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Due to dramatic growth of capacity in optical fiber communication, the fiber dispersion has become one of major factors affecting the quality of optical signal transmission with different modulation scheme, leading to the importance in controlling optical chirp. Among the elements used for optical fiber communications, electroabsorption modulator (EAM) and semiconductor optical amplifier (SOA) are served as optical amplitude and phase modulation. In this work, EAM-integrated SOA is used to realize the pre-chirp technique through their inherently reversed phase modulation as well as amplitude modulation. In the experiment, tunable optical filter and a 10Gb/s data pattern are used for extracting the frequency chirp of the timely signal. With the positive chirp operation in EAM, it is found that the overall chirp of EAM-integrated SOA can be varied from 3GHz to -9GHz by adjusting current injection through SOA. Also, as inspecting the 10Gb/s pattern, the pattern effect can also be controlled by the reversed carrier dynamics between EAM and SOA. Finally, a 10Gb/s data transmission with 43km transmission is demonstrated by using such pre-chirp technique, showing that such technique can be applied to other type signal processing.

Pour les technologies avancées, la lithographie optique par immersion utilisant des sources 193nm atteint ses limites en termes de résolutions. Les nouvelles techniques de lithographie telles que l’Extrême UV ou l’écriture à faisceaux multiples n’étant pas encore au point d’un point de vue industriel, un ensemble de techniques d’améliorations de la résolution (RET) en évolution constante permet de continuer à travailler avec les équipements à immersion. C’est dans ce contexte que s’inscrit cette thèse en se focalisant sur un des éléments principaux : le réticule. La première partie regroupe l’état de l’art de la photolithographie optique et des techniques d’amélioration de la résolution, ainsi qu’un ensemble de notions utile à la compréhension des parties B et C. La partie B concerne la réduction des effets de focalisation, plus connu sous l’appellation anglaise ‘’Best focus shift mitigation’’, observés sur des niveaux denses de type ‘’Metal’’ pour les technologies avancées. Cette partie permet de comprendre l’influence des organes physiques sur le trajet optique et propose comme solution au Best focus Shift un changement de réticule, validé d’abord via simulation puis par voie expérimentale sur plaquette. La partie C de ce manuscrit présente la prise en compte des effets inhérents à la fabrication des réticules dans l’étape de correction des effets de proximité optique, de la description des effets impliqués à la calibration et l’utilisation d’un modèle dédié. / For advanced technologies nodes, immersion optical lithography using 193nm sources reaches its limits in terms of resolutions. Since new lithography techniques such as Extreme UV or multi-beam writing are not yet ready from an industrial point of view, a continuous evolving set of tools known as Resolution Enhancement Technics (RET) allows to continue working with immersion equipment, pushing the resolution limits as much as possible. With the increasing design complexity, this task is more and more challenging. Within this frame this dissertation is addressed to improve the lithographic process variability by focusing on one of the main elements: the reticles.The first part brings together the state of the art of optical photolithography and resolution improvement techniques, as well as a set of concepts useful for parts B and C understanding. Part B deals with the reduction of focusing effects, better known as "Best focus shift mitigation", observed on dense levels such as "Metal" for advanced technologies. This part helps to understand the influence of the physical organs on the optical path and proposes as a solution to the Best focus Shift a reticle change, firstly validated via simulation and then experimentally at wafer level. Part C presents how the inherent effects of reticle fabrication can be taken into account in the Optical Proximity effects Corrections steps, from the description of the effects involved to the calibration and the use of a dedicated mask model