The purpose of this thesis is to find out carrier concentration in nitride semiconductors by micro Raman measurements. We focus on the Raman measurements of two different III-nitride semiconductors doped with Si. First series is narrow band gap InN films with varying carrier concentration (ne). The highest (ne) in this series is 1.9 X 1019 cm-3. The second series is wide band gap GaN films, with highest (ne) of 8.0 X 1019 cm-3.From the room temperature Ramam measurements ,it is observed that the L- LOPCM (lower branch of longitudinal-optical phonon-plasmon coupled modes) depends on the carrier concentration. We focus the further analysis of this result and try to extract the carrier concentration and compare with electrical measurements.