In today&amp / #8217 / s market conditions, higher tool life and durable cutting tools which can stand high cutting speeds are required in chip removal process. In order to improve the performance of cutting tools, coatings are employed extensively. Cubic boron nitride (cBN) is a new kind of coating material for cutting tools due to its outstanding properties and testing of cBN as a hard coating for machining have been increasing in recent years. However, there are some challenges such as compressive residual stress, poor adhesion and limiting coating thickness during the deposition of cBN on substrates. In this study, cubic boron nitride (cBN) coatings are formed on cutting tools from hexagonal boron nitride (hBN) target plates. For this purpose, a physical vapor deposition (PVD) system is utilized. PVD system works on magnetron sputtering technique in which material transfer takes place from target plate to substrate surface. Firstly, cBN coatings are deposited on steel and silicon wafer substrates for measurements and analyses. Compositional, structural and mechanical measurements and analysis are performed for the characterization of coatings. Next, several types of cutting tools are coated by cBN and the effects of cBN coatings on cutting performance are investigated. Finally, it can be said that cubic boron nitride coatings are successfully formed on substrates and the improvement of wear resistance and machining performance of cBN coated cutting tools are observed.

The instability under bias voltage stress and low mobility of hydrogenated amorphous silicon (a-Si:H) thin film transistor (TFT), produced by plasma enhanced chemical vapor deposition (PECVD) technique, are the main problems impeding the implementation of active matrix arrays for light emitting diode display panels and their peripheral circuitry. Replacing a-Si:H by hydrogenated nanocrystalline silicon film (nc-Si:H) seems a solution due to its higher mobility and better stability. Therefore nc-Si:H TFT was produced and investigated in this thesis. All TFT layers (doped nc-Si:H, intrinsic nc-Si:H and insulator films) were produced separately, characterized by optical (UV-visible and FTIR spectroscopies, XRD) and electrical (current-voltage, I-V) methods, and optimized for TFT application. Afterwards the non self-aligned bottom-gate TFT structure was fabricated by the photolithographic method using 2-mask set. The n+ nc-Si:H films, used for TFT drain/source ohmic contacts, were produced at high H2 dilution and at several RF power densities (PRF). The change of their lateral resistivity (rho) was measured by reducing the film thickness via reactive ion etching. The rho values rise below a critical film thickness, indicating the presence of the disordered and less conductive incubation layer. The optimum PRF for the lowest incubation layer was determined. Among the deposition parameters only increased NH3/SiH4 flow rate ratio improved the insulating properties of the amorphous silicon nitride (a-SiNx:H) films, chosen as the TFT gate dielectric. The electrical characteristics of two TFTs with a-SiNx:H having low leakage current, fabricated at different NH3/SiH4 ratios (~19 and ~28) were compared and discussed. The properties (such as crystallinity, large area uniformity, etc.) of the nc-Si:H film as TFT channel layer, were found to depend on PRF. For the films deposited at the center of the PECVD electrode the change from an amorphous dominant structure to a nanocrystalline phase took place with increasing PRF, whereas those at the edge had always nanocrystalline nature, independent of PRF. The two different TFTs produced at the center of the electrode with a-Si:H and nc-Si:H grown at low and high PRF, respectively, were compared through their I-V characteristics and electrical stability under the gate bias voltage stress. Finally, nc-Si:H TFT structure, produced and optimized in this work, was analyzed through gate-insulator-drain/source capacitor by capacitance-voltage (C-V) measurements within 106-10-2 Hz frequency (F) range. The inversion regime was detected at low F without any external charge injection. Besides, ac hopping conductivity in the nc-Si:H bulk was extracted from the fitting results of the C-F curves.

No description available.

