A Metal-Insulator-Metal (MIM) diode is a device that can achieve rectification at high frequencies. The main objective of this research work is designing, fabricating, and characterizing thin film MIM diodes with single and multi-insulator layers. 
Cr/Al₂O₃/Cr and Pt/Al₂O₃/Al MIM diodes have been fabricated to show the impact of the materials on the current-voltage (I-V) curve. It is illustrated that the Cr/Al₂O₃/Cr MIM diode has a symmetrical I-V curve while the Pt/Al₂O₃/Al MIM diode has a very asymmetrical I-V curve. 
MIM diodes with single and multi-insulator layers have been fabricated to demonstrate the impact of the number of insulators on a MIM diode’s performance. It is found that by repeating two insulator layers with different electron affinities and keeping the total insulator thickness the same, the asymmetry and nonlinearity values show a significant improvement in a MIM diode. While the asymmetry of the diode with a double insulator layer (MI²M) is 3, it is 90 for the diode with a quadra insulator layer (MI⁴M), which 30 times greater than that of the MI²M diode.

A Metal-Insulator-Metal (MIM) diode is a device that can achieve rectification at high frequencies. The main objective of this research work is designing, fabricating, and characterizing thin film MIM diodes with single and multi-insulator layers. 
Cr/Al₂O₃/Cr and Pt/Al₂O₃/Al MIM diodes have been fabricated to show the impact of the materials on the current-voltage (I-V) curve. It is illustrated that the Cr/Al₂O₃/Cr MIM diode has a symmetrical I-V curve while the Pt/Al₂O₃/Al MIM diode has a very asymmetrical I-V curve. 
MIM diodes with single and multi-insulator layers have been fabricated to demonstrate the impact of the number of insulators on a MIM diode’s performance. It is found that by repeating two insulator layers with different electron affinities and keeping the total insulator thickness the same, the asymmetry and nonlinearity values show a significant improvement in a MIM diode. While the asymmetry of the diode with a double insulator layer (MI²M) is 3, it is 90 for the diode with a quadra insulator layer (MI⁴M), which 30 times greater than that of the MI²M diode.

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The resonant tunneling diode (RTD) is the fastest electron device to-date in terms of its ability to generate continuous-wave terahertz frequency at room temperature, owing to its unique characteristic of negative differential resistance (NDR). In this work, a lattice-matched In0.53Ga0.47As (on InP) is used as the cladding layer, while a highly-compressive strained In0.8Ga0.2As is sandwiched between two tensile-strained pseudomorphic AlAs barriers to form the active double barrier quantum well RTD structure grown by Molecular Beam Epitaxy. The ultimate aim of this work was to integrate an optimised RTD into an oscillator circuit to enable a 100 GHz (W-band) MMIC RTD oscillator. One of the key challenges in this work was to improve the DC performance of the RTD, through extensive material and structural characterisations. Growing nano-scale epitaxial layers require a high degree of controllability with mono-layer precision. The dependencies of the NDR components, such as the peak current density, peak voltage and peak-to-valley current ratio (PVCR) towards variations in structural thickness were studied systematically. Through this work, it is found that the peak current density is strongly affected by monolayer variation in barrier thickness. The effect of quantum well thickness variation towards peak current density is relatively weaker. Interestingly, variation in spacer layer thickness has very little influence towards the magnitude of the peak current density. The fabrication of the RTD using a conventional i-line optical lithography created its own challenge. The process capability to reduce mesa active area down to sub-micrometer level to reduce device’s geometrical capacitance for high frequency, THz applications has been made feasible in this work. The conventional i-line optical lithography was combined with a newly developed tri-layer soft reflow technique using solvent vapour resulted in sub-micrometer RTDs. The DC characterisation of the fabricated RTDs showed excellent device scalability, indicating a robust processing. This novel sub-micron processing technique with high throughput and repeatability is a very promising low cost technique. A collaborative effort between the University of Manchester and Glasgow paved the way towards the realisation of an integrated W-band RTD MMIC oscillator. The circuit-combining topology was designed by the High Frequency Electronics Group in Glasgow while the mask-layout and oscillator fabrication took place in Manchester. An active RTD from sample XMBE#301 with peak current density of 1.4 x 105 A/cm2 and PVCR of 4.5 was integrated into a 100 GHz MMIC oscillator to successfully produce a measured frequency of 109 GHz with an un-optimised 5.5 μW output power at room temperature (mesa area = 4x4 μm2).

