<p> A necessity of tribological systems in aerospace applications is functioning with long lifetimes and high efficiencies. Such demanding applications can prohibit the use of traditional lubricants due to physical, chemical, thermal, or other environmental challenges. This dissertation proposed to fulfill the need for advanced performing bearing materials in challenging conditions by using the body of knowledge gathered on a particular alumina-PTFE composite to improve tribomaterials design. </p><p> The current model for alumina-PTFE necessitates a hard filler with multi-scale functionality and an operating environment that supports beneficial tribochemistry. This study proposed to satisfy the current model requirements by replacing alumina with a soft micro-sized filler that also supports tribochemistry in any environment. Several materials could meet these filler requirements, including micro-sized PEEK. A tribology study on PEEK-PTFE composites was implemented to test the proposed model for a relatively soft filler in lubricious matrix to display advanced bearing performance in conditions representing terrestrial and space operating environments. </p><p> To conduct the proposed investigation, prior work was necessary to increase sample testing capacity and improve assessment of results. First, there existed a logistical limitation to the number of polymer materials that could undergo tribology testing in a timely manner. This barrier was overcome by designing, fabricating, prototyping, and implementing a wear testing tribometer with high-throughput capabilities. Second, it was necessary to establish a standard for numerically assessing the success or failure of polymer materials in bearing applications. This goal was achieved by studying common polymers and polymer composites, with a wide range in bearing performance, to identify a quantitative metric to reliably predict polymer wear rate. Finally, the equipment and methodologies developed in this dissertation were applied to testing PEEK-PTFE composites. </p><p> This study identified PEEK-PTFE as the first solid lubricant to demonstrate ultralow wear rates and moderate friction in both dry and humid conditions, which support the high potential for this tribomaterial to fulfill the needs of the aerospace industry. The outcomes of this investigation have enhanced the understanding of tribological mechanisms driving the success of polymeric solid lubricants, and opened avenues for designing more composites to display advanced bearing performance in challenging environmental conditions.</p><p>

A Metal-Insulator-Metal (MIM) diode is a device that can achieve rectification at high frequencies. The main objective of this research work is designing, fabricating, and characterizing thin film MIM diodes with single and multi-insulator layers. 
Cr/Al₂O₃/Cr and Pt/Al₂O₃/Al MIM diodes have been fabricated to show the impact of the materials on the current-voltage (I-V) curve. It is illustrated that the Cr/Al₂O₃/Cr MIM diode has a symmetrical I-V curve while the Pt/Al₂O₃/Al MIM diode has a very asymmetrical I-V curve. 
MIM diodes with single and multi-insulator layers have been fabricated to demonstrate the impact of the number of insulators on a MIM diode’s performance. It is found that by repeating two insulator layers with different electron affinities and keeping the total insulator thickness the same, the asymmetry and nonlinearity values show a significant improvement in a MIM diode. While the asymmetry of the diode with a double insulator layer (MI²M) is 3, it is 90 for the diode with a quadra insulator layer (MI⁴M), which 30 times greater than that of the MI²M diode.

A Metal-Insulator-Metal (MIM) diode is a device that can achieve rectification at high frequencies. The main objective of this research work is designing, fabricating, and characterizing thin film MIM diodes with single and multi-insulator layers. 
Cr/Al₂O₃/Cr and Pt/Al₂O₃/Al MIM diodes have been fabricated to show the impact of the materials on the current-voltage (I-V) curve. It is illustrated that the Cr/Al₂O₃/Cr MIM diode has a symmetrical I-V curve while the Pt/Al₂O₃/Al MIM diode has a very asymmetrical I-V curve. 
MIM diodes with single and multi-insulator layers have been fabricated to demonstrate the impact of the number of insulators on a MIM diode’s performance. It is found that by repeating two insulator layers with different electron affinities and keeping the total insulator thickness the same, the asymmetry and nonlinearity values show a significant improvement in a MIM diode. While the asymmetry of the diode with a double insulator layer (MI²M) is 3, it is 90 for the diode with a quadra insulator layer (MI⁴M), which 30 times greater than that of the MI²M diode.

This thesis addresses nanostructure fabrication techniques based on electron beam lithography, which is the most widely employed nanofabrication techniques for R&D and for the prototyping or production of photo-mask or imprint mold. The focus is on the study of novel resist and development process, as well as pattern transfer procedure after lithography. Specifically, this thesis investigates the following topics that are related to either electron beam resists, their development, or pattern transfer process after electron beam lithography: (1) The dry thermal development (contrary to conventional solvent development) of negative electron beam resists polystyrene (PS) to achieve reasonably high contrast and resolution. (2) The solvent development for polycarbonate electron beam resist, which is more desirable than the usual hot aqueous solution of NaOH developer, to achieve a low contrast that is ideal for grayscale lithography. (3) The fabrication of metal nanostructure by electron beam lithography and dry liftoff (contrary to the conventional liftoff using a strong solvent or aqueous solution), to achieved down to ~50 nm resolution. (4) The study a novel electron beam resist poly(sodium 4-styrenesulfonate) (sodium PSS) that is water soluble and water developable, to fabricate the feature size down to ~ 40 nm. And finally, (5) The fabrication of gold nanostructure on a thin membrane, which will be used as an object for novel x-ray imaging, where we developed the fabrication process for silicon nitride membrane, electroplating of gold, and pattern transfer after electron beam lithography using single layer resist and tri-layer resist stack.

