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Confinement of symmetric diblock copolymer thin films /Tang, Wilfred H. January 1999 (has links)
Thesis (Ph. D.)--University of Chicago, Dept. of Chemistry, June 1999. / Includes bibliographical references. Also available on the Internet.
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Block copolymer thin films interfacial and confinement effects /Limary, Ratchana. January 2002 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references. Available also from UMI Company.
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Block copolymer synthesis and self-assembly for membrane and lithographic applicationsJanuary 2019 (has links)
archives@tulane.edu / Silicon-based block copolymers have gained prominence because of their inherent ability to self-assemble at the low molecular weight. By utilizing this vital factor, we synthesize poly(vinylmethylsiloxane-block-methyl methacrylate) (PVMS-b-PMMA) intending to create small characteristic features with the potential application for lithography and membrane filtration. The polymer is made by a combination of anionic synthesis of PVMS, ATRP (atom radical transfer polymerization) of PMMA, and then cojoining the end-group functionalized blocks with a “click” reaction. After synthesis, thin films (10-100 nm) were self-assembled to form structures aligned perpendicular to the substrate. The morphology was observed by atomic force microscopy, grazing incidence small-angle X-ray scattering (GISAXS), and transmission electron microscopy (TEM). Additionally, the hydrophobicity of PVMS prompted us to develop a coating on microporous membrane supports for separation of water-in-oil mixtures. The PVMS was used as an effective coating to prevent fouling while maintaining high selectivity for both water-in-toluene and water-in-decane emulsion in gravity-based filtration. Finally, cyclic block copolymers (BCPs) have garnered increased attention because of their unique structure, which differs from linear BCPs due to a lack of end groups. This feature in combination with the high segregation strength of silicon-based polymers is desirable for nanolithography. Thus, we synthesized a new class of silicon-based cyclic polymer, cyclic PVMS-b-PMMA, intending to later understand the impact of topology on phase behavior, domain spacing, and nanoconfinement in thin films. / 1 / Baraka Lwoya
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Experimental studies of morphology and of its control in diblock copolymer ultrathin films /Morkved, Terry L. January 1997 (has links)
Thesis (Ph. D.)--University of Chicago, Dept. of Physics, December 1997. / Includes bibliographical references. Also available on the Internet.
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Self-assembly of block coplymer thin films in compressible fluidsLi, Yuan, January 1900 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2006. / Vita. Includes bibliographical references.
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