Research was performed to study the particle adhesion on the wafer surface after the chemical-mechanical polishing (CMP) process. The embedded particles can be abrasive particles from the slurry, debris from pad material, and particles of film being polished. Different methods of particle removal mechanism were investigated in order to find out the most effective technique. In post-CMP cleaning, surfactant was added in the solution. Results were compared with cleaning without surfactant and showed that cleaning was more effective with the combined interaction of the mechanical effort from the brush sweeping and the chemistry of the surfactant in the solution (i.e., tribochemical interaction). Numerical analysis was also performed to predict the particle removal rate with the addition of surfactants. The van der Waals forces present in the wafer-particle interface were calculated in order to find the energy required to remove the particle. Finally, the adhesion process was studied by modeling the van der Waals force as a function of separation distance between the particle and the surface. The successful adaptation of elasticity theory to nanoparticle-surface interaction brought insight into CMP cleaning mechanisms. The model tells us that it is not always the case that as the separation distance is decreased, the attraction force will be increased. The force value estimated can be used for slurry design and CMP process estimation.

No description available.

Langmuir-Blodgett (LB) organic monomolecular (monolayer) films containing fatty acids and their perfluorinated counterparts separate into phases under certain conditions. These perfluorinated surfactant containing mixed-phase systems have been shown to exhibit many favourable attributes in comparison to non- perfluorinated surfactant monolayers. In this thesis project, two of these films were investigated. One film is a 2:1 ratio mixture of arachidic acid (C19H39COOH AA) to perfluorotetradecanoic acid (C13F27COOH PA), which phase-separates into hexagonal domains ~6 ìm large (2:1 ratio of AA to PA 2AA1PA). The other film is a 2:1 mixture of stearic acid (C17H35COOH - SA) to PA, which phase-separates into linear domains ~300 nm wide (2:1 ratio of SA to PA 2SA1PA).<p> Through the use of atomic force microscopy (AFM), and various synchrotron photoemission electron microscopy-based (PEEM) techniques, the films were characterized. As properties such as molecular organization, and dispersion of the molecules in the film, affect film function, it is necessary to use a variety of techniques to better understand order and composition in the films.<p> First, the well-known and previously-studied film, 2AA1PA, was used to better understand contrast mechanisms in the energy filtered x-ray photoemission electron microscope (X-PEEM) at the CLS. Through the use of techniques such as secondary electron emission microscopy (SEEM), ultraviolet photoelectron spectroscopy (UPS), and x-ray linear dichroism microscopy (XLDM), the effects of secondary electrons, valence character, and polarization dependence were studied so as to better understand their contribution to contrast in energy-filtered PEEM-based spectromicroscopy.<p> Second, the composition and organization of a novel system (2SA1PA), was characterized using traditional near-edge x-ray absorption fine-structure (NEXAFS) spectroscopy. As the size of the domains in the 2SA1PA system are below the spatial resolution limit of PEEM spectromicroscopy, methods involving selective phase dissolution, and spectrum subtraction, were used to acquire phase composition and molecular order information.<p> The high lateral and vertical spatial resolution of AFM allowed physical imaging and confirmation of sample structure, as well as very accurate domain height determination. X-PEEM supplements this with chemical sensitivity using high spatial resolution spectromicroscopy. Therefore, using AFM and X-PEEM as complimentary techniques, it is possible to physically and chemically characterize phase-separated monolayer films.

Anionic surfactants are wildly used in many industrial and household applications. Because anionic surfactants are used so widely, significant attention has focused on the removal of these contaminants from wastewater. Among various treatment techniques, biofiltration, such as trickling filter technologies, has been employed in many wastewater treatment plants (WWPTs) to remove anionic surfactants. However, current knowledge of the efficacy of trickling filter to remove anionic surfactants from wastewaters is limited. The present study characterized the performance of a high rate (i.e. roughing) trickling filter to remove anionic surfactants both at lab-scale and pilot-scale. Lab-scale tests investigated the biodegradation of anionic surfactants under controllable conditions were compared with those from previous studies by others. Pilot-scale tests investigated the efficacy of a trickling filter at removing anionic surfactants from a wastewater over an extended period of time. The data from the pilot-scale tests were used to model the performance of trickling filter at removing anionic surfactants from the wastewater, using first order and modified Velz models. The lab-scale tests indicated that high molecular weight anionic surfactants degrade faster than the low molecular weight surfactants. The biodegradation rates observed in the present study were similar to those from pervious studies by others. The pilot-scale tests indicated that roughing trickling filter could remove 11% to 29% of anionic surfactants and 4% to 22% of COD from the wastewater. Higher molecular weight anionic surfactants were more degradable. The experimental data could be accurately modeled using the modified Velz model (R² value more than 0.9). The degradation rates of modified Velz model for total anionic surfactants, high molecular weight anionic surfactants and COD were 0.053±0.0057, 0.088±0.0048 and 0.119±0.0111 (mIs)0.5 respectively. The pilot-scale test results indicated that a high rate (i.e., roughing) trickling filter was not capable of effectively removing anionic surfactants in the primary effluent at Lions Gate WWTP because a relatively large trickling filter area would be required to achieve the required surfactant removal efficiency.

