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This thesis analyses the effect of varying the compositions of co-evaporated V205/TeO2, W03/CeO2, SiO/TeO2 and W03/TeO2 amorphous thin films on their electrical and optical properties. Some information about the electronic properties of these oxides may be obtained by comparison of the results. In the oxide systems containing transition metal ions the expression for hopping energy at low temperatures contains a term due to the hopping energy of polarons in addition to that due to the disorder. In the dielectric SiO/TeO2 thin films the distortion of 'the molecule is thought to be quite weak and thus the carriers do not form polarons. They would move by hopping at the band edge at low temperatures and by excitation to a mobility edge at high temperatures. The electrical conductivity of V205/TeO2 amorphous thin films is discussed in the light of the Mott(1968) theory. The optical absorption edge was found to obey the direct forbidden transitions equation cc ico=B(fiw-EOP)3'2. The frequency-squared dependence of the conductivity of W03/CeO2 thin films (high content of CeO2) in the frequency region where the capacitance is constant is associated with the lead resistance according to Street et al (1971). The optical energy gap of the films varies with the composition in same way as in doped crystalline semiconductors. The value of the, optical W03/Ce02 was calculated using the Davis and Mott (1970) formula for non-direct optical transitions. The capacitance of SiO/TeO2 thin films is found to be almost independent of frequency as well as of temperature. This is due to a strong ionic bonding which characterises a good insulator. The optical absorption edge of SiO/TeO2 is found to be sharper than that of W03/ CeO2 and very similar to that found in most crystalline solids. The value of the optical energy gap is calculated using the same formula as in W03/CeO2. The systematic change of the optical gap with composition is observed only in a limited range of compositions. The a. c electrical properties of W03/Te02 amorphous thin films are described using the Springett(1974) and Elliott(1977) models. The optical absorption edge of WO3/TeO2 is found to lead to new arguments about the origin of the Urbach edges.The a. c electrical conductivity shows a frequency dependence of the form as ca wS in all samples studied in the present work. The mechanism of conduction at low temperatures with the index varying from 0.5 to I is thought to be due to hopping of electrons between localized states in the gap. At high fields the d. c current shows a non-linear dependence on the applied electric field. This is thought to be due to either space charge or Schottky effects in the oxides containing transition metal ions. In SiO/TeO2 dielectric films, the non-linear dependence of current on the electric field is thought to be due to either the Poole-Frenkel effect or at slightly lower fields it could be due to impurities.

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Since the early 1960s, Abrikosov-Gorkov theory has been used to describe superconductors with paramagnetic impurities. Interestingly, the density of states resulting from the theoretical framework has to date only been known approximately, as a numeric solution of a complex polynomial. An analytical solution to the theory was discovered and applied to extract the spin polarization from the tunneling conductance of superconducting aluminium with 3-dimensional (3-D) amorphous (a-) gadoliniumxsilicon1-x (GdxSi1-x) as a counter electrode (Al/Al2O3/a-GdxSi1-x planar tunnel junction measured at T = 25 mK and H less than or equal to 3.0 T) in the quantum critical regime (QCR). The analytical solution is valid in the whole regime of Abrikosov-Gorkov theory independent of the presence of an energy gap. Applying the spin polarized Abrikosov-Gorkov theory to describe aluminium gives a larger spin polarization in GdxSi1-x than the spin polarized Bardeen-Cooper-Schrieffer (BCS) theory. The purpose of this study is to extract polarization at various applied magnetic fields, but no specific relationship between the two could be determined. Results obtained shows a transition from a superconductor with a gap to a gapless superconductor in varying external magnetic fields was observed. To improve understanding of GdxSi1-x near the metal-insulator transition (MIT) and compare it with prior work, the initial experimental attempts to investigate the transport property of GdxSi1-x near the MIT in the 2-dimensional limit are presented. A low temperature ultra high vacuum quench condensation system was used to make thin films of GdxSi1-x and in-situ measurements were performed. The transport properties for different values of x and thicknesses were measured for T = 4.2 K to ~10 K. In addition to other possible causes, the uncertainty in the electron impact emission spectroscopy (EIES) appeared to be a major reason behind the observed error in x when gadolinium and silicon are co-evaporated. The problems faced during the co-evaporation are also discussed.

