Orientadores: Fernando Iikawa, Odilon Divino Damasceno Couto Junior / Dissertação (mestrado) - Universidade Estadual de Campinas, Instituto de Física Gleb Wataghin / Made available in DSpace on 2018-08-29T15:53:03Z (GMT). No. of bitstreams: 1 MirandaLaHera_VladimirRoger_M.pdf: 7239733 bytes, checksum: 1e843140547afd4fb68e666db8a03911 (MD5) Previous issue date: 2015 / Resumo: Neste trabalho foram estudadas as propriedades ópticas de nanofios (NWs) semicondutores InAsP/InP na fase Wurzita, crescidos pelo método Vapor-Liquid-Solid (VLS) no sistema Chemical Beam Epitaxy (CBE). As medidas ópticas foram realizadas por espectroscopia de fotoluminescência em ensembles e nanofios individuais, por macro e micro-fotoluminescência. O interesse pelas ligas de InAsP é que elas apresentam energia do gap na faixa de infravermelho próximo, uma faixa espectral utilizada para a tecnologia de telecomunicações bem como em fabricação de detetores de compostos de carbono nocivos, pois eles apresentam absorção óptica nessa faixa. Além disso, InAsP na forma de estruturas na escala nanométrica, em particular, em NWs, além de ter a fase cúbica estável, que ocorre em todos os fosfetos e arsenetos de compostos III-V, a fase hexagonal wurtzita é também observada. A maioria de suas propriedades na estrutura wurtzita não ainda foi investigada em detalhes. Os nanofios heteroestruturados contendo InAsP e InP na fase wurtzita não são bem conhecidos também. O ponto principal desta tese é, portanto, investigar as propriedades ópticas desses compostos na forma de nanofios, que estão na fase wurtzita, e estudar a emissão óptica destas heteroestruturas, onde envolve o efeito de confinamento quântico, o qual pode ser utilizado para sintonizar o comprimento de onda da emissão. Investigamos NWs de ligas de InAsP com três composições diferentes, mudando o fluxo de arsina e fosfina, que foram crescidos usando três tamanhos de nanopartículas de catalizadores de Au diferentes de 2, 5 e 20 nm. Observamos que a forma do nanofio depende do tamanho de nanopartículas de Au. Para menores tamanhos, obteve-se uma forma de torre, enquanto que para o maior, a forma de agulha. A concentração de P é de cerca de 50% estimada por espectroscopia de fotoluminescência e de energia dispersiva de raios-X. A emissão óptica é de cerca de 1.5 µm, adequada para aplicação em dispositivos de telecomunicações. Nos NWs heteroestruturados de InAsP/InP, investigamos as amostras com tempos de inclusão diferentes de InAsP (2, 5, 10, 20 e 40 s) no InP, e elas foram crescidas com diferentes tamanhos de nanopartículas de Au (2, 5 e 20 nm) utilizadas como catalisador. Nessas amostras, todos os nanofios apresentam a forma de uma agulha. Os espectros de macro e micro-fotoluminescência mostram fortes emissões ópticas atribuídas à camada de InAsP e variam entre 800-1000 nm. A energia de emissão depende da quantidade de InAsP de acordo com o efeito de confinamento quântico. Também, observamos várias linhas estreitas nos espectros de micro-fotoluminescência de nanofios individuais atribuídos aos estados localizados das camadas InAsP. Essas linhas são provenientes de duas regiões, sendo uma delas da camada de InAsP axial catalisado e uma segunda, da camada lateral de InAsP devido ao crescimento epitaxial. Este resultado mostra que os NWs de InAsP/InP apresentam alta qualidade cristalina e são sistemas promissores para a aplicação em dispositivos ópticos / Abstract: In this work, we studied the optical properties of wurtzite phase InAsP alloy nanowires (NWs) and InAsP/InP heterostructure nanowires grown by Vapor-Liquid-Solid (VLS) method in a Chemical Beam Epitaxy (CBE) system. The optical measurements were carried out by photoluminescence spectroscopy in ensemble and single NWs by macro and micro-photoluminescence techniques. The interest for InAsP alloys is that they present gap energy in the near infra-red, a spectral range commonly used for the telecommunication technology as well as for harmful carbon compounds detection sensors, since their optical absorption is in the same energy range. Furthermore, the InAsP in nanoscale structures, in particular, in NWs, in addition to the stable cubic phase, which occurs in all other phosphide and arsenide III-V compounds, hexagonal wurtzite phase is also observed. Most of the properties of their wurtzite structure has not been investigated in details yet. The heterostructure NWs containing InAsP and InP in wurtzite phase are not deeply known as well. The main purpose of this thesis is, therefore, to investigate the optical properties of this compounds in NW forms, which present wurtzite phase, and to