Langmuir-Blodgett (LB) organic monomolecular (monolayer) films containing fatty acids and their perfluorinated counterparts separate into phases under certain conditions. These perfluorinated surfactant containing mixed-phase systems have been shown to exhibit many favourable attributes in comparison to non- perfluorinated surfactant monolayers. In this thesis project, two of these films were investigated. One film is a 2:1 ratio mixture of arachidic acid (C19H39COOH AA) to perfluorotetradecanoic acid (C13F27COOH PA), which phase-separates into hexagonal domains ~6 ìm large (2:1 ratio of AA to PA 2AA1PA). The other film is a 2:1 mixture of stearic acid (C17H35COOH - SA) to PA, which phase-separates into linear domains ~300 nm wide (2:1 ratio of SA to PA 2SA1PA).<p> Through the use of atomic force microscopy (AFM), and various synchrotron photoemission electron microscopy-based (PEEM) techniques, the films were characterized. As properties such as molecular organization, and dispersion of the molecules in the film, affect film function, it is necessary to use a variety of techniques to better understand order and composition in the films.<p> First, the well-known and previously-studied film, 2AA1PA, was used to better understand contrast mechanisms in the energy filtered x-ray photoemission electron microscope (X-PEEM) at the CLS. Through the use of techniques such as secondary electron emission microscopy (SEEM), ultraviolet photoelectron spectroscopy (UPS), and x-ray linear dichroism microscopy (XLDM), the effects of secondary electrons, valence character, and polarization dependence were studied so as to better understand their contribution to contrast in energy-filtered PEEM-based spectromicroscopy.<p> Second, the composition and organization of a novel system (2SA1PA), was characterized using traditional near-edge x-ray absorption fine-structure (NEXAFS) spectroscopy. As the size of the domains in the 2SA1PA system are below the spatial resolution limit of PEEM spectromicroscopy, methods involving selective phase dissolution, and spectrum subtraction, were used to acquire phase composition and molecular order information.<p> The high lateral and vertical spatial resolution of AFM allowed physical imaging and confirmation of sample structure, as well as very accurate domain height determination. X-PEEM supplements this with chemical sensitivity using high spatial resolution spectromicroscopy. Therefore, using AFM and X-PEEM as complimentary techniques, it is possible to physically and chemically characterize phase-separated monolayer films.

Research was performed to study the particle adhesion on the wafer surface after the chemical-mechanical polishing (CMP) process. The embedded particles can be abrasive particles from the slurry, debris from pad material, and particles of film being polished. Different methods of particle removal mechanism were investigated in order to find out the most effective technique. In post-CMP cleaning, surfactant was added in the solution. Results were compared with cleaning without surfactant and showed that cleaning was more effective with the combined interaction of the mechanical effort from the brush sweeping and the chemistry of the surfactant in the solution (i.e., tribochemical interaction). Numerical analysis was also performed to predict the particle removal rate with the addition of surfactants. The van der Waals forces present in the wafer-particle interface were calculated in order to find the energy required to remove the particle. Finally, the adhesion process was studied by modeling the van der Waals force as a function of separation distance between the particle and the surface. The successful adaptation of elasticity theory to nanoparticle-surface interaction brought insight into CMP cleaning mechanisms. The model tells us that it is not always the case that as the separation distance is decreased, the attraction force will be increased. The force value estimated can be used for slurry design and CMP process estimation.

No description available.

Thèse doctorat : Chimie Organique : Strasbourg 1 : 2007. / Titre provenant de l'écran-titre. Bibliogr. p. 255-273.

Thèse de doctorat : Chimie physique. Physico-Chimie de la matière molle : Strasbourg 1 : 2006. / Titre provenant de l'écran-titre. Notes bibliogr.

Thèse doctorat : Sciences de l'Environnement Industriel et Urbain : Villeurbanne, INSA : 2008. / Titre provenant de l'écran-titre. Bibliogr. p. 244-266. Références bibliogr. p. 8.