Zinc oxide (ZnO) nanostructures, especially nanowires, have been one of the most important semiconductive materials used for photocatalysis due to their unique material properties and remarkable performance. In this project, vertically-aligned ZnO nanowires on glass substrate have been synthesized by using the facile hydrothermal methods with the help of pre-coated ZnO seeding layer. The crystalline structure, morphology and UV-Vis transmission spectra of the as-synthesized sample were characterized by X-ray diffraction (XRD), field-emission scanning electron microscopy (FE-SEM) and Ultra-violet Visible (UV-Vis) Spectrophotometer. The photocatalytic activity of the sample was examined for the photocatalytic degradation of methyl orange (MO) as the test dye in aqueous solution under UV-A irradiation. The extent of direct hydrolysis of the MO dye under UV light without the photocatalysts was first measured to eliminate the possible contribution from the undesired variables to the overall efficiency. The effects of pH and initial concentration of the MO solution, as well as the nanowire growth time, on the photocatalytic efficiency have been investigated, in order to determine the optimal conditions for photocatalytic applications of ZnO nanowires in the industry. Furthermore, the reproducibility of the experimental methods used in this project was tested to ensure the reliability of the experimental results obtained; and the reusability of the prepared ZnO nanowire arrays were also evaluated to investigate the stability of the products for photocatalytic applications in a large scale. In addition, a micro-chamber based microfluidic device with integrated ZnO nanowire arrays has been fabricated and used for photodegradation studies of MO solution under continuous-flow conditions. As expected, the micro-chamber based approach exhibited much improved photodegradation efficiency as compared to the conventional method using bulk dye solution. The effects of the flow rate and chamber height of the microfluidic device have also been investigated in order to determine the optimal experimental conditions for photodegradation reactions in microfluidic devices.

Zinc oxide (ZnO) nanostructures, especially nanowires, have been one of the most important semiconductive materials used for photocatalysis due to their unique material properties and remarkable performance. In this project, vertically-aligned ZnO nanowires on glass substrate have been synthesized by using the facile hydrothermal methods with the help of pre-coated ZnO seeding layer. The crystalline structure, morphology and UV-Vis transmission spectra of the as-synthesized sample were characterized by X-ray diffraction (XRD), field-emission scanning electron microscopy (FE-SEM) and Ultra-violet Visible (UV-Vis) Spectrophotometer. The photocatalytic activity of the sample was examined for the photocatalytic degradation of methyl orange (MO) as the test dye in aqueous solution under UV-A irradiation. The extent of direct hydrolysis of the MO dye under UV light without the photocatalysts was first measured to eliminate the possible contribution from the undesired variables to the overall efficiency. The effects of pH and initial concentration of the MO solution, as well as the nanowire growth time, on the photocatalytic efficiency have been investigated, in order to determine the optimal conditions for photocatalytic applications of ZnO nanowires in the industry. Furthermore, the reproducibility of the experimental methods used in this project was tested to ensure the reliability of the experimental results obtained; and the reusability of the prepared ZnO nanowire arrays were also evaluated to investigate the stability of the products for photocatalytic applications in a large scale. In addition, a micro-chamber based microfluidic device with integrated ZnO nanowire arrays has been fabricated and used for photodegradation studies of MO solution under continuous-flow conditions. As expected, the micro-chamber based approach exhibited much improved photodegradation efficiency as compared to the conventional method using bulk dye solution. The effects of the flow rate and chamber height of the microfluidic device have also been investigated in order to determine the optimal experimental conditions for photodegradation reactions in microfluidic devices.

This thesis addresses nanostructure fabrication techniques based on electron beam lithography, which is the most widely employed nanofabrication techniques for R&D and for the prototyping or production of photo-mask or imprint mold. The focus is on the study of novel resist and development process, as well as pattern transfer procedure after lithography. Specifically, this thesis investigates the following topics that are related to either electron beam resists, their development, or pattern transfer process after electron beam lithography: (1) The dry thermal development (contrary to conventional solvent development) of negative electron beam resists polystyrene (PS) to achieve reasonably high contrast and resolution. (2) The solvent development for polycarbonate electron beam resist, which is more desirable than the usual hot aqueous solution of NaOH developer, to achieve a low contrast that is ideal for grayscale lithography. (3) The fabrication of metal nanostructure by electron beam lithography and dry liftoff (contrary to the conventional liftoff using a strong solvent or aqueous solution), to achieved down to ~50 nm resolution. (4) The study a novel electron beam resist poly(sodium 4-styrenesulfonate) (sodium PSS) that is water soluble and water developable, to fabricate the feature size down to ~ 40 nm. And finally, (5) The fabrication of gold nanostructure on a thin membrane, which will be used as an object for novel x-ray imaging, where we developed the fabrication process for silicon nitride membrane, electroplating of gold, and pattern transfer after electron beam lithography using single layer resist and tri-layer resist stack.