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As the gate density increases in microelectronic devices, the interconnect delay or RC response also increases and has become the limiting delay to faster devices. In order to decrease the RC time delay, a new metallization scheme has been chosen by the semiconductor industry. Copper has replaced aluminum as the metal lines and new low-k dielectric materials are being developed to replace silicon dioxide. A promising low-k material is porous organosilicate glass or p-OSG. The p-OSG film is a hybrid material where the silicon dioxide backbone is terminated with methyl or hydrogen, reducing the dielectric constant and creating mechanically weak films that are prone to fracture. A few methods of improving the mechanical properties of p-OSG films have been attempted-- exposing the film to hydrogen plasma, electron beam curing, and ultra-violet light curing. Hydrogen plasma and electron-beam curing suffer from a lack of specificity and can cause charging damage to the gates. Therefore, ultra-violet light curing (UV curing) is preferable. The effect of UV curing on an ultra-low-k, k~2.5, p-OSG film is studied in this dissertation. Changes in the molecular structure were measured with Fourier Transform Infrared Spectroscopy and X-ray Photoelectron Spectroscopy. The evolution of the molecular structure with UV curing was correlated with material and fracture properties. The material properties were film shrinkage, densification, and an increase in dielectric constant. From the changes in molecular structure and material properties, a set of condensation reactions with UV light are predicted. The connectivity of the film increases with the condensation reactions and, therefore, the fracture toughness should also increase. The effect of UV curing on the critical and sub-critical fracture toughness was also studied. The critical fracture toughness was measured at four different mode-mixes-- zero, 15°, 32°, and 42°. It was found that the critical fracture toughness increases with UV exposure for all mode mixes. The sub-critical fracture toughness was measured in Mode I and found to be insensitive to UV cure. A simple reaction rate model is used to explain the difference in critical and sub-critical fracture toughness. / text

Theoretical considerations for the use of chalcopyrite ternary I-III-VI₂ compounds in heterojunction photovoltaic conversion devices are presented, followed by an in-depth study of the structural, optical, and electrical characteristics of multi-source evaporated CuGaSe₂ thin films as determined by processing. Film composition was identified as the primary variable for affecting the microstructure and optical-electrical behavior of the films. Film composition was in turn dependent upon elemental flux rates and substrate related effects. Films deposited on glass and bare alumina substrates were richer in selenium than films deposited on molybdenum coated substrates. Cu-poor, near stoichiometeric, and Cu-rich compositions were obtained by varying the Cu/Ga flux ratio. Cu-poor films deposited on bare ceramic substrates were characterized by secondary impurity phase content and a tendency for cubic CuGaSe₂ formation. The cubic nature of optically thin films deposited on glass was substantiated by a lack of crystal field splitting of the valence band as observed by optical absorption measurements. Cubic-tetragonal phase behavior was monitored on optically opaque samples by observation of intensity-independent (112)/(111) x-ray diffraction peak shifts. Cu-poor films on glass were also characterized by surfaces pitting at substrate temperatures in excess of 450°C which may be related to the high surface energy of gallium. Cu-poor films deposited on molybdenum coated alumina substrates exhibited less impurity phase formation and were largely single-phase tetragonal CuGaSe₂. Cu-rich films on all substrates contained CuₓSe impurities and tetragonal CuGaSe₂.

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The conduction band of InAs lies lower in energy than the GaSb valence band. In order to preserve continuity of the Fermi level across the interface, charge transfer takes place resulting in a confined quasi two dimensional electron gas (2DEG) in the InAs and a confined quasi two dimensional hole gas (2DHG) in the GaSb. This study is an investigation into the vertical transport in an n-InAs/p-GaSb single heterojunction (SHET). Application of a forward bias (InAs negative with respect to GaSb) increases the 2DEG and 2DHG concentrations and, therefore, their confinement energies. Eventually a critical bias is reached where the electron confinement energy moves above the hole confinement energy (the theoretical voltage induced semimetal/semiconductor transition V_c). Any subsequent increase in voltage is expected to result in a current decrease, and a region of negative differential resistance (NDR) should occur. The SHET can be grown with two distinct interface types, 'InSb-like' and 'GaAs-like'. This in turn affects the vertical transport characteristics of each type. Experimental IV traces at various pressures are compared with the corresponding results from sophisticated self-consistent band profile calculations taking into account band mixing effects for the first time through a k.p theory framework. Experimental IV traces of the SHETs under a magnetic field parallel to the interface are also compared with results from calculations that take into account the coupling of the growth and in-plane electron and heavy hole motions. Both sets of analysis support earlier conclusions that NDR occurs after V_c for both interfaces, and that each interface supports a different conduction mechanism. Evidence of multiple phonon processes occurring in both sample types is observed for the first time and is proposed to reconcile the above experimental observations with theory. This data is found to offer explanations for a number of other observations. Field perpendicular to the interface leads to the observation of features beyond the NDR region in both sample types. In samples with an 'InSb-like' interface, applying additional hydrostatic pressure leads to very strong features beyond the main NDR. Through a complex self-consistent decoupled model taking into account electrons and heavy holes, all these features are proposed to be due to a filling of an integer number of Landau levels. The band profile is predicted to alter dramatically at this point. The same model explains the observation of weaker features at 1 bar at high fields (~ 40T). A variation of NDR position is found with a rotation of an-plane field.

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