O presente trabalho está fundamentado no desenvolvimento de uma metodologia e/ou uma tecnologia de obtenção e caracterização de filtros ópticos de interferência de banda passante variável [C.M. da Silva, 2010] e de banda de corte variáveis, constituídos por refletores dielétricos multicamadas de filmes finos intercalados por cavidades de Fabry-Perot não planares com espessuras linearmente variáveis, que apresentam a propriedade do deslocamento linear da transmitância máxima espectral em função da posição, isto é, um Filtro de Interferência Variável (FIV). Este método apresenta novas e abrangentes possibilidades de confecção de filtros ópticos de interferência variável: lineares ou em outras formas desejadas, de comprimento de onda de corte variável (passa baixa ou alta) e filtros de densidade neutra variável, através da deposição de metais, além de aplicações em uma promissora e nova área de pesquisa na deposição de filmes finos não uniformes. A etapa inicial deste desenvolvimento foi o estudo da teoria dos filtros ópticos dielétricos de interferência para projetar e construir um filtro óptico banda passante convencional de um comprimento de onda central com camadas homogêneas. A etapa seguinte, com base na teoria óptica dos filmes finos já estabelecida, foi desenvolver a extensão destes conhecimentos para determinar que a variação da espessura em um perfil inclinado e linear da cavidade entre os refletores de Bragg é o principal parâmetro para produzir o deslocamento espacial da transmitância espectral, possibilitando o uso de técnicas especiais para se obter uma variação em faixas de bandas de grande amplitude, em um único filtro. Um trabalho de modelagem analítica e análise de tolerância de espessuras dos filmes depositados foram necessários para a seleção da estratégia do \"mascaramento\" seletivo do material evaporado formado na câmara e-Beam (elétron-Beam) com o objetivo da obtenção do filtro espectral linear variável de características desejadas. Para tanto, de acordo com os requisitos de projeto, foram necessárias adaptações em uma evaporadora por e-Beam para receber um obliterador mecânico especialmente projetado para compatibilizar os parâmetros das técnicas convencionais de deposição com o objetivo de se obter um perfil inclinado, perfil este previsto em processos de simulação para ajustar e calibrar a geometria do obliterador e se obter um filme depositado na espessura, conformação e disposição pretendidos. Ao final destas etapas de modelagem analítica, simulação e refinamento recorrente, foram determinados os parâmetros de projeto para obtenção de um determinado FIV (Filtro de Interferência Variável) especificado. Baseadas nos FIVs muitas aplicações são emergentes: dispositivos multi, hiper e ultra espectral para sensoriamento remoto e análise ambiental, sistemas Lab-on-Chip, biossensores, detectores chip-sized, espectrofotometria de fluorescência on-chip, detectores de deslocamento de comprimento de onda, sistemas de interrogação, sistemas de imageamento espectral, microespectrofotômetros e etc. No escopo deste trabalho se pretende abranger um estudo de uma referência básica do emprego do (FIV) filtro de interferência variável como detector de varredura de comprimento de ondas em sensores biológicos e químicos compatível com pós processamento CMOS. Um sistema básico que é constituído por um FIV montado sobre uma matriz de sensores ópticos conectada a um módulo eletrônico dedicado a medir a intensidade da radiação incidente e as bandas de absorção das moléculas presentes em uma câmara de detecção de um sistema próprio de canais de microfluidos, configurando-se em um sistema de aquisição e armazenamento de dados (DAS), é proposto para demonstrar as possibilidades do FIV e para servir de base para estudos exploratórios das suas diversas potencialidades que, entre tantas, algumas são mencionadas ao longo deste trabalho. O protótipo obtido é capaz de analisar fluidos químicos ou biológicos e pode ser confrontado com os resultados obtidos por equipamentos homologados de uso corrente. / This work presents the development of a method to obtain and characterize a variable interference optical band pass filter, made up of a number of thin films forming dielectrical reflectors intercalated by non flat Fabry-Perot cavities whose thickness varies linearly. These filters present the propriety of a linear variation in the maximum spectral transmittance as a function of the position in the filter, for this reason this is called Variable Interference Filter (VIF). This method allows of manufacturing linear interference filters or any other function desired, variable cut wavelength (low or high pass) and variable neutral density filters by means of metallic depositions. The first step in this work was to design and built a conventional filter, with homogeneous layers and a fixed central wavelength. The following step was, using basics of the Optical theory of thin films, introduce the variation in the thickness of the layers in a linear inclined outline. Accordingly with the design requirements, it was made some adaptations in an e-beam evaporator (electron-beam), adding a mechanical obliterator adjusted with series of depositions and characterizations of a single layers in order to find a linearly inclined outline. In the end of this step it was designed and built the specified VIF. It is also described a possible application of this VIF: a multispectral device for biological analysis. Among many applications, others can be cited, such as: Lab-on-Chip systems, biosensors chip-sized detectors, on-chip fluorescence spectrometry, shift wavelength detectors, interrogation systems, environmental analysis systems, etc. The scope of this work covers the study of variable interference filters as a wavelength scanning detector in biological and chemical sensors compatible with CMOS post-processing. To demonstrate the viability, and enable the exploration of other applications, it is proposed a basic system composed of a VIF, mounted on top of a matrix of sensors connected to a dedicated electronic module, to measure and store the intensity of the incident radiation data and the absorption spectra of molecules present in a detection chamber of a microfluidic system. Other applications of this basic structure are mentioned. This prototype is aimed to analyze biological fluids and results will be compared with results obtained using standard commercial instruments.

