance factor --- p.6 / Chapter 1.3.2 --- Double exchange mechanism --- p.8 / Chapter 1.3.3 --- Jahn-Teller distortion --- p.11 / Chapter 1.3.4 --- Charge-ordering and phase separation --- p.13 / Chapter 1.4 --- Movtiation --- p.17 / Chapter 1.5 --- Literature review --- p.18 / Chapter 1.5.1 --- Single-layer manganite thin films --- p.18 / Chapter 1.5.2 --- Multilayer system - manganites with insulating spacers --- p.19 / Chapter 1.6 --- Scope of thesis --- p.20 / Chapter 2 --- Instrumentation --- p.21 / Chapter 2.1 --- Sample preparation --- p.21 / Chapter 2.1.1 --- Facing-target sputtering technique (FTS) --- p.21 / Chapter 2.1.2 --- Deposition system --- p.24 / Chapter 2.2 --- Annealing system --- p.26 / Chapter 2.2.1 --- Oxygen annealing --- p.26 / Chapter 2.3 --- Sample characterization --- p.28 / Chapter 2.3.1 --- X-ray diffraction (XRD) --- p.28 / Chapter 2.3.2 --- Alpha - step profiler --- p.30 / Chapter 2.3.3 --- Transport property measurement --- p.30 / Chapter 3 --- Preparation and characterization of single-layer thin films --- p.32 / Chapter 3.1 --- Introduction --- p.32 / Chapter 3.2 --- Fabrication and characteristization of the sputtering targets --- p.32 / Chapter 3.3 --- Deposition procedure --- p.36 / Chapter 3.3.1 --- Preparation of substrate --- p.36 / Chapter 3.3.2 --- Deposition process --- p.36 / Chapter 3.4 --- Parameters related to epitaxial growth of LPSCMO thin films --- p.37 / Chapter 3.4.1 --- Substrate materials --- p.37 / Chapter 3.4.2 --- Substrate temperature --- p.38 / Chapter 3.4.3 --- Oxygen partial pressure --- p.38 / Chapter 4 --- Thickness and strain effects in epitaxial LPSCMO thin films --- p.43 / Chapter 4.1 --- Introduction --- p.43 / Chapter 4.2 --- Structural characterization of LPSCMO thin films --- p.45 / Chapter 4.2.1 --- Thickness effect --- p.45 / Chapter 4.2.2 --- Strain effect --- p.49 / Chapter 4.3 --- Transport properties and magnetoresistance measurement --- p.51 / Chapter 4.3.1 --- Thickness effect --- p.51 / Chapter 4.3.2 --- Strain effect --- p.60 / Chapter 4.4 --- Discussion --- p.63 / Chapter 5 --- Effect of spacer in [LPSCMO/SCuO] multilayer --- p.65 / Chapter 5.1 --- Sample preparation --- p.65 / Chapter 5.2 --- Characterization of as-deposited multilayer samples --- p.67 / Chapter 5.2.1 --- Structural anaylsis --- p.67 / Chapter 5.2.2 --- Resistance measurement --- p.72 / Chapter 5.3 --- Oxygen-annealing treatment --- p.76 / Chapter 5.3.1 --- Introduction --- p.76 / Chapter 5.3.2 --- Structural anaylsis --- p.77 / Chapter 5.3.3 --- Resistance measurement --- p.78 / Chapter 5.4 --- Discussion --- p.85 / Chapter 6 --- Conclusion --- p.87 / Chapter 6.1 --- Summary --- p.87 / Chapter 6.2 --- Future outlook --- p.88 / Bibliography --- p.89
| Identifer | oai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_326070 |
| Date | January 2007 |
| Contributors | Cheung, Wing Kin., Chinese University of Hong Kong Graduate School. Division of Physics. |
| Source Sets | The Chinese University of Hong Kong |
| Language | English, Chinese |
| Detected Language | English |
| Type | Text, bibliography |
| Format | print, xiii, 93 leaves : ill. (some col.) ; 30 cm. |
| Rights | Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/) |
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