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11	Electrokinetic characteristics of particulate/liquid interfaces and their importance in contamination from semiconductor process liquids. Ali, Iqbal. January 1990 (has links) Particulate contamination during wafer processing is a major concern in the microelectronics industry. The impurities may be generated from holding tanks, shipping containers, filter membranes and photolithographic materials, and hence may be organic and inorganic in nature. In liquids, these particles develop a surface charge, the magnitude and sign of which is unique for a particular solid/liquid combination. The substrate that is processed in liquids also develops a similar surface charge, and if the charge on the substrate and impurity particles are opposite to each other, deposition of impurities onto the substrate is likely to occur. Hence an understanding of the surface charge characteristics may have an impact in developing techniques to control particulate contamination from semiconductor process liquids. In this work, an attempt has been made to elucidate the surface charge characteristics of a variety of organic and inorganic particles in liquids of interest to the semiconductor industry. The techniques of microelectrophoresis and streaming potential using flat plates and filter membranes were used to this end. The data obtained have been utilized to understand and predict particulate contamination from liquids and deposition onto the wafer surfaces. This might in turn be useful in developing filter membranes of interest to the semiconductor industry. Contamination Photoresists Zeta potential.
12	Design, synthesis, and evaluation of materials for microelectronics applications Heath, William Hoy, January 1900 (has links) (PDF) Thesis (Ph. D.)--University of Texas at Austin, 2006. / Vita. Includes bibliographical references. Photoresists. Polymers Microelectronics.
13	Design, synthesis, and optimization of materials for 193 nm and 157 nm photoresists / Patterson, Kyle William, January 2000 (has links) Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 178-183). Available also in a digital version from Dissertation Abstracts. Photoresists. Microlithography Polymers.
14	A novel method for zinc oxide nanowire sensor fabrication / Pelatt, Brian D. January 1900 (has links) Thesis (M.S.)--Oregon State University, 2010. / Printout. Includes bibliographical references (leaves 78-85). Also available on the World Wide Web. Nanowires. Photoresists. Zinc oxide.
15	Design and synthesis of materials for 157 nm photoresists applications Pinnow, Matthew James 28 August 2008 (has links) Not available / text Photoresists--Materials Photolithography
16	Advanced lithographic patterning technologies: materials and processes Taylor, James Christopher 28 August 2008 (has links) Not available / text Lithography Photoresists Photonic crystals
17	Advanced lithographic patterning technologies : materials and processes Taylor, James Christopher, 1980- 18 August 2011 (has links) Not available / text Lithography Photoresists Photonic crystals
18	A procedure to characterize electron-beam resist using a scanning electron microscope and study of process optimization of an electron beam imaging system using experimental design methods / Pyles, Randall C. January 1992 (has links) Thesis (M.S.)--Rochester Institute of Technology, 1992. / Typescript. Includes bibliographical references (leaves 114-116).
19	Evaluation of SU8 and ruthenium oxide materials for microfluidic devices Audrain, Margaret T. January 2008 (has links) (PDF) Thesis (M.S.)--Missouri University of Science and Technology, 2008. / Vita. The entire thesis text is included in file. Title from title screen of thesis/dissertation PDF file (viewed August 15, 2008) Includes bibliographical references.
20	The effects of agitation on positive photoresist image quality when using a bubble development system / Mogerley, Keith D. January 1983 (has links) Thesis (B.S.)--Rochester Institute of Technology, 1983. / Typescript. Includes bibliographical references (leaf 33).

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