Fong King Yan = 光栅衍射及含週期結構的金屬片的透射增強效應的理論研究 / 方敬恩. / Thesis submitted in: September 2006. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2007. / Includes bibliographical references (leaves 111-119). / Abstracts in English and Chinese. / Fong King Yan = Guang zha yan she ji han zhou qi jie gou de jin shu pian de tou she zeng qiang xiao ying de li lun yan jiu / Fang Jing'en. / Chapter 1 --- Introduction --- p.1 / Chapter 2 --- Review on Grating Theories --- p.6 / Chapter 2.1 --- Basic Concepts --- p.6 / Chapter 2.1.1 --- Maxwell's Equations --- p.6 / Chapter 2.1.2 --- Translational Symmetry --- p.8 / Chapter 2.1.3 --- TM and TE Polarizations --- p.10 / Chapter 2.1.4 --- The Grating Equation --- p.11 / Chapter 2.2 --- Rayleigh's Method --- p.12 / Chapter 2.3 --- Integral Method --- p.13 / Chapter 2.4 --- Classical Modal Method --- p.15 / Chapter 2.5 --- Rigorous Coupled-Wave Analysis --- p.16 / Chapter 2.5.1 --- General Form of Electromagnetic Modes --- p.17 / Chapter 2.5.2 --- Fourier Factorization Rules --- p.20 / Chapter 2.5.3 --- Matching Boundary Conditions --- p.21 / Chapter 2.5.4 --- Multilayered Gratings and Staircase Approximation --- p.25 / Chapter 2.5.5 --- Model Calculations --- p.25 / Chapter 2.6 --- Anisotropic Gratings --- p.26 / Chapter 2.6.1 --- General Form of Electromagnetic Modes --- p.29 / Chapter 2.6.2 --- Matching Boundary Conditions --- p.30 / Chapter 2.6.3 --- Model Calculations --- p.31 / Chapter 3 --- Grating Diffraction by Linear Superposition of Retarded Field --- p.33 / Chapter 3.1 --- Basic Ideas --- p.33 / Chapter 3.2 --- Formalism --- p.35 / Chapter 3.2.1 --- Field Induced Currents --- p.36 / Chapter 3.2.2 --- Field due to Current and Charge Densities --- p.38 / Chapter 3.2.3 --- "Internal, Transmitted, and Reflected Fields" --- p.39 / Chapter 3.2.4 --- Points of Physical Interest --- p.41 / Chapter 3.3 --- Model Calculations --- p.43 / Chapter 3.4 --- Application to Systems with Anisotropy or Nonlinearity --- p.46 / Chapter 3.5 --- Summary --- p.52 / Chapter 4 --- Introduction to Surface Plasmonic Excitations and Phenomenon of Enhanced Transmission --- p.55 / Chapter 4.1 --- Introduction to Surface Plasmons --- p.55 / Chapter 4.2 --- Phenomenon of Enhanced Transmission --- p.60 / Chapter 5 --- Enhanced Transmission Through Stacking Grating with Subwavelength Slits --- p.72 / Chapter 6 --- Controlling Enhanced Transmissions via Anisotropic Effects --- p.81 / Chapter 6.1 --- Effects of Anisotropic Waveguide on The Phenomenon of Enhanced Transmission --- p.82 / Chapter 6.1.1 --- Control of Enhanced Transmission by Anisotropic Waveguide --- p.83 / Chapter 6.1.2 --- Electromagnetic Modes in Anisotropic Waveguide --- p.87 / Chapter 6.1.3 --- Single Mode Model for Studying Transmission of Grating with Slits Filled with Anisotropic Material --- p.89 / Chapter 6.2 --- Effects of Strong Applied Magnetic Field on the Phenomenon of Enhanced Transmission --- p.95 / Chapter 6.2.1 --- Magnetic Field Induced Anisotropy in Metals --- p.95 / Chapter 6.2.2 --- Enhanced Transmission under Influence of Strong Magnetic Field --- p.97 / Chapter 6.2.3 --- Modification of Surface Plasmon Dispersion relation by Strong Applied Magnetic Field --- p.101 / Chapter 7 --- Conclusion --- p.107 / Bibliography --- p.111 / Chapter A --- Fourier Factorization Rules --- p.120 / Chapter A.l --- Notations --- p.120 / Chapter A.2 --- Factorization rules [28] --- p.121 / Chapter A.3 --- Fourier Factorization of Quantities in Anisotropic medium [32] --- p.122 / Chapter B --- Derivation of Integral in Eq. (3.10) --- p.124

Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Architecture, 1978. / MICROFICHE COPY AVAILABLE IN ARCHIVES AND ROTCH. / by Richard Peña. / M.S.

Thesis (M.S.V.S.)--Massachusetts Institute of Technology, Dept. of Architecture, 1980. / MICROFICHE COPY AVAILABLE IN ARCHIVES AND ROTCH. / Includes bibliographical references. / by John Chittick. / M.S.V.S.