Chalcogenide glasses are a class of covalent amorphous semiconductors with interesting properties. The presence of short-range order and the pinned Fermi level are the two important properties that make them suitable for many applications. With flash memory technology reaching the scaling limit as per Moore’s law, alternate materials and techniques are being researched at for realizing next generation non-volatile memories. Two such possibilities that are being looked at are Phase Change Memory (PCM) and Programmable Metallization Cell (PMC) both of which make use of chalcogenide materials. This thesis starts with a survey of the work done so far in realizing PCMs in reality. For chalcogenides to be used as a main memory or as a replacement to FLASH technology, the electrical switching parameters like switching voltage, programming current, ON state and OFF state resistances, switching time and optical parameters like band gap are to be considered. A survey on the work done in this regard has revealed that various parameters such as chemical composition of the PC material, nature of additives used to enhance the performance of PCM, topological thresholds (Rigidity Percolation Threshold and Chemical Threshold), device geometry, thickness of the active volume, etc., influence the electrical switching parameters. This has motivated to further investigate the material and experimental parameters that affect switching and also to explore the possibility of multi level switching. In this thesis work, the feasibility of using two chalcogenide systems namely Si15Te85-xGex and Ge15Te85-xAgx in the form of amorphous thin films for PCM application is explored. In the process, electrical switching experiments have been carried out on thin films belonging to these systems and the results obtained are found to exhibit some interesting anomalies. Further experiments and analysis have been carried out to understand these anomalies. Finally, the dynamics of electrical switching has been investigated and presented for amorphous Si15Te85-xGex thin films. From these studies, it is also seen that multi state switching/multiple resistance levels of the material can be achieved by current controlled switching, the mechanisms of which have been further probed using XRD analysis and AFM studies. In addition, investigations have been carried out on the electrical switching behavior of amorphous Ge15Te85-xAgx thin film devices and optical band gap studies on amorphous Ge15Te85-xAgx thin films. Chapter one of the thesis, gives a brief introduction to the limitations in existing memory technology and the alternative memory technologies that are being researched, based on which it can be inferred that PCM is a promising candidate for the next generation non volatile memory. This chapter also discusses the principle of using PCM to store data, realization of PCM using chalcogenides, the material properties to be considered in designing PCM, the trade offs in the process of design and the current trends in PCM technology. Chapter two provides a brief review of the electrical switching phenomenon observed in various bulk chalcogenide glasses, as electrical switching is the underlying principle behind the working of a PCM. In the process of designing a memory, many parameters like read/write operation speed, data retentivity and life, etc., have to be optimized for which a thorough understanding on the dependence of electrical switching mechanism on various material parameters is essential. In this chapter, the dependence of electrical switching on parameters like network topological thresholds and electrical and thermal properties of the material is discussed. Doping is an efficient way of controlling the electrical parameters of chalcogenides. The nature of dopant also influences switching parameters and this also is briefly discussed. Chapter three provides a brief introduction to the different experimental techniques used for the thesis work such as bulk chalcogenide glass preparation, preparation of thin amorphous films, measurement of film thickness, confirmation of amorphous nature of the films using X-Ray Diffraction (XRD), electrical switching experiments using a custom made setup, crystallization study using XRD and Atomic Force Microscopy (AFM) and optical band gap studies using UV-Vis spectrometer. Vt is an important parameter in the design of a PCM. Chapter four discusses the dependence of Switching voltage, Vt, on input energy. It is already established that the Vt is influenced by the composition of the base glass, nature of dopants, thickness of films and by the ambient temperature. Based on the results of electrical switching experiments in Si15Te74Ge11 amorphous thin films a comprehensive analysis has been done to understand the kinetics of electrical switching. Chapter five discusses a current controlled crystallization technique that can be used to realize multi-bit storage with a single layer of chalcogenide material. In case of PCM, data is stored as structural information; the memory cell in the amorphous state is read as data ‘0’ and the memory cell in crystalline state is read as data ‘1’. This is accomplished through the process of electrical switching. In order to increase the memory density or storage density, multi-bit storage is being probed at by having multiple layers of chalcogenide material. However, with this technique, the problems of inter-diffusion between different layers cannot be ruled out. In this thesis work, a current controlled crystallization technique has been used to achieve multiple stable resistance states in Si15Te75Ge10 thin films. Chapter six discusses the mechanism behind multi state switching exhibited by certain compositions of Si15Te85-xGex thin films. Crystallization studies on certain Si15Te85-xGex films have been carried out using XRD and AFM to understand the phenomenon of multiple states. The results of these experiments and analysis are presented in this chapter. Chapter seven discusses the results of electrical switching experiments and optical band gap studies on amorphous Ge15Te85-xAgx thin films. Chapter eight gives the conclusion and scope for future work.

In this study we investigate the magnetic properties of Fe-based amorphous thin films. Fe1-x-y-zBxSiyCz, Fe80-xNixB20, Fe80-xMnxB20, and Fe73-xMnxB27 films were deposited on silicon and glass substrates in a DC and RF magnetron sputtering system. Inductive magnetic measurements were performed to investigate the magnetic properties, including induced anisotropy and magnetostriction, of the as-deposited and annealed films using an M-H Looper. The chemical composition of the films was characterized using secondary ion mass spectroscopy (SIMS). The physical thickness of the films was determined by use of a stylus profilometer. The M-H Looper studies indicated that the induced anisotropy (Hk) depends strongly on the nickel concentration as well as on the annealing conditions, specifically the time and temperature of the annealing process. For the same metalloid concentration, the induced anisotropy has a maximum as a function of Ni. For the same nickel concentration and annealing time, it was found that the value of Hk decreases with the increase in annealing temperature. For each composition studied, low temperature long time annealing showed a higher value of Hk compared to high temperature short time annealing. From the magnetostriction values of Fe80-xNixB20 alloys, it was found that the sputter deposited films show similar trend but differ in magnitude when compared with ribbon samples. The magnetostriction of annealed thin films is found to be representative of ribbon samples. A potential composition modification to improve the strength of the field induced anisotropy is the addition of low levels of Mn.