O presente trabalho está fundamentado no desenvolvimento de uma metodologia e/ou uma tecnologia de obtenção e caracterização de filtros ópticos de interferência de banda passante variável [C.M. da Silva, 2010] e de banda de corte variáveis, constituídos por refletores dielétricos multicamadas de filmes finos intercalados por cavidades de Fabry-Perot não planares com espessuras linearmente variáveis, que apresentam a propriedade do deslocamento linear da transmitância máxima espectral em função da posição, isto é, um Filtro de Interferência Variável (FIV). Este método apresenta novas e abrangentes possibilidades de confecção de filtros ópticos de interferência variável: lineares ou em outras formas desejadas, de comprimento de onda de corte variável (passa baixa ou alta) e filtros de densidade neutra variável, através da deposição de metais, além de aplicações em uma promissora e nova área de pesquisa na deposição de filmes finos não uniformes. A etapa inicial deste desenvolvimento foi o estudo da teoria dos filtros ópticos dielétricos de interferência para projetar e construir um filtro óptico banda passante convencional de um comprimento de onda central com camadas homogêneas. A etapa seguinte, com base na teoria óptica dos filmes finos já estabelecida, foi desenvolver a extensão destes conhecimentos para determinar que a variação da espessura em um perfil inclinado e linear da cavidade entre os refletores de Bragg é o principal parâmetro para produzir o deslocamento espacial da transmitância espectral, possibilitando o uso de técnicas especiais para se obter uma variação em faixas de bandas de grande amplitude, em um único filtro. Um trabalho de modelagem analítica e análise de tolerância de espessuras dos filmes depositados foram necessários para a seleção da estratégia do \"mascaramento\" seletivo do material evaporado formado na câmara e-Beam (elétron-Beam) com o objetivo da obtenção do filtro espectral linear variável de características desejadas. Para tanto, de acordo com os requisitos de projeto, foram necessárias adaptações em uma evaporadora por e-Beam para receber um obliterador mecânico especialmente projetado para compatibilizar os parâmetros das técnicas convencionais de deposição com o objetivo de se obter um perfil inclinado, perfil este previsto em processos de simulação para ajustar e calibrar a geometria do obliterador e se obter um filme depositado na espessura, conformação e disposição pretendidos. Ao final destas etapas de modelagem analítica, simulação e refinamento recorrente, foram determinados os parâmetros de projeto para obtenção de um determinado FIV (Filtro de Interferência Variável) especificado. Baseadas nos FIVs muitas aplicações são emergentes: dispositivos multi, hiper e ultra espectral para sensoriamento remoto e análise ambiental, sistemas Lab-on-Chip, biossensores, detectores chip-sized, espectrofotometria de fluorescência on-chip, detectores de deslocamento de comprimento de onda, sistemas de interrogação, sistemas de imageamento espectral, microespectrofotômetros e etc. No escopo deste trabalho se pretende abranger um estudo de uma referência básica do emprego do (FIV) filtro de interferência variável como detector de varredura de comprimento de ondas em sensores biológicos e químicos compatível com pós processamento CMOS. Um sistema básico que é constituído por um FIV montado sobre uma matriz de sensores ópticos conectada a um módulo eletrônico dedicado a medir a intensidade da radiação incidente e as bandas de absorção das moléculas presentes em uma câmara de detecção de um sistema próprio de canais de microfluidos, configurando-se em um sistema de aquisição e armazenamento de dados (DAS), é proposto para demonstrar as possibilidades do FIV e para servir de base para estudos exploratórios das suas diversas potencialidades que, entre tantas, algumas são mencionadas ao longo deste trabalho. O protótipo obtido é capaz de analisar fluidos químicos ou biológicos e pode ser confrontado com os resultados obtidos por equipamentos homologados de uso corrente. / This