Wong Hoi Chun = Fe3O4和 ZnxFe3-xO4薄膜的制備及其熱處理效應 / 黃凱俊. / On t.p. "x" is subscript / Thesis (M.Phil.)--Chinese University of Hong Kong, 2004. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / Wong Hoi Chun = Fe3O4 he ZnxFe3-xO4 bo mo de zhi bei ji qi re chu li xiao ying / Huang Kaijun. / Acknowledgement --- p.i / Abstract --- p.ii / 論文摘要 --- p.iii / Table of contents --- p.iv / List of Figures --- p.vii / List of Tables --- p.xiii / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Introduction to magnetite and zinc ferrite / Chapter 1.1.1 --- Structure and properties --- p.1-1 / Chapter 1.1.2 --- Deposition methods of magnetite and zinc ferrite --- p.1-5 / Chapter 1.1.3 --- Review of Verwey transition --- p.1-7 / Chapter 1.1.4 --- Development of magnetic tunneling junction --- p.1-11 / Chapter 1.2 --- Research motivation --- p.1-13 / Chapter 1.3 --- Scope of this thesis --- p.1-14 / References --- p.1-15 / Chapter Chapter 2 --- Instrumentation / Chapter 2.1 --- Thin film deposition / Chapter 2.1.1 --- Facing-target sputtering technique --- p.2-1 / Chapter 2.1.2 --- Vacuum system --- p.2-3 / Chapter 2.1.3 --- Asymmetric bipolar pulsed DC power source --- p.2-4 / Chapter 2.2 --- Annealing / Chapter 2.2.1 --- Vacuum annealing system --- p.2-8 / Chapter 2.2.2 --- Oxygen annealing system --- p.2-8 / Chapter 2.3 --- Characterization / Chapter 2.3.1 --- Profilometer --- p.2-10 / Chapter 2.3.2 --- X-ray diffractometer --- p.2-10 / Chapter 2.3.3 --- X-ray fluorescence spectrometer --- p.2-12 / Chapter 2.3.4 --- Rutherford backscattering spectrometer --- p.2-12 / Chapter 2.3.5 --- X-ray photoelectron spectroscopy --- p.2-13 / Chapter 2.3.6 --- Resistance measuring system --- p.2-15 / References --- p.2-17 / Chapter Chapter 3 --- Fabrication and characteristics of epitaxial Fe304 and ZnxFe3-xO4 single layer thin film / Chapter 3.1 --- Sample preparation / Chapter 3.1.1 --- Targets for reactive sputtering --- p.3-1 / Chapter 3.1.2 --- Substrates --- p.3-2 / Chapter 3.1.3 --- Deposition procedure --- p.3-4 / Chapter 3.2 --- Characterization of Fe3O4 thin films / Chapter 3.2.1 --- Effects of oxygen partial pressure --- p.3-5 / Chapter 3.2.2 --- Effects of substrate temperature --- p.3-10 / Chapter 3.2.3 --- Effects of deposition power --- p.3-17 / Chapter 3.2.4 --- Effects of deposition pressure --- p.3-19 / Chapter 3.2.5 --- Other factors --- p.3-19 / Chapter 3.3 --- Characterization of ZnxFe3-x04 thin films / Chapter 3.3.1 --- Effects of oxygen partial pressure --- p.3-22 / Chapter 3.3.2 --- Effects of substrate temperature --- p.3-28 / Chapter 3.3.3 --- Effects of thickness --- p.3-46 / Chapter 3.4 --- Fabrication and Characterization of ZnxFe3-x04 and Fe3O4 thin films on magnesium oxide(MgO) --- p.3-49 / References --- p.3-56 / Chapter Chapter 4 --- Annealing of epitaxial Fe304 and ZnxFe3-x04 thin films / Chapter 4.1 --- Introduction --- p.4-1 / Chapter 4.2 --- Vacuum annealing of ZnxFe3-x04 thin film / Chapter 4.2.1 --- Enhancement in magnitude of the Verwey transition --- p.4-1 / Chapter 4.2.2 --- Reduction in resistivity --- p.4-5 / Chapter 4.2.3 --- Improvement of crystallinity --- p.4-5 / Chapter 4.2.4 --- Characterizations after high-temperature annealing --- p.4-11 / Chapter 4.2.5 --- Oxygen diffusion in atmosphere --- p.4-16 / Chapter 4.3 --- Oxygen annealing of ZnxFe3-x04 thin film --- p.4-18 / References --- p.4-22 / Chapter Chapter 5 --- Conclusions / Chapter 5.1 --- Conclusions --- p.5-1 / Chapter 5.2 --- Future outlook --- p.5-2

