Detection of mid-wavelength infrared radiation is crucial for many industrial, military and biomedical applications. Photon detectors in the market can operate at only low temperature which increases weight, power consumption and total cost. Type-II InAs/GaSb superlattice infrared detectors are expected to have a major role in the infrared detector market with providing high quality detection characteristics at higher temperatures. Therefore, in the past decade, there has been an increasing interest in infrared detectors based on type-II InAs/GaSb superlattice technology due to their long range adjustable bandgap, low tunneling current and Auger recombination rates which bring potential of high temperature operation. Characterization of this photodiodes requires detailed investigations on different aspects. This study focuses on various optical and electrical characterization techniques for single pixel infrared detectors: responsivity characterization using FTIR and blackbody source, dark I-V and R-V characterizations, response time measurement. Characterizations of detector noise with respect to frequency and bias voltage are studied in detail. These characterization techniques are carried out in order to observe the effects of design with three different &ldquo / standard&rdquo / and a new &ldquo / N&rdquo / structure designs and also to understand the effects of surface passivation with atomic layer deposited Al2O3 layer and ordinary PECVD deposited Si3N4 and SiO2 layers. When standard photodiodes are compared, we observed that the one with the thickest active absorber region has the highest response and dark current density values. &ldquo / N&rdquo / structure design photodiode has very low dark current density while its optical performance is not as high as the standard designs. Si3N4 passivation degrades both optical and electrical performances. SiO2 and Al2O3 passivation layers improve optical and electrical characteristics of photodiodes. Theoretical and experimental dark current noise values of SiO2 passivated sample in agreement up to 0.18V reverse bias while those values of unpassivated and Si3N4 passivated samples agree only at zero bias. Temperature dependent R-V characteristics of photodiodes are analyzed and the surface limited activation energy is calculated in order to investigate the additional noise. At the end, surface recombination noise is proposed to cover the deficit on the noise calculation.

Dans le domaine de la photodétection infrarouge (IR) haute performance refroidie, le photodétecteur à superréseaux (SR) InAs/GaSb est une filière émergente qui peut compléter les technologies déjà établies. Grâce à des années de recherche, l'Institut d'Electronique du Sud (IES) de l'Université de Montpellier a développé une expertise sur la croissance du matériau SR InAs/GaSb par épitaxie par jets moléculaires et sur la fabrication technologique des photodiodes pin dont les performances sont à l'état de l'art mondial dans le moyen IR (3-5µm). Au cours de cette thèse, nous avons étudié deux périodes différentes de SR comme zone active de photodiodes pin ayant une longueur d'onde de coupure à 5 µm à 80K : une riche en InAs (InAs-rich) et l'autre riche en GaSb (GaSb-rich). Ces structures SR présentent des caractéristiques électriques et électro-optiques très différentes. Notamment, les densités de courant de la structure InAs-rich sont très bonnes, de l'ordre de 10-8A/cm2 à 80K, alors que celles de la structure GaSb-rich sont deux décades plus élevées. L'objectif de cette thèse était donc d'analyser les performances de ces photodiodes. Pour cela, nous avons développé une méthode de simulation avec l'outil TCAD SILVACO. Appliquée tout d'abord aux structures InAs-rich, nous avons mis en évidence que ces diodes sont limitées à basse température (typiquement < 120K) par le courant de génération-recombinaison et/ou par le courant tunnel assisté par pièges. La durée de vie extraite de la simulation suit une variation en T-1/2, démontrant que les mécanismes limitant les photodiodes est la génération-recombinaison SRH. Appliquée aux structures GaSb-rich, l'approche SILVACO ne peut expliquer les résultats en courant. Nous démontrons que ces résultats sont fortement liés à la présence du champ électrique dans la zone d'absorption du composant. Cela génère à faible polarisation, un fort courant tunnel, au travers des états Wannier-Stark localisés, qui pénalise fortement le courant d'obscurité et cela malgré des améliorations obtenues au niveau du matériau. Pour finir, nous établissons des règles de dimensionnement de structures à barrière et nous proposons une structure à SR pour le lointain infrarouge. / Among the high performance cooled infrared (IR) photodetector systems, the InAs/GaSb superlattice (SL) is an emerging material which may complement the currently technologies already established. Over the last 10 years, the Institut d'Electronique du Sud (IES) of the University of Montpellier has developed skills in both the growth of SL materials by molecular beam epitaxy and the process fabrication of pin photodiodes. The photodiode fabricated by the IES group are at the state of the art in the mid IR (3 – 5 μm). During this thesis, we studied two structures with different SL periods for the pin active zone showing the same cut-off wavelength of 5 μm at 80K: the structure called InAs-rich structure presents InAs layer thicker than the GaSb layer in each SL period while this configuration is reversed in the case of the GaSb-rich structure. These SL structures have very different electrical and electro-optical characteristics. In particular, the current densities of the InAs-rich structure are very good, about 10-8 A/cm2 at 80K - two orders of magnitude greater than that of GaSb-rich. The aim of this thesis work was therefore to analyze the performance of these photodiodes. For this purpose, we developed a simulation method with the SILVACO TCAD tool. Using this tool, we found that the InAs-rich diodes are limited at low temperatures (typically under 120K) by generation recombination and/or by assisted tunneling currents. The lifetimes extracted from the simulation follows the T-1/2 law, which demonstrates that the limiting mechanism is SRH recombination. However, we found that we could not study the current densities of the GaSb-rich structure using the same procedure. We demonstrate that these results are strongly related to the presence of the electric field in the absorption zone of the device. This electric field generates, at low biases, a strong tunneling current through localized Wannier-Stark states, which strongly limits the overall current despite material improvements. Finally, we define the design conditions to achieve an optimized SL barrier structure and propose a design for SL structures targeting the long wavelength domain.