study the optical emission from the heterostructures, where the quantum confinement effect can also be used to tune the emission wavelength. We investigated InAsP alloy NWs with three compositions changing the arsine and phosphine flux and they are grown using three sizes of Au-nanoparticle catalyst, 2, 5 and 20 nm. We note that the NW shape depends on the Au-nanoparticle size. For small size, a tower-like shape was observed, while for large one, the needle-like one. The P content of the samples is around the 50 % estimated by the photoluminescence and by Energy-Dispersive X-ray spectroscopy. The optical emission is around 1.5 µm, appropriate for telecommunication device applications. For InAsP/InP heterostructure NWs, we investigated samples with different InAsP time deposition (2, 5, 10, 20 and 40 s) onto the InP and they were grown with different Au-nanoparticle size (2, 5 and 20 nm) used as catalyst. In these samples, all nanowires present needle-like shape. The macro and micro-photoluminescence spectra show strong optical emissions in 800-1000 nm range attributed to the InAsP layer emissions. The emission energy depends on the amount of InAsP according to the quantum confinement effect. We observed several sharp lines in the micro-photoluminescence spectra of single NWs attributed to the localized states of the InAsP layers. They come from two regions, one of them from the axial catalyst InAsP layer and second one, from the lateral InAsP epitaxial growth layer. The result shows that the InAsP/InP heterostructures NWs grown by VLS method in the CBE system present high crystal quality and are promising structure for optical device applications / Mestrado / Física / Mestre em Física / 1247651/2013 / CAPES

Orientadores: Lisandro Pavie Cardoso, Marco Sacilotti / Tese (doutorado) - Universidade Estadual de Campinas, Instituto de Fisica Gleb Wataghin / Made available in DSpace on 2018-08-08T18:38:56Z (GMT). No. of bitstreams: 1 Chiaramonte_Thalita_D.pdf: 12073771 bytes, checksum: d01b6c585fd5556757aea0542ecf63f2 (MD5) Previous issue date: 2007 / Resumo: Os nitretos (Ga, Al, In)N assim como os compostos GaInP, GaCuO2, representam um sistema de materiais muito importante para as aplicações em opto-eletrônica e dispositivos tais como os diodos emissores de luz (LEDs), lasers e nanosensores. Entretanto, o requisito essencial para as aplicações industriais desses materiais é a redução em seus tamanhos. Neste trabalho foram crescidos materiais metálicos formados por nitretos de gálio e também de semicondutores do tipo GaInP, GaCuO2 na forma de estruturas 3D, pela técnica de deposição química de organometálicos em fase vapor (MOCVD). Foi utilizado como precursor organometálico (OM) o trimetil gálio Ga(CH3)3e o nitrogênio N2 como gás portador. A temperatura e a pressão foram controladas durante o crescimento variando entre 500 e 750 o C e 100 a 760 Torr, respectivamente. Duas classes de estruturas 3D foram obtidas a partir da decomposição total ou parcial do gás pre-cursor, devido a interação entre o OM e o substrato que gera diferentes morfologias: i) as ligas metálicas (Ga, Al, In) formando estruturas semelhantes a balões, cetros (hastes com terminações esféricas) e neurônios, todos apresentando uma fina membrana de carbono amorfo que reveste a estrutura. Após o crescimento, estas estruturas foram submetidas ao processo de nitretação sob atmosfera de NH3 para transformá-las em micro/nanocristais de GaN; ii) os fios semicondutores micro/nanométricos com uma esfera metálica em sua terminação (bambus e cetros) . Na formação de ambas as estruturas, os precursores OM são como moléculas catalisadoras do crescimento. Este crescimento é considerado como um método alternativo e original para se obter estruturas 3D. Uma possível associação com o modelo apresentado pelo mecanismo de crescimento Vapor-Líquido-Sólido (VLS), que utiliza uma partícula metálica para promover os nanotubos de carbono e os nanofios semicondutores, ainda está em discussão. Informações estruturais e ópticas dessas novas estruturas crescidas sobre substratos de Cu (grade de difração), Si (001), InP (policristalino) e Al/SiO2/Si (fotolitografia) foram obtidas através da caracterização por difração de raios-X, microscopia eletrônica de varredura e de transmissão em alta resolução, espectroscopia por energia disper-siva, catodoluminescência e a espectroscopia de excitação por dois fótons. Nas amostras nitretadas, micro/nano cristais de GaN obtidos da liga de Ga aparecem impregnados no carbono turbostrático (folhas de carbono sem orientação obtidas do amorfo) que revestem as estruturas, e emitem na região