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Efficient Circuit Analysis under Multiple Input Switching (MIS)January 2012 (has links)
abstract: Characterization of standard cells is one of the crucial steps in the IC design. Scaling of CMOS technology has lead to timing un-certainties such as that of cross coupling noise due to interconnect parasitic, skew variation due to voltage jitter and proximity effect of multiple inputs switching (MIS). Due to increased operating frequency and process variation, the probability of MIS occurrence and setup / hold failure within a clock cycle is high. The delay variation due to temporal proximity of MIS is significant for multiple input gates in the standard cell library. The shortest paths are affected by MIS due to the lack of averaging effect. Thus, sensitive designs such as that of SRAM row and column decoder circuits have high probability for MIS impact. The traditional static timing analysis (STA) assumes single input switching (SIS) scenario which is not adequate enough to capture gate delay accurately, as the delay variation due to temporal proximity of the MIS is ~15%-45%. Whereas, considering all possible scenarios of MIS for characterization is computationally intensive with huge data volume. Various modeling techniques are developed for the characterization of MIS effect. Some techniques require coefficient extraction through multiple spice simulation, and do not discuss speed up approach or apply models with complicated algorithms to account for MIS effect. The STA flow accounts for process variation through uncertainty parameter to improve product yield. Some of the MIS delay variability models account for MIS variation through table look up approach, resulting in huge data volume or do not consider propagation of RAT in the design flow. Thus, there is a need for a methodology to model MIS effect with less computational resource, and integration of such effect into design flow without trading off the accuracy. A finite-point based analytical model for MIS effect is proposed for multiple input logic gates and similar approach is extended for setup/hold characterization of sequential elements. Integration of MIS variation into design flow is explored. The proposed methodology is validated using benchmark circuits at 45nm technology node under process variation. Experimental results show significant reduction in runtime and data volume with ~10% error compared to that of SPICE simulation. / Dissertation/Thesis / Ph.D. Electrical Engineering 2012
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Incorporating the effect of delay variability in path based delay testingTayade, Rajeshwary G. 19 October 2009 (has links)
Delay variability poses a formidable challenge in both design and test of nanometer
circuits. While process parameter variability is increasing with technology scaling, as circuits
are becoming more complex, the dynamic or vector dependent variability is also increasing
steadily. In this research, we develop solutions to incorporate the effect of delay variability
in delay testing. We focus on two different applications of delay testing.
In the first case, delay testing is used for testing the timing performance of a circuit
using path based fault models. We show that if dynamic delay variability is not accounted for
during the path selection phase, then it can result in targeting a wrong set of paths for test.
We have developed efficient techniques to model the effect of two different dynamic effects
namely multiple-input switching noise and coupling noise. The basic strategy to incorporate
the effect of dynamic delay variability is to estimate the maximum vector delay of a path
without being too pessimistic.
In the second case, the objective was to increase the defect coverage of reliability
defects in the presence of process variations. Such defects cause very small delay changes and hence can easily escape regular tests. We develop a circuit that facilitates accurate
control over the capture edge and thus enable faster than at-speed testing. We further
develop an efficient path selection algorithm that can select a path that detects the smallest
detectable defect at any node in the presence of process variations. / text
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