Photovoltaics is an exciting area of research with the potential to completely change the world's energy landscape. Silicon still dominates the photovoltaics market and shows no sign of being overtaken by other materials systems for large scale manufacture. Huge strides have been made in recent years to reduce the cost of solar modules, mainly through the introduction of mass production solar panel plants. However producing very pure single crystalline silicon is still a relatively expensive, energy intensive process. If cheaper less pure silicon could be cast into multi-crystalline ingots, without significant losses to the conversion efficiency this could be a game changer in the photovoltaics industry. For this to happen we need to have greater knowledge and understanding of the role of metallic impurities in solar silicon. If we can find ways to passivate or getter these impurities in cost effective processes that lend themselves to mass production then this would be the key to cost effective solar energy. In the work in this thesis I have investigated some of the most common and most harmful metallic impurities in silicon solar cells using a combination of Deep Level Transient Spectroscopy (DLTS), Capacitance Voltage (CV) measurements, Secondary Ion Mass Spectroscopy and Tunnelling Electron Microscopy (TEM). The specific transition metals I studied were iron, as it is one of the most common impurities and also titanium and molybdenum, because they are very harmful, have slow diffusivities and hard to get rid of with traditional gettering techniques. I have then looked at using hydrogen to electrically passivate these defects, and show evidence that hydrogen passivation is possible for interstitially incorporated titanium in silicon, but is unlikely to happen for interstitially incorporated iron. Another important part of this thesis was the observation and characterisation of molybdenum nano-precipitates in silicon. We have observed the nano-precipitates both electrically in DLTS, and physically in TEM. The precipitates have very interesting electrical properties, and appear to be very strong minority carrier recombination centres, which would have a very negative effect on solar cell performance. It is possible that these nano-precipitates could form from any of the slow diffusing transition metals, and could be a key reason to explain the efficiency gap between low purity cast silicon and high purity single crystal silicon.

In this thesis first-principles calculations of point and extended defects in diamond and silicon are reported. In single crystal diamond grown by chemical vapour deposition (CVD) dislocations are observed as mixed-type 45° and edge-type dislocations lying along <100> with 1/2<110> Burgers vectors. Results are presented on the core structures, core energies and electrical properties of both types of dislocations and their interaction with nitrogen is investigated. Then the focus turns to the brown diamond problem. Despite concerted research efforts, the origin of the brown colouration of diamond is still under discussion. Recently, the attention was drawn to vacancy-related defects. Experiments on type IIa diamonds indicate that the brown colour is caused by vacancy-type extended defects, however the shape and size of these defects remained unclear. In this work, the structural, electrical and optical properties of large spherical vacancy clusters and thin vacancy disks are investigated by means of density functional theory and the calculations are compared with recent experimental measurements on brown diamond. High pressure high temperature treatment (HPHT) of brown type Ia diamonds above 2000°C results in the loss of the brown colour and the formation of nitrogen-vacancy defects. The generation of such defects requires a source of mobile vacancies during the annealing process. It is suggested that the vacancy cluster model described in this thesis can explain the observed annealing behaviour since the break-up of the clusters leads to a supersaturation of mobile vacancies which readily complex with substitutional nitrogen atoms present in the material. Therefore, the effect of HPHT treatment of brown type Ia diamond is investigated by studying the formation energies of common and rare defects and estimates of their equilibrium concentrations at different annealing stages are given. Finally, an open problem also involving nitrogen, but in a different group IV semiconductor is considered. In Czochralski-silicon, nitrogen-related shallow thermal donors are formed between 500 and 750°C. Until now the exact chemical composition and atomic structure of these defects are not well established. Here, it is shown that NO and NO_2 belong to the family of nitrogen-oxygen related shallow thermal donors. Based on the law of mass action the equilibrium defect concentrations are predicted. Finally, the theoretical results are compared to recent Fourier transform infrared (FTIR) spectroscopy measurements.

Depuis des années, le silicium est le semiconducteur principalement utilisé dansl’industrie électronique et photovoltaïque. Intensivement étudié depuis plusieursdécennies, ses propriétés sont essentiellement connues, mais de nouvelles questionsviennent se poser. En particulier, une meilleure connaissance des nombreux défauts etimpuretés ainsi que leurs propriétés et leur impact sur les performances des dispositifsà base de Si est souhaitable.Ce travail couvre un éventail de problèmes liés aux défauts ponctuels en interactionau moyen de calculs dits de premiers principes (Density Functional Theory).Une première partie est dédiée à l’impact du dopage sur la diffusivité de l’oxygèneinterstitiel. Les coefficients de diffusion obtenus en fonction de la température sonten très bon accord avec les résultats expérimentaux ce qui démontre la validité dela méthodologie appliquée. Nous avons montré que l’augmentation de la diffusivitédans le silicium dopé bore se produit par un mécanisme de transfert de charge depuisle dopant de type p.Une deuxième partie se rapporte aux différents complexes de défauts ponctuels etleur thermodynamique, leur cinétique, et leurs propriétés optiques. La formation de cescomplexes peut être induite expérimentalement par une irradiation par des électrons.Plus généralement, ils apparaissent aussi dans des environnements opérationnelsparticuliers comme le spatial. Ici, nous avons réalisé une étude expérimentale etthéorique combinée pour identifier l’impact du dopage isovalent (C, Ge) et du codopage(C-Ge, C-Sn, C-Pb) sur la production de différents complexes (VOi, CiOi,CiCs), qui sont électriquement et optiquement actifs.Enfin, une attention particulière a été portée à la paire de défaut carbone-carboneet ses propriétés. Récemment, il a été établi que le silicium fortement dopé en carboneprésente des propriétés d’émission laser. Ici nous avons cherché à étudier les formespossibles du complexe et leurs propriétés, afin de comprendre lequel est présentexpérimentalement. / Since many years, silicon is the primary semiconductor material in electronic andphotovoltaic industry. Intensively studied through decades, its properties are essentiallyknown, however new questions keep arising. We need to achieve deep insightinto the numerous possible defects and impurities properties as well as their impacton the performances of the Si based devices. This work covers a range of problemsrelated with point defects interaction of both types long range and short range bymeans of parameter free first principles calculations.The former refers to the impact of heavy doping on diffusivity of interstitialoxygen species. The obtained diffusion coefficients as a function of temperature arein a very good agreement with experimental results that demonstrates the validityof the applied methodology. We showed that the enhanced diffusivity in B-dopedsilicon occurs through a charge transfer mechanism from the p-type dopantThe latter accounts for the various point defect complexes and their thermodynamic,kinetic, and optical properties. Formation of these complexes can beinduced by electron irradiation of Czochralski silicon. This aspect is of extremeimportance for particular operational environment. Here, we performed a combinedexperimental-theoretical investigation to identify the impact of isovalent doping (C,Ge) and co-doping (C-Ge, C-Sn, C-Pb) on the production of different complexes(VOi, CiOi, CiCs, etc.), which are electrically and optically active.Finally, particular attention is addressed to the carbon-carbon defect pair and itsproperties. Recently, it was established that heavily carbon doped silicon elucidateslasing properties. Here we aimed to revisit the possible forms of the complex andtheir properties, in order to associate one of them with light emitting G-centre,observed in experiments.v