do espectro l £ 365 nm, devido às suas dimensões quânticas. As hastes das estruturas do tipo bambus apresentam nódulos formados por discos monocristalinos de GaInP rotacionados de 60 o um em relação ao outro. Óxidos CuGaO2 e CuGa2O4compondo nanofios, denominados cetros, também foram obtidos / Abstract: Nitride (Ga, Al, In)N as well as GaInP, GaCu O2 compounds represent a very important class of materials to be used in the opto-electronic and devices applications such as light emission diodes (LEDs) lasers and nanosensors. However, the essential requirement to the industrial applications of these materials is the reduction in theirs sizes. In this work 3D structures based on gallium nitride and also GaInP, GaCuO2 semiconductors were grown by metalorganic chemical vapor deposition (MOCVD) technique. Trimethyl-gallium Ga(CH3) was used as the metal-organic (MO) precursor and nitrogen N2as carrier gas. During the growth to the temperature and pressure intervals of 500 - 700 oC and 100 - 760 Torr, respectively. Two 3D material classes were obtained from the total or partial precursor gas decomposition, since the interaction between the MO compound and the substrate gives rise to different morphologies: i) (Ga,In,Al) metallic alloys form ballons, scepters (wires with spherical ends) and neurons like structures, all involved by a thin carbon amorphous membrane. After growth, these structures were turned into GaN micro/nanocrystals by nitridation process under NH3 atmosphere; ii) micro/nanometer semiconductor wires with a metallic sphere at its end (bamboos and scepters). In order to form both structures, the MO precursors are taken as a catalyst molecule of the growth process. This is an alternative and original method to obtain 3D structures and a possible association to the model used in the vapour-liquid-solid (VLS) growth mechanism, in which a metallic particle promotes the carbon nanotubes and semiconductors nanowires is still under discussion. Structural and optical informations on these new structures grown on Cu (diffraction grid), Si(001), InP (polycrystalline) and Si/Al (photolithography) substrates were obtained through the characterization by X-ray diffraction, scanning electron microscope, high resolution transmission electron microscopy, en-ergy dispersive x-rays, cathodoluminescence and two photon excitation. In the nitrided samples, GaN micro/nanocrystals obtained from Ga alloy appear embedded in the turbostratic carbon (C sheets at random obtained from the amorphous) which involves the structures and, they emit in the l £ 365 nm region specter, due to their quantum dimensions. The bamboo rods present nodes consisting of GaInP single crystal discs turned by 60o one with respect to the other. The CuGaO2 and CuGa2O4 oxides compounding nanowires, called scepters, also were obtained. / Doutorado / Física / Doutor em Ciências

The progress in device performance of modern microelectronic technology is mainly driven by down-scaling. In the near future, this road will probably reach a point where physical limits make even more down-scaling impossible. The substitution of single components materialwise over the last decades, like high-k dielectrics or metal gates, has been a suitable approach to foster performance improvements. In this scheme, the integration of high-mobility III-V compound semiconductors as channel materials into Si technology is a promising route to follow for the next one or two device generations. III-V integration, today, is conventionally performed by using techniques like molecular beam epitaxy or wafer bonding which utilize solid phase crystallization but suffer to strain due to the lattice mismatch between III-V compounds and Si. An alternative approach using sequential ion beam implantation in combination with a subsequent flash lamp annealing is presented in this work. Using this technique, nanocrystals from various III-V compounds have been successfully integrated into bulk Si and Ge as well as into thin Si layers which used either SOI substrates or were grown by plasma-enhanced chemical vapour deposition. The III-V compounds which have been fabricated are GaP, GaAs, GaSb, InP, InAs, GaSb and InxGa1-xAs with variable composition. The structural properties of these nanocrystals have been investigated by Rutherford backscattering, scanning electron microscopy and transmission electron microscopy, including bright-field, dark-field, high-resolution, high-angle annular dark-field and scanning mode imaging, electron-dispersive x-ray spectroscopy and energy-filtered element mapping. Furthermore, Raman spectroscopy and X-ray diffraction