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  • About
  • The Global ETD Search service is a free service for researchers to find electronic theses and dissertations. This service is provided by the Networked Digital Library of Theses and Dissertations.
    Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.

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Showing 31 to 40 of 213 (0.011 seconds)
31

Charge trapping effects on mobility and threshold voltage instability in high-k gate stacks

Sim, Jang Hoan 28 August 2008 (has links)
Not available / text
Dielectrics
Hafnium oxide
Gate array circuits
32

High-permittivity dielectrics and high mobility semiconductors for future scaled technology: Hf-based High-K gate dielectrics and interface engineering for HfO₂/Ge CMOS device

Lu, Nan 28 August 2008 (has links)
Not available / text
Hafnium oxide
Dielectrics
Gate array circuits
33

Interfacial properties of thin film hetero-structure copper-oxides of hafnium-silicon /

Park, Hyun Jung. January 2002 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references. Available also from UMI Company.
34

Technology development and process integration of alternative gate dielectric material : hafnium oxide /

Lee, Byoung Hun, January 2000 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 123-134). Available also in a digital version from Dissertation Abstracts.
35

Characterization and reliability of HFO₂ and hfsion gate dielectrics with tin metal gate

Krishnan, Siddarth A., January 1900 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2005. / Vita. Includes bibliographical references.
36

Charge trapping effects on mobility and threshold voltage instability in high-k gate stacks

Sim, Jang Hoan. January 1900 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2005. / Vita. Includes bibliographical references.
37

Herstellungsverfahren, Struktur und Gebrauchseigenschaften von ionenplattierten binären und ternären Schutzschichten aus Hf-Al-N

Zendehroud, Jafar. January 2001 (has links)
Universiẗat, Diss., 1999--Kassel. / Lizenzpflichtig.
38

High-permittivity dielectrics and high mobility semiconductors for future scaled technology Hf-based High-K gate dielectrics and interface engineering for HfO₂/Ge CMOS device /

Lu, Nan, January 1900 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2006. / Vita. Includes bibliographical references.
39

Anwendung neuer Materialien für Niedrig-Energie-Anzündelemente in Airbagsystemen

Weiß, Uwe. Unknown Date (has links) (PDF)
Techn. Universiẗat, Diss., 2004--Chemnitz. / Erscheinungsjahr an der Haupttitelstelle: 2003.
40

Controle analitico dos processos de separacao de zirconio e hafnio

IHA, CHIEKO 09 October 2014 (has links)
Made available in DSpace on 2014-10-09T12:30:54Z (GMT). No. of bitstreams: 0 / Made available in DSpace on 2014-10-09T14:01:10Z (GMT). No. of bitstreams: 1 01372.pdf: 1371976 bytes, checksum: 5d7884919c9499eae4d722ce6eb5d692 (MD5) / Dissertacao (Mestrado) - IPEN / IPEN/D / Instituto de Pesquisas Energeticas e Nucleares - IPEN/CNEN-SP
separation processes
transition metals
hafnium
zirconium

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