Currently , the STN-LCD with twist angle of 240 degree is the most popular operation mode . In this thesis , we utilize Photo-Sensitive spacer of TFT-LCD to substitute for the traditional spacer , and apply them in the above mentioned STN-LCD . The traditional spacer were used N2 air to spray on glass substrate by SUS tube . It make light leakage , decrease the transmittance , contrast ratio and aggregate spacer easily . When we pressure on glass and the phenomenon of migration has been found accordingly . It will influence quality of LCD . So we utilize Photo-Sensitive spacer to substitute for the traditional spacer in order to improve the defect . In this thesis , we fabricate different kind Photo-Sensitive spacer of size , shape and area ratio (Photo-Resist (NPS) from Everlight Chemical Industrial Corp) . We utilize Photo Lithography process to form the spacer thickness on insulation layer , and find the best type . In this experiment , the different characteristic of material between traditional spacer and Photo-Spacer were compared . And we utilize different process condition (pressure) and material(LC £Gnd) to discuss the relation . Finally , we proof the advantage of Photo-Spacer apply in STN-LCD .