have been performed to characterise the nanocrystals optically. In Raman spectroscopy, the characteristic transversal and longitudinal optical phonon modes of the different III-V compounds have been observed. These signals proof that the nanocrystals have formed by the combination of ion implantation and flash lamp annealing. Additionally, the appearance of the typical phonon modes of the respective substrate materials verifies recrystallization of the substrate by the flash lamp after amorphisation during implantation. In the bulk Si samples, the nanocrystals have a circular or rectangular lateral shape and they are randomly distributed at the surface. Their cross-section has either a hemispherical or triangular shape. In bulk Ge, there are two types of precipitates: one at the surface with arbitrary shape and another one buried with circular shape. For the thin film samples, the lateral shape of the nanocrystals is more or less arbitrary and they feature a block-like cross-section which is limited in height by the Si layer thickness. Regarding crystalline quality, the nanocrystals in all samples are mainly single-crystalline with only a few number of stacking faults. However, the crystalline quality in the bulk samples is slightly better than in the thin films. The X-ray diffraction measurements display the (111), (220) and (311) Bragg peaks for InAs and GaAs as well as for the InxGa1-xAs where the peaks shift with increasing In content from GaAs towards InAs. The underlying formation mechanism is identified as liquid phase epitaxy. Hereby, the ion implantation leads to an amorphisation of the substrate material which is then molten by the subsequent flash lamp annealing. This yields a homogeneous distribution of the implanted elements within the melt due to their strongly increased diffusivity in the liquid phase. Afterwards, the substrate material starts to recrystallize at first and an enrichment of the melt with group-III and group-V elements takes place due to segregation. When the temperature is low enough, the III-V compound semiconductor starts to crystallize using the recrystallized substrate material as a template for epitaxial growth. In order to gain control over the lateral nanocrystal distribution, an implantation mask of either aluminium or nickel is introduced. Using this mask, only small areas of the samples are implanted. After flash lamp treatment, nanocrystals form only in these small areas, which allows precise positioning of them. An optimal implantation window size with an edge length of around 300nm has been determined to obtain one nanocrystal per implanted area. During an additional experiment, the preparation of Si nanowires using electron beam lithography and reactive ion etching has been conducted. Hereby, two different processes have been investigated; one using a ZEP resist, a lift-off step and a Ni hard mask and another one using a hydrogen silsesquioxane resist which is used directly as a mask for etching. The HSQ-based process turned out to yield Si nanowires of better quality. Combining both, the masked implantation and the Si nanowire fabrication, it might be possible to integrate a single III-V nanocrystal into a Si nanowire to produce a III-V-in-Si-nanowire structure for electrical testing. / Der Fortschritt in der Leistungsfähigkeit der Bauelemente moderner Mikroelektroniktechnologie wird hauptsächlich durch das Skalieren vorangetrieben. In naher Zukunft wird dieser Weg wahrscheinlich einen Punkt erreichen, an dem physikalische Grenzen weiteres Herunterskalieren unmöglich machen. Der Austausch einzelner Teile auf Materialebene, wie Hoch-Epsilon-Dielektrika oder Metall-Gate-Elektroden, war während der letzten Jahrzehnte ein geeigneter Ansatz, um die Leistungsverbesserung voranzubringen. Nach diesem Schema ist die Integration von III-V-Verbindungshalbleiter mit hoher Mobilität ein vielversprechender Weg, dem man für die nächsten ein oder zwei Bauelementgenerationen folgen kann. Heutzutage erfolgt die III-V-Integration konventionell mit Verfahren wie der Molekularstrahlepitaxie oder dem Waferbonden, welche die Festphasenkristallisation nutzen, die aber aufgrund der Gitterfehlanpassung zwischen III-V-Verbindungen und Silizium an Verspannungen leiden. In dieser Arbeit wird ein alternativer Ansatz präsentiert, welcher die sequenzielle Ionenstrahlimplantation in Verbindung mit einer darauffolgenden Blitzlampentemperung ausnutzt. Mit Hilfe dieses Verfahrens wurden Nanokristalle verschiedener III-V-Verbindungshalbleiter erfolgreich in Bulksilizium- und -germaniumsubstrate sowie in dünne Siliziumschichten integriert. Für die