work presents the development of a method to obtain and characterize a variable interference optical band pass filter, made up of a number of thin films forming dielectrical reflectors intercalated by non flat Fabry-Perot cavities whose thickness varies linearly. These filters present the propriety of a linear variation in the maximum spectral transmittance as a function of the position in the filter, for this reason this is called Variable Interference Filter (VIF). This method allows of manufacturing linear interference filters or any other function desired, variable cut wavelength (low or high pass) and variable neutral density filters by means of metallic depositions. The first step in this work was to design and built a conventional filter, with homogeneous layers and a fixed central wavelength. The following step was, using basics of the Optical theory of thin films, introduce the variation in the thickness of the layers in a linear inclined outline. Accordingly with the design requirements, it was made some adaptations in an e-beam evaporator (electron-beam), adding a mechanical obliterator adjusted with series of depositions and characterizations of a single layers in order to find a linearly inclined outline. In the end of this step it was designed and built the specified VIF. It is also described a possible application of this VIF: a multispectral device for biological analysis. Among many applications, others can be cited, such as: Lab-on-Chip systems, biosensors chip-sized detectors, on-chip fluorescence spectrometry, shift wavelength detectors, interrogation systems, environmental analysis systems, etc. The scope of this work covers the study of variable interference filters as a wavelength scanning detector in biological and chemical sensors compatible with CMOS post-processing. To demonstrate the viability, and enable the exploration of other applications, it is proposed a basic system composed of a VIF, mounted on top of a matrix of sensors connected to a dedicated electronic module, to measure and store the intensity of the incident radiation data and the absorption spectra of molecules present in a detection chamber of a microfluidic system. Other applications of this basic structure are mentioned. This prototype is aimed to analyze biological fluids and results will be compared with results obtained using standard commercial instruments.

Fatty acids (FAs) represent an important class of metabolites, impacting on membrane building blocks and signaling compounds in cellular regulatory networks. In nature, prokaryotes are characterized with the most impressing FA structural diversity and the highest relative content of free fatty acids (FFAs). In this context, nitrogen-fixing bacteria (order Rhizobiales), the symbionts of legumes, are particularly interesting. Indeed, the FA profiles influence the structure of rhizobial nodulation factors, required for successful infection of plant root. Although FA patterns can be assessed by gas chromatography—(GC-) and liquid chromatography—mass spectrometry (LC-MS), sample preparation for these methods is time-consuming and quantification suffers from compromised sensitivity, low stability of derivatives and artifacts. In contrast, matrix-assisted laser desorption/ionization-time of flight mass spectrometry (MALDI-TOF-MS) represents an excellent platform for high-efficient metabolite fingerprinting, also applicable to FFAs. Therefore, here we propose a simple and straightforward protocol for high-throughput relative quantification of FFAs in rhizobia by combination of Langmuir technology and MALDI-TOF-MS featuring a high sensitivity, accuracy and precision of quantification. We describe a step-by-step procedure comprising rhizobia culturing, pre-cleaning, extraction, sample preparation, mass spectrometric analysis, data processing and post-processing. As a case study, a comparison of the FFA metabolomes of two rhizobia species—Rhizobium leguminosarum and Sinorhizobium meliloti, demonstrates the analytical potential of the protocol.

