The Phase Induced Amplitude Apodization Complex Mask Coronagraph (PIAACMC) is an architecture for directly observing extrasolar planets, and can achieve performance near the theoretical limits for any direct-detection instrument. The PIAACMC architecture includes aspheric PIAA optics, and a complex phase-shifting focal plane mask that provides a pi phase shift to a portion of the on-axis starlight. The phase-shifted starlight is forced to interfere destructively with the un-shifted starlight, causing the starlight to be eliminated, and allowing a region for high-contrast imaging near the star. The PIAACMC architecture can be designed for segmented and obscured apertures, so it is particularly well suited for ground-based observing with the next generation of large telescopes. There will be unique scientific opportunities for directly observing Earth-like planets around nearby low-mass stars. We will discuss design strategies for adapting PIAACMC for the next generation of large ground-based telescopes, and present progress on the development of the focal plane mask technology. We also present simulations of wavefront control with PIAACMC, and suggest directions to apply the coronagraph architecture to future telescopes.

The search for life on other worlds is an exciting scientific endeavor that could change the way we perceive our place in the universe. Thousands of extrasolar planets have been discovered using indirect detection techniques. One of the most promising methods for discovering new exoplanets and searching for life is direct imaging with a coronagraph. Exoplanet coronagraphy of Earth-like planets is a challenging task, but we have developed many of the tools necessary to make it feasible. The Phase-Induced Amplitude Apodization (PIAA) Coronagraph is one of the highest-performing architectures for direct exoplanet imaging. With a complex phase-shifting focal plane mask, the PIAA Complex Mask Coronagraph (PIAACMC) can approach the theoretical performance limit for any direct detection technique. The architecture design is flexible enough to be applied to any arbitrary aperture shape, including segmented and obscured apertures. This is an important feature for compatibility with next-generation ground and space-based telescopes. PIAA and PIAACMC focal plane masks have been demonstrated in monochromatic light. An important next step for high-performance coronagraphy is the development of broadband phase-shifting focal plane masks. In this dissertation, we present an algorithm for designing the PIAA and PIAACMC focal plane masks to operate in broadband. We also demonstrate manufacturing of the focal plane masks, and show laboratory results. We use simulations to show the potential performance of the coronagraph system, and the use of wavefront control to correct for mask manufacturing errors. Given the laboratory results and simulations, we show new areas of exoplanet science that can potentially be explored using coronagraph technology. The main conclusion of this dissertation is that we now have the tools required to design and manufacture PIAA and PIAACMC achromatic focal plane masks. These tools can be applied to current and future telescope systems to enable new discoveries in exoplanet science.

Complex-mask coronagraphs destructively interfere unwanted starlight with itself to enable direct imaging of exoplanets. This is accomplished using a focal plane mask (FPM); a FPM can be a simple occulter mask, or in the case of a complex-mask, is a multi-zoned device designed to phase-shift starlight over multiple wavelengths to create a deep achromatic null in the stellar point spread function. Creating these masks requires microfabrication techniques, yet many such methods remain largely unexplored in this context. We explore methods of fabrication of complex FPMs for a Phased-Induced Amplitude Apodization Complex-Mask Coronagraph (PIAACMC). Previous FPM fabrication efforts for PIAACMC have concentrated on mask manufacturability while modeling science yield, as well as assessing broadband wavelength operation. Moreover current fabrication efforts are concentrated on assessing coronagraph performance given a single approach. We present FPMs fabricated using several process paths, including deep reactive ion etching and focused ion beam etching using a silicon substrate. The characteristic size of the mask features is 5 mu m with depths ranging over 1 mu m. The masks are characterized for manufacturing quality using an optical interferometer and a scanning electron microscope. Initial testing is performed at the Subaru Extreme Adaptive Optics testbed, providing a baseline for future experiments to determine and improve coronagraph performance within fabrication tolerances.