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Seeded microfiltration of copper with modified activated carbonAwang, Abdul Rahman bin January 2001 (has links)
In this study the use of seeded microfiltration (MF) with modified powdered carbon focussed on the removal of copper ions from an aqueous solution. The aim of the study was to look into the possibility of utilisation of suitable modified activated carbons combined with membrane filtration (microfiltration) as an alternative technique for the treatment and recovery of copper ions from liquid wastes, to give high removal efficiency with low energy consumption. To enhance the filtration process, the particle size of modified activated carbon used was small because it provides a larger surface area and a shorter diffusional distance for base metals to be adsorbed. Furthermore, in order to minimise the fouling effect, a surface filter (nickel membrane) which had pores, or slots, that passed directly from one side of the filter to the other with no tortuosity was used.
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Crescimento de cristais de KHsub2POsub4 por metodos a partir de solucao aquosaFREY, BIRGIT Y. 09 October 2014 (has links)
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04225.pdf: 3657624 bytes, checksum: 1c1f3312aa7ca8c7b185e9209815c228 (MD5) / Dissertacao (Mestrado) / IPEN/D / Instituto de Pesquisas Energeticas e Nucleares - IPEN/CNEN-SP
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Crescimento de cristais de KHsub2POsub4 por metodos a partir de solucao aquosaFREY, BIRGIT Y. 09 October 2014 (has links)
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04225.pdf: 3657624 bytes, checksum: 1c1f3312aa7ca8c7b185e9209815c228 (MD5) / Dissertacao (Mestrado) / IPEN/D / Instituto de Pesquisas Energeticas e Nucleares - IPEN/CNEN-SP
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Contaminacao radioativa das roupas protetoras feitas de tecido e sua decontaminacao em solucoes aquosasFUKUMORI, DAVID T. 09 October 2014 (has links)
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03529.pdf: 1961648 bytes, checksum: e06abd1b76cadfd53cd1f77421b2f96e (MD5) / Dissertacao (Mestrado) / IPEN/D / Instituto de Pesquisas Energeticas e Nucleares - IPEN/CNEN-SP
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Contaminacao radioativa das roupas protetoras feitas de tecido e sua decontaminacao em solucoes aquosasFUKUMORI, DAVID T. 09 October 2014 (has links)
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03529.pdf: 1961648 bytes, checksum: e06abd1b76cadfd53cd1f77421b2f96e (MD5) / Dissertacao (Mestrado) / IPEN/D / Instituto de Pesquisas Energeticas e Nucleares - IPEN/CNEN-SP
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The photoactivation of wet oxidation processesRance, Peter Jonathan Watson January 1994 (has links)
No description available.
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Estudo de sistemas dosimetricos - sulfato ferroso-sulfato ferrico ,placas de vidro e solucoes aquosas coloridasFERNANDES, LIZETE 09 October 2014 (has links)
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00455.pdf: 1480692 bytes, checksum: c0d7531bae9d7c20b5051f1cf4368b8b (MD5) / Dissertacao (Mestrado) / IEA/D / Instituto de Energia Atomica - IEA
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Estudo de sistemas dosimetricos - sulfato ferroso-sulfato ferrico ,placas de vidro e solucoes aquosas coloridasFERNANDES, LIZETE 09 October 2014 (has links)
Made available in DSpace on 2014-10-09T12:30:04Z (GMT). No. of bitstreams: 0 / Made available in DSpace on 2014-10-09T14:09:41Z (GMT). No. of bitstreams: 1
00455.pdf: 1480692 bytes, checksum: c0d7531bae9d7c20b5051f1cf4368b8b (MD5) / Dissertacao (Mestrado) / IEA/D / Instituto de Energia Atomica - IEA
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Electrodeposition of gallium arsenide from aqueous solutionsYang, Ming-Chang January 1990 (has links)
No description available.
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The refractive index and absorbance of aqueous and organic fluids for immersion lithographyCostner, Elizabeth A. 02 June 2010 (has links)
The semiconductor industry is continually challenged to maintain the trend
identified in 1965 by Gordon Moore of increasing the density of transistors on an
integrated circuit. These advances have been achieved by increasing the resolution that
can be printed with photolithography, traditionally by decreasing the exposure
wavelength. Decreasing the exposure wavelength from 193 nm, the current state of the
art, presents significant technical challenges. To circumvent these challenges, resolution
can be increased by enabling increases in numerical aperture (without changing the
exposure wavelength), using immersion lithography. In immersion lithography, the air
gap between the photoresist-coated wafer and lens is replaced with a high refractive
index fluid. Immersion lithography has been demonstrated with water as the immersion
fluid. With water immersion lithography at 193 nm, the maximum resolution that can be
printed can be decreased from 65 nm to 45 nm. To enable further resolution increases,
immersion fluids with a higher index than water are needed. The requirements for next generation high index fluids are: an index of refraction higher than water, high
transparency, and physical properties similar to water.
A variety of methods to identify a high index fluid were completed. First, the
optical properties of aqueous solutions of metal cations with varying anions were tested.
A series of linear, cyclic, and polycyclic alkanes were also studied, since saturated
systems have electronic transitions at wavelengths less than 200 nm, to provide the
necessary transparency at 193 nm. Large alkane groups were also incorporated into
either the cation or anion of a salt to develop an aqueous solution with the optical
properties of a saturated hydrocarbon. In addition to these empirical surveys, a modeling
approach was used to develop “designer” absorbance spectra that would correspond to
fluids with a high index and low absorbance at 193 nm.
Additionally, in Appendix D, the results of an electrochemical study of the
diffusion coefficient of ferrocene methanol in poly(ethylene glycol) diacrylate hydrogels
of varying molecular weight and water content will be presented. The results of these
mass transport studies can be used to qualitatively understand the mass transport
characteristics of additional species in the hydrogel. / text
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