Inexhaustible solar energy, which provides a clean, economic and green energy, seems to be an alternative solution, for current and future energy demands. Harvesting solar energy presents a challenge in using eco-friendly, earth abundant and inexpensive materials. Although present CdTe and Cu (In, Ga)Se2 (CIGS) technologies, provide light-to-electricity comparable to silicon technology, toxicity of Cd and scarcity of In limits the widespread utilization. Future tera-watt level module capacity would then be feasible by the low-cost technologies. The chalcogenide thin film technology would therefore provide the exceptional utilization in the large-area module monolithic integrations benefitting from the low material consumption owing to the direct band gap. The current thesis presents the results obtained from the quest of other thin film materials and their utilization to an unconventional Cd-free buffer layer. The films suitability for the future applications was assessed through photovoltaics device studies in a comparative manner. Chapter-1 deals with the motivation for the solar energy and the importance of thin film photovoltaics. Alternative materials which are abundantly available would help to reach the future tera watt level production, where the conventional silicon technology alone cannot satisfy the global energy demand. The utilization of non-conventional thin film based solar cells and their working principles were elucidated. The histories of the copper based alternative materials were introduced. Chapter-2 deals with the versatile thin film growth technique that has been designed fabricated and installed further which can handle the growth of the absorber and the top TCO layers with insitu sulphurisation. The methodology of the absorber deposition was discussed in detail. The experimental details for the co-sputtering of CuInAl alloy were presented. A novel selenization method, assisted by the combination of inert gases was developed for the annealing of CuInAl alloyed precursor films. Chapter-3 deals with the presentation of the results obtained on buffer and window layers. Chemical Bath deposition technique was employed for the growth and optimization of the conventional CdS and non-toxic buffer ZnS buffer layers. A) Cadmium sulphide thin films suitable for the utilization of high efficiency solar cells were optimized. Optimization of the buffer involved the effects of cadmium precursors, ammonia concentration and buffer capsule effect. A green route was presented so as to consume the precursors to the maximum extent possible. B) The alternative non-toxic buffer Zinc Sulphide (ZnS) thin films were successfully grown using the above optimized conditions. Moreover the window layer was also optimized for better device partner. Zinc Oxide was used as a n-type partner for the p-type CIS films. The ZnO films were grown by the RF-sputtering from the single cathode exhibited good crystallinity with Zincite structure (hexagonal ZnS, a= 3.249A0 and c= 5.205A0). All the grown films showed high resistivity. Al: ZnO thin films were optimized in two methods 1) by dc co-sputtering from the elemental cathodes, Zinc and Aluminum, 2) dc-sputtering from the single 2% Al-doped ZnO cathode. Low resistivity Al:ZnO thin films were deposited in both the cases. Effect of Aluminum doping into ZnO crystal lattice upon the optical and electrical properties were discussed. Chapter-4 deals with the synthesis of various absorber materials, characterizations and some properties. Briefly the A) Optimization of the CuIn1-xAlxSe2 phase with better adhesion and better crystallinity. Aluminum doping into the crystal lattice of CuInSe2 aided the wide band gap tuning of CIAS thin films. Morphological investigations were carried out for the different set of thin films before and after selenization. Effects of copper and Aluminum concentrations on the lattice parameter of the selenized thin films were addressed. The present chapter deals with the A) electrical properties of CIAS films and its heterojunction partners. Resistivity measurements and effects of Cu/In ratio and the effect of Al doping were described in detail. The CIAS/ZnO heterostructure, CIAS/Al:ZnO heterostructure junction properties as a function of different sun illuminations were discussed. B) The alternative earth abundant, eco-friendly, non-toxic elements Cu2ZnSnS4, absorber thin films synthesis and characterizations. Photo conductive photo measurements showed CZTS a potential candidate for near infra-red photodectection. C) Cu2CoSnS4 (CCTS) nanostructures and quantum dots were synthesized via simple chemical routes. CCTS quantum dots were tuned to exhibit the red edge effect and cold white phosphors. D) Cu3BiS3 nano rods were synthesized and characterized structurally and optically. The transport properties of Cu3BiS3 nanorods were tailored for showing the metallic to semiconducting transitions. Chapter-5 Discusses the A) Efforts made in understanding the CIAS based solar cells through interfaces such as CIAS/ZnO, Mo/CIAS, CIAS/CdS/i-ZnO/Al:ZnO and improving the open circuit voltage VOC upon a rotating substrate, involving the inline and in situ processes, for fabricating the cell/ module were discussed. The device statistics for various set of cells were analyzed. B) Solar cells of CTS absorber with the non-toxic buffer ZnS were fabricated and device properties were analyzed. C) CCTS quantum dots embedded in the polymer matrix were utilized for making the inverted hybrid solar devices in combination of ITO/AZnO bilayered contact replacing the acidic PEDOT: PSS. D) The solar cells made of CCTS hollow spheres by spin coating the absorber in the configuration SLG/Mo/CCTS/CdS/ iZno-AZnO/Ni-Al-Al showed a lower efficiency of 0.02%. Chapter-6 concludes with the summary of present investigations and the scope for future work.