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Interface study for template release in step and flash imprint lithographyWu, Kai 28 August 2008 (has links)
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Interface study for template release in step and flash imprint lithographyWu, Kai, January 1900 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2006. / Vita. Includes bibliographical references.
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Step and flash imprint lithography materials and process development /Johnson, Stephen Christopher. Willson, C. G. January 2005 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2005. / Supervisor: C. Grant Willson. Vita. Includes bibliographical references.
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Fluid and solid mechanics in the step and flash imprint lithography processReddy, Shravanthi, January 1900 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2006. / Vita. Includes bibliographical references.
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Graft polymerization lithographyBrodsky, Colin John. January 2001 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2001. / Vita. Includes bibliographical references. Available also from UMI/Dissertation Abstracts International.
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Step and flash imprint lithography a low-pressure, room-temperature nanoimprint lithography /Colburn, Matthew Earl, January 2001 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2001. / Vita. Includes bibliographical references. Available also from UMI/Dissertation Abstracts International.
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Understanding fundamental mechanisms of photoresist dissolutionBurns, Sean David. January 2003 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2003. / Vita. Includes bibliographical references. Available also from UMI Company.
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Step and flash imprint lithography : a low-pressure, room-temperature nanoimprint lithography /Colburn, Matthew Earl, January 2001 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2001. / Vita. Includes bibliographical references (leaves 248-251). Available also in a digital version from Dissertation Abstracts.
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Understanding fundamental mechanisms of photoresist dissolutionBurns, Sean David 28 August 2008 (has links)
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Catalyst diffusion in positive-tone chemically amplified photoresistsStewart, Michael Dean 28 August 2008 (has links)
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