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Surface and interfacial chemistry of high-k dielectric and interconnect materials on siliconKirsch, Paul Daniel. January 2001 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2001. / Vita. Includes bibliographical references. Available also from UMI/Dissertation Abstracts International.
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Anisotropy of low dielectric constant materials and reliability of Cu/low-k interconnects /Cho, Taiheui, January 2000 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 160-167). Available also in a digital version from Dissertation Abstracts.
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The effects of post-ash cleaning and chemical treatments on the dielectric properties and reliability of Cu/low-k interconnect structuresBorthakur, Swarnal 28 August 2008 (has links)
Not available / text
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Characterization of functionalized polynorbornenes as interlevel dielectricsGrove, Nicole R. 12 1900 (has links)
No description available.
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An evaluation of the electrical, material, and reliability characteristics and process viability of ZrO₂ and ZrOxNy for future generation MOS gate dielectricNieh, Renee Elizabeth. January 2002 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references. Available also from UMI Company.
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Technology development and process integration of alternative gate dielectric material : hafnium oxide /Lee, Byoung Hun, January 2000 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 123-134). Available also in a digital version from Dissertation Abstracts.
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A steerable array antenna using controllable microwave dielectric slab phase shifters on a coplanar waveguide /Cha, Jun Ho, January 2006 (has links)
Thesis (Ph. D.)--University of Washington, 2006. / Vita. Includes bibliographical references (leaves 116-123).
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Phase transitions in solid C₆₀ doped with C₇₀ : a study with dielectric spectroscopyKeung, Suet Kwan 01 January 2001 (has links)
No description available.
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Advanced oxynitride and silicon nitride gate dielectrics for ULSI CMOS technology /Song, Seung-chul, January 1999 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 1999. / Vita. Includes bibliographical references (leaves 207-219). Available also in a digital version from Dissertation Abstracts.
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An evaluation of the electrical, material, and reliability characteristics and process viability of ZrO₂ and ZrOxNy for future generation MOS gate dielectricNieh, Renee Elizabeth 28 August 2008 (has links)
Not available / text
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