dünnen Schichten wurden hierbei entweder SOI-Substrate verwendet oder sie wurden mittels plasmagestützer chemischer Gasphasenabscheidung gewachsen. Die hergestellten III-V-Verbindungen umfassen GaP, GaAs, GaSb, InP, InAs, InSb und InxGa1-xAs mit veränderbarer Zusammensetzung. Die strukturellen Eigenschaften dieser Nanokristalle wurden mit Rutherford-Rückstreu-Spektroskopie, Rasterelektronenmikroskopie und Transmissionselektronenmikroskopie untersucht. Bei der Transmissionelektronenmikroskopie wurden die Hellfeld-, Dunkelfeld-, hochauflösenden, “high-angle annular dark-field” und Rasteraufnahmemodi sowie die energiedispersive Röntgenspektroskopie und die energiegefilterte Elementabbildung eingesetzt. Darüber hinaus wurden Ramanspektroskopie- und Röntgenbeugungsmessungen durchgeführt, um die Nanokristalle optisch zu charakterisieren. Mittels Ramanspektroskopie wurden die charakteristischen transversal- und longitudinal-optischen Phononenmoden der verschiedenen III-V-Verbindungen beobachtet. Diese Signale beweisen, dass sich unter Verwendung der Kombination von Ionenstrahlimplantation und Blitzlampentemperung Nanokristalle bilden. Weiterhin zeigt das Vorhandensein der typischen Phononenmoden der jeweiligen Substratmaterialien, dass die Substrate aufgrund der Blitzlampentemperung rekristallisiert sind, nachdem sie durch Ionenimplantation amorphisiert wurden. In den Bulksiliziumproben besitzen die Nanokristalle eine kreisförmige oder rechteckige Kontur und sind in zufälliger Anordnung an der Oberfläche verteilt. Ihr Querschnitt zeigt entweder eine Halbkugel- oder dreieckige Form. Im Bulkgermanium gibt es zwei Arten von Ausscheidungen: eine mit willkürlicher Form an der Oberfläche und eine andere, vergrabene mit sphärischer Form. Betrachtet man die Proben mit den dünnen Schichten, ist die laterale Form der Nanokristalle mehr oder weniger willkürlich und sie zeigen einen blockähnlichen Querschnitt, welcher in der Höhe durch die Siliziumschichtdicke begrenzt ist. Bezüglich der Kristallqualität sind die Nanokristalle in allen Proben mehrheitlich einkristallin und weisen nur eine geringe Anzahl an Stapelfehlern auf. Jedoch ist die Kristallqualität in den Bulkmaterialien ein wenig besser als in den dünnen Schichten. Die Röntgenbeugungsmessungen zeigen die (111), (220) und (311) Bragg-Reflexe des InAs und GaAs sowie des InxGa1-xAs, wobei sich hier die Signalpositionen mit steigendem Gehalt an Indium von GaAs zu InAs verschieben. Als zugrundeliegender Bildungsmechanismus wurde die Flüssigphasenepitaxie identifiziert. Hierbei führt die Ionenstrahlimplantation zu einer Amorphisierung des Substratmaterials, welches dann durch die anschließende Blitzlampentemperung aufgeschmolzen wird. Daraus resultiert eine homogene Verteilung der implantierten Elemente in der Schmelze, da diese eine stark erhöhte Diffusivität in der flüssigen Phase aufweisen. Danach beginnt zuerst das Substratmaterial zu rekristallisieren und es kommt aufgrund von Segregationseffekten zu einer Anreicherung der Schmelze mit den Gruppe-III- und Gruppe-V-Elementen. Wenn die Temperatur niedrig genug ist, beginnt auch der III-V-Verbindungshalbleiter zu kristallisieren, wobei er das rekristallisierte Substratmaterial als Grundlage für ein epitaktisches Wachstum nutzt. In der Absicht Kontrolle über die laterale Verteilung der Nanokristalle zu erhalten, wurde eine Implantationsmaske aus Aluminium beziehungsweise Nickel eingeführt. Durch die Benutzung einer solchen Maske wurden nur kleine Bereiche der Proben implantiert. Nach der Blitzlampentemperung werden nur in diesen kleinen Bereichen Nanokristalle gebildet, was eine genaue Positionierung dieser erlaubt. Es wurde eine optimale Implantationsfenstergröße mit einer Kantenlänge von ungefähr 300 nm ermittelt, damit sich nur ein Nanokristall pro implantierten Bereich bildet. Während eines zusätzlichen Experiments wurde die Präparation von Siliziumnanodrähten mit Hilfe von Elektronenstrahllithografie und reaktivem Ionenätzen durchgeführt. Hierbei wurden zwei verschiedene Prozesse getestet: einer, welcher einen ZEP-Lack, einen Lift-off-Schritt und eine Nickelhartmaske nutzt, und ein anderer, welcher einen HSQ-Lack verwendet, der wiederum direkt als Maske für die Ätzung dient. Es stellte sich heraus, dass der HSQ-basierte Prozess Siliziumnanodrähte von höherer Qualität liefert. Kombiniert man beides, die maskierte Implantation und die Siliziumnanodrahtherstellung, miteinander, sollte es möglich sein, einzelne III-V-Nanokristalle in einen Siliziumnanodraht zu integrieren, um eine III-V-in-Siliziumnanodrahtstruktur zu fertigen, welche für elektrische Messungen geeignet ist.