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Characterisation of a data transmission link / Characterisation of a data transmission linkJohansson, Christian, Karlsson, Marcus January 2004 (has links)
<p>This report is the result of a Master Thesis work that has been performed between October 2003 and March 2004. The purpose of the work was to evaluate a part of the signal chain in a product of Micronic Laser Systems AB. The evaluation was performed to obtain the characterisation for the signal chain, such as impedances and crosstalk. </p><p>The work started with a literature study in order to refresh and increase the knowledge that was needed before the practical work. Then measurements, computer aided simulations and comparisons between these were performed. </p><p>Measurements were performed using TDR (Time Domain Reflectometry). The results showed the impedance levels along the signal chain. This was interesting since it showed how well the different parts in the system are matched. Unmatched parts result in reflections that disturb the transmitted signal and contribute to crosstalk, which also was measured. </p><p>Simulations were done using ADS (Advance Design System), a tool from Agilent Technologies Inc. A substantial part of the simulation work was to build models of the real system. These models have been used for simulation. The simulation results were then compared to the measurement results. </p><p>The results show that the system can be better matched concerning the channel impedance. There are large variations in impedance levels along the signal chain, resulting in signal reflections. Another effect studied is crosstalk between channels. Measurements and simulations showed the presence of crosstalk but it seems to be a minor problem in the current machine.</p>
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Characterisation of a data transmission link / Characterisation of a data transmission linkJohansson, Christian, Karlsson, Marcus January 2004 (has links)
This report is the result of a Master Thesis work that has been performed between October 2003 and March 2004. The purpose of the work was to evaluate a part of the signal chain in a product of Micronic Laser Systems AB. The evaluation was performed to obtain the characterisation for the signal chain, such as impedances and crosstalk. The work started with a literature study in order to refresh and increase the knowledge that was needed before the practical work. Then measurements, computer aided simulations and comparisons between these were performed. Measurements were performed using TDR (Time Domain Reflectometry). The results showed the impedance levels along the signal chain. This was interesting since it showed how well the different parts in the system are matched. Unmatched parts result in reflections that disturb the transmitted signal and contribute to crosstalk, which also was measured. Simulations were done using ADS (Advance Design System), a tool from Agilent Technologies Inc. A substantial part of the simulation work was to build models of the real system. These models have been used for simulation. The simulation results were then compared to the measurement results. The results show that the system can be better matched concerning the channel impedance. There are large variations in impedance levels along the signal chain, resulting in signal reflections. Another effect studied is crosstalk between channels. Measurements and simulations showed the presence of crosstalk but it seems to be a minor problem in the current machine.
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Navigation, Visualisation and Editing of Very Large 2D Graphics ScenesKempe, Marcus, Åbjörnsson, Carl January 2004 (has links)
<p>The project has been carried out at, and in association with, Micronic Laser Systems AB in Täby, Sweden. Micronic Laser Systems, manufacture laser pattern generators for the semiconductor and display markets. Laser pattern generators are used to create photomasks, which are a key component in the microlithographic process of manufacturing microchips and displays. </p><p>An essential problem to all modern semiconductor manufacturing is the constantly decreasing sizes of features and increasing use of resolution enhancement techniques (RET), leading to ever growing sizes of datasets describing the semiconductors. When sizes of datasets reach magnitudes of hundreds of gigabytes, visualisation, navigation and editing of any such dataset becomes extremely difficult. As of today this problem has no satisfying solution. </p><p>The project aims at the proposal of a geometry engine that effectively can deal with the evergrowing sizes of modern semiconductor lithography. This involves a new approach to handling data, a new format for spatial description of the datasets, hardware accelerated rendering and support for multiprocessor and distributed systems. The project has been executed without implying changes to existing data formats and the resulting application is executable on Micronics currently existing hardware platforms. </p><p>The performance of the new viewer system surpasses any old implementation by a varying factor. If rendering speed is the comparative factor, the new system is about 10-20 times faster than its old counterparts. In some cases, when hard disk access speed is the limiting factor, the new implementation is only slightly faster or as fast. And finally, spatial indexing allow some operations that previously lasted several hours, to complete in a few seconds, by eliminating all unnecessary disk-reading operations.</p>
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Navigation, Visualisation and Editing of Very Large 2D Graphics ScenesKempe, Marcus, Åbjörnsson, Carl January 2004 (has links)
The project has been carried out at, and in association with, Micronic Laser Systems AB in Täby, Sweden. Micronic Laser Systems, manufacture laser pattern generators for the semiconductor and display markets. Laser pattern generators are used to create photomasks, which are a key component in the microlithographic process of manufacturing microchips and displays. An essential problem to all modern semiconductor manufacturing is the constantly decreasing sizes of features and increasing use of resolution enhancement techniques (RET), leading to ever growing sizes of datasets describing the semiconductors. When sizes of datasets reach magnitudes of hundreds of gigabytes, visualisation, navigation and editing of any such dataset becomes extremely difficult. As of today this problem has no satisfying solution. The project aims at the proposal of a geometry engine that effectively can deal with the evergrowing sizes of modern semiconductor lithography. This involves a new approach to handling data, a new format for spatial description of the datasets, hardware accelerated rendering and support for multiprocessor and distributed systems. The project has been executed without implying changes to existing data formats and the resulting application is executable on Micronics currently existing hardware platforms. The performance of the new viewer system surpasses any old implementation by a varying factor. If rendering speed is the comparative factor, the new system is about 10-20 times faster than its old counterparts. In some cases, when hard disk access speed is the limiting factor, the new implementation is only slightly faster or as fast. And finally, spatial indexing allow some operations that previously lasted several hours, to complete in a few seconds, by eliminating all unnecessary disk-reading operations.
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