The Phase Induced Amplitude Apodization Complex Mask Coronagraph (PIAACMC) is an architecture for directly observing extrasolar planets, and can achieve performance near the theoretical limits for any direct-detection instrument. The PIAACMC architecture includes aspheric PIAA optics, and a complex phase-shifting focal plane mask that provides a pi phase shift to a portion of the on-axis starlight. The phase-shifted starlight is forced to interfere destructively with the un-shifted starlight, causing the starlight to be eliminated, and allowing a region for high-contrast imaging near the star. The PIAACMC architecture can be designed for segmented and obscured apertures, so it is particularly well suited for ground-based observing with the next generation of large telescopes. There will be unique scientific opportunities for directly observing Earth-like planets around nearby low-mass stars. We will discuss design strategies for adapting PIAACMC for the next generation of large ground-based telescopes, and present progress on the development of the focal plane mask technology. We also present simulations of wavefront control with PIAACMC, and suggest directions to apply the coronagraph architecture to future telescopes.

Complex-mask coronagraphs destructively interfere unwanted starlight with itself to enable direct imaging of exoplanets. This is accomplished using a focal plane mask (FPM); a FPM can be a simple occulter mask, or in the case of a complex-mask, is a multi-zoned device designed to phase-shift starlight over multiple wavelengths to create a deep achromatic null in the stellar point spread function. Creating these masks requires microfabrication techniques, yet many such methods remain largely unexplored in this context. We explore methods of fabrication of complex FPMs for a Phased-Induced Amplitude Apodization Complex-Mask Coronagraph (PIAACMC). Previous FPM fabrication efforts for PIAACMC have concentrated on mask manufacturability while modeling science yield, as well as assessing broadband wavelength operation. Moreover current fabrication efforts are concentrated on assessing coronagraph performance given a single approach. We present FPMs fabricated using several process paths, including deep reactive ion etching and focused ion beam etching using a silicon substrate. The characteristic size of the mask features is 5 mu m with depths ranging over 1 mu m. The masks are characterized for manufacturing quality using an optical interferometer and a scanning electron microscope. Initial testing is performed at the Subaru Extreme Adaptive Optics testbed, providing a baseline for future experiments to determine and improve coronagraph performance within fabrication tolerances.