京都大学 / 新制・課程博士 / 博士(理学) / 甲第23451号 / 理博第4745号 / 新制||理||1680(附属図書館) / 京都大学大学院理学研究科物理学・宇宙物理学専攻 / (主査)教授 田中 耕一郎, 教授 佐々 真一, 教授 金光 義彦 / 学位規則第4条第1項該当 / Doctor of Science / Kyoto University / DFAM

Innovative nano-scale devices have been developed to enhance future circuit design to overcome physical barriers hindering complementary metal-oxide semiconductor (CMOS) technology. Among the emerging nanodevices, resonant tunneling diodes (RTDs) have demonstrated promising electronic features due to their high speed switching capability and functional versatility. Great circuit functionality can be achieved through integrating heterostructure field-effect transistors (HFETs) in conjunction with RTDs to modulate effective negative differential resistance (NDR). However, RTDs are intrinsically suitable for implementing threshold logic rather than Boolean logic which has dominated CMOS technology in the past. To fully take advantage of such emerging nanotechnology, efficient design methodologies and design automation tools for threshold logic therefore become essential. In this thesis, we first propose novel programmable logic elements (PLEs) implemented in threshold gates (TGs) and multi-threshold threshold gates (MTTGs) by exploring RTD/ HFET monostable-bistable transition logic element (MOBILE) principles. Our three-input PLE can be configured through five control bits to realize all the three-variable logic functions, which is, to the best of our knowledge, the first single RTD-based structure that provides complete logic implementation. It is also a more efficient reconfigurable circuit element than a general look-up table which requires eight configuration bits for three-variable functions. We further extend the design concept to construct a more versatile four-input PLE. A comprehensive comparison of three- and four-input PLEs provides an insightful view of design tradeoffs between performance and area. We present the mathematical proof of PLE's logic completeness based on Shannon Expansion, as well as the HSPICE simulation results of the programmable and primitive RTD/HFET gates that we have designed. An efficient control bit generating algorithm is developed by using a special encoding scheme to implement any given logic function. In addition, we propose novel techniques of formulating a given threshold logic in conjunctive normal form (CNF) that facilitates efficient SAT-based equivalence checking for threshold logic networks. Three different strategies of CNF generation from threshold logic representations are implemented. Experimental results based on MCNC benchmarks are presented as a complete comparison. Our hybrid algorithm, which takes into account input symmetry as well as input weight order of threshold gates, can efficiently generate CNF formulas in terms of both SAT solving time and CNF generating time. / Master of Science

abstract: This work is an investigation into the information provided by the concurrent use of in situ reflection high energy electron diffraction (RHEED) and reflection electron energy loss spectroscopy (REELS). The two analytical methods were employed during growth of metal, semiconductor and superconductor thin films by molecular beam epitaxy (MBE). Surface sensitivity of the REELS spectrometer was found to be less than 1 nm for 20 KeV electrons incident at a 2 degree angle to an atomically flat film surface, agreeing with the standard electron escape depth data when adjusted incident angle. Film surface topography was found to strongly influence the REELS spectra and this was correlated with in situ RHEED patterns and ex situ analysis by comparison with atomic force microscopy (AFM). It was observed in all the experimental results that from very smooth films the plasmon peak maxima did not fall at the predicted surface plasmon values but at slightly higher energies, even for nearly atomically flat films. This suggested the REELS plasmon loss spectra are always a combination of surface and bulk plasmon losses. The resulting summation of these two types of losses shifted the peak to below the bulk plasmon value but held its minimum to a higher energy than the pure surface plasmon value. Curve fitting supported this conclusion. / Dissertation/Thesis / Ph.D. Engineering Science 2012

京都大学 / 0048 / 新制・課程博士 / 博士(理学) / 甲第17771号 / 理博第3894号 / 新制||理||1562(附属図書館) / 30578 / 京都大学大学院理学研究科化学専攻 / (主査)教授 谷村 吉隆, 准教授 安藤 耕司, 教授 寺嶋 正秀 / 学位規則第4条第1項該当 / Doctor of Science / Kyoto University / DGAM

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