An electron cyclotron resonance (ECR) plasma source which couples microwave to the plasma using an internal antenna was developed. The use of internal antenna provides a "windowless" power coupling method that can eliminate the issues of contamination which require frequent source maintenance. Antenna structure, magnetic configuration and plasma parameters were modified for carbon film deposition by chemical sputtering. The ECR source generated low-plasma-potential (10 V), high-plasma-density (10^16 m^-3) discharges at low gas pressures (10^-1 Pa) and low input power (100 W). The antenna realized stable operation for more than 5 h and can be utilized for carbon film deposition. / 博士(工学) / Doctor of Philosophy in Engineering / 同志社大学 / Doshisha University

京都大学 / 0048 / 新制・課程博士 / 博士(エネルギー科学) / 甲第19825号 / エネ博第331号 / 新制||エネ||66(附属図書館) / 32861 / 京都大学大学院エネルギー科学研究科エネルギー基礎科学専攻 / (主査)准教授 田中 仁, 教授 岸本 泰明, 教授 長﨑 百伸 / 学位規則第4条第1項該当 / Doctor of Energy Science / Kyoto University / DFAM