Depuis des années, le silicium est le semiconducteur principalement utilisé dansl’industrie électronique et photovoltaïque. Intensivement étudié depuis plusieursdécennies, ses propriétés sont essentiellement connues, mais de nouvelles questionsviennent se poser. En particulier, une meilleure connaissance des nombreux défauts etimpuretés ainsi que leurs propriétés et leur impact sur les performances des dispositifsà base de Si est souhaitable.Ce travail couvre un éventail de problèmes liés aux défauts ponctuels en interactionau moyen de calculs dits de premiers principes (Density Functional Theory).Une première partie est dédiée à l’impact du dopage sur la diffusivité de l’oxygèneinterstitiel. Les coefficients de diffusion obtenus en fonction de la température sonten très bon accord avec les résultats expérimentaux ce qui démontre la validité dela méthodologie appliquée. Nous avons montré que l’augmentation de la diffusivitédans le silicium dopé bore se produit par un mécanisme de transfert de charge depuisle dopant de type p.Une deuxième partie se rapporte aux différents complexes de défauts ponctuels etleur thermodynamique, leur cinétique, et leurs propriétés optiques. La formation de cescomplexes peut être induite expérimentalement par une irradiation par des électrons.Plus généralement, ils apparaissent aussi dans des environnements opérationnelsparticuliers comme le spatial. Ici, nous avons réalisé une étude expérimentale etthéorique combinée pour identifier l’impact du dopage isovalent (C, Ge) et du codopage(C-Ge, C-Sn, C-Pb) sur la production de différents complexes (VOi, CiOi,CiCs), qui sont électriquement et optiquement actifs.Enfin, une attention particulière a été portée à la paire de défaut carbone-carboneet ses propriétés. Récemment, il a été établi que le silicium fortement dopé en carboneprésente des propriétés d’émission laser. Ici nous avons cherché à étudier les formespossibles du complexe et leurs propriétés, afin de comprendre lequel est présentexpérimentalement. / Since many years, silicon is the primary semiconductor material in electronic andphotovoltaic industry. Intensively studied through decades, its properties are essentiallyknown, however new questions keep arising. We need to achieve deep insightinto the numerous possible defects and impurities properties as well as their impacton the performances of the Si based devices. This work covers a range of problemsrelated with point defects interaction of both types long range and short range bymeans of parameter free first principles calculations.The former refers to the impact of heavy doping on diffusivity of interstitialoxygen species. The obtained diffusion coefficients as a function of temperature arein a very good agreement with experimental results that demonstrates the validityof the applied methodology. We showed that the enhanced diffusivity in B-dopedsilicon occurs through a charge transfer mechanism from the p-type dopantThe latter accounts for the various point defect complexes and their thermodynamic,kinetic, and optical properties. Formation of these complexes can beinduced by electron irradiation of Czochralski silicon. This aspect is of extremeimportance for particular operational environment. Here, we performed a combinedexperimental-theoretical investigation to identify the impact of isovalent doping (C,Ge) and co-doping (C-Ge, C-Sn, C-Pb) on the production of different complexes(VOi, CiOi, CiCs, etc.), which are electrically and optically active.Finally, particular attention is addressed to the carbon-carbon defect pair and itsproperties. Recently, it was established that heavily carbon doped silicon elucidateslasing properties. Here we aimed to revisit the possible forms of the complex andtheir properties, in order to associate one of them with light emitting G-centre,observed in experiments.v

The thesis deals with the study and analysis of crystallographic defects on the surface of silicon wafers produced by Czochralski method. It focuses primarily on growth defects and oxygen precipitates, which play an important role in the development of appropriate nucleation centers for growth of stacking faults. The growth of stacking faults near the surface of silicon wafers is supported by their oxidation and selective etching. Such a highlighted stacking faults are known as the OISF (Oxidation Induced Stacking Fault). Spatial distribution of OISF on the wafer gives feedback to the process of pulling silicon single crystal and wafers surface quality. Moreover the work describes the device for automatic detection and analysis of OISF, which was developed for ON Semiconductor company in Rožnov Radhoštěm.