The Etching Chamber is the most important component of Etcher. It provides an environment to etch wafer and transfer wafer to another chamber by robotic arm. The purpose of this research is to solve some problem such as the huge deformation around the edge of a hole which connected with a vacuum pump. And make use of the Engineering Design Method to redesign the original Etching Chamber. In the first place, the objectives of Etching Chamber are clarified, then establish function analysis figure and set requirement to separate all problem into all sub-problem . Second, by means of determining characteristics as well as generating alternatives, we can find all sub-solutions. Finally, we combine all solutions together by evaluating alternatives and improving details. Then we can find better solutions through appropriate process as well as solve all problem. Later, we use the computer aid design tool I-DEAS to draw and analyse Etching Chamber. In the end, we display the results and discuss after analysing chamber. What is more, we prove the performance and manufacturing cost of redesign Etching Chamber is better than original Etching Chamber.