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Materials for advanced microlithography polymers for 157 nm lithography and acid diffusion measurements /Tran, Hoang Vi. January 2002 (has links) (PDF)
Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references. Available also from UMI Company.
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Design, synthesis, and optimization of materials for 193 nm and 157 nm photoresists /Patterson, Kyle William, January 2000 (has links)
Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 178-183). Available also in a digital version from Dissertation Abstracts.
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