Ng, Chi Hai Alvin. / Thesis submitted in: December 2002. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2003. / Includes bibliographical references. / Abstracts in English and Chinese. / Abstract --- p.i / Acknowledgement --- p.iv / Table of Contents --- p.v / List of Figure Captions --- p.ix / List of Table Captions --- p.xx / Chapter Chapter 1 --- Introduction --- p.1 / Chapter 1.1 --- Silicon Crystal Structure --- p.1 / Chapter 1.2 --- Silicon Dioxide Structure --- p.2 / Chapter 1.3 --- Wafer Cleaning of Silicon --- p.3 / Chapter 1.3.1 --- Sources of Contamination --- p.4 / Chapter 1.3.2 --- Traditional Approach of Wafer Cleaning --- p.5 / Chapter 1.3.3 --- Recent Developments in Wafer Cleaning --- p.6 / Chapter 1.3.3.1 --- Particles --- p.6 / Chapter 1.3.3.2 --- Metal Contamination --- p.7 / Chapter 1.3.3.3 --- Organic Contamination --- p.9 / Chapter 1.3.3.4 --- Surface Microroughness --- p.9 / Chapter 1.3.3.5 --- Native Oxide --- p.11 / Chapter 1.4 --- Oxidation of Silicon --- p.13 / Chapter 1.4.1 --- The Initial Oxidation Regime --- p.17 / Chapter 1.5 --- Current Status of MOS Structure --- p.19 / Chapter 1.5.1 --- Wafer Cleaning --- p.19 / Chapter 1.5.2 --- Silicon Oxidation --- p.20 / Chapter 1.5.3 --- Ozone Oxidation --- p.24 / Chapter 1.5.4 --- High-k Dielectrics --- p.26 / Chapter 1.5.4.1 --- Silicon Oxynitride --- p.27 / Chapter 1.5.4.2 --- Hafnium Oxide and Zirconium Oxide --- p.28 / Chapter 1.5.5 --- Single Monolayer Oxide of Silicon --- p.32 / Chapter 1.6 --- Oxidation by Conventional Furnace --- p.36 / Chapter 1.7 --- Oxidation by RTO --- p.37 / Chapter 1.7.1 --- Equipment Issues --- p.38 / Chapter 1.8 --- Radiation Effects --- p.38 / Chapter 1.8.1 --- Radiation Effects on Ultrathin Gate Oxides --- p.45 / Reference --- p.45 / Chapter Chapter 2 --- Preparation and Characterization Techniques --- p.48 / Chapter 2.1 --- Conventional Furnace --- p.48 / Chapter 2.2 --- Rapid Thermal Oxidation (RTO) --- p.48 / Chapter 2.3 --- Irradiation Source --- p.49 / Chapter 2.4 --- Capacitance-Voltage (C-V) and Current-Voltage (I-V) Curves --- p.51 / Chapter 2.4.1 --- Definition of Potential and Sign Conventions --- p.51 / Chapter 2.4.2 --- The Poisson Equation --- p.55 / Chapter 2.4.3 --- Low Frequency Capacitance --- p.58 / Chapter 2.4.3.1 --- Sum of Series Capacitors --- p.58 / Chapter 2.4.3.2 --- Discussion of Various Terms Contributing to the Field --- p.60 / Chapter 2.4.3.3 --- Calculation of the Low Frequency Capacitance --- p.62 / Chapter 2.4.3.4 --- "Simpler Forms of Capacitancein Accumulation, at Flatband, in Depletion and Inversion" --- p.63 / Chapter 2.4.4 --- High Frequency C-V Curves --- p.65 / Chapter 2.4.5 --- Experimental Setups --- p.66 / Chapter 2.5 --- Conductance-Voltage (G-V) Characterization --- p.67 / Chapter 2.5.1 --- Experimental Details --- p.68 / Chapter 2.6 --- Ellipsometry --- p.69 / Chapter 2.7 --- Rutherford Backscattering Spectrometry --- p.71 / Chapter 2.7.1 --- Experimental Setup --- p.72 / Reference --- p.72 / Chapter Chapter 3 --- Annealing Effects of Conventional Furnace Grown Oxide --- p.74 / Chapter 3.1 --- Experiment --- p.74 / Chapter 3.2 --- Results --- p.74 / Chapter 3.3 --- Conclusions --- p.85 / Reference --- p.86 / Chapter Chapter 4 --- Rapid Thermal Oxidation of MOS Capacitors --- p.87 / Chapter 4.1 --- Experiment --- p.87 / Chapter 4.2 --- Results and Discussions --- p.90 / Chapter 4.3 --- Conclusions --- p.114 / Reference --- p.115 / Chapter Chapter 5 --- Ionizing Radiation on MOS Capacitors --- p.117 / Chapter 5.1 --- Experimental Setup --- p.117 / Chapter 5.2 --- Results and Discussions --- p.120 / Chapter 5.3 --- Conclusions --- p.149 / Reference --- p.151 / Chapter Chapter 6 --- Conclusions --- p.153 / Chapter 6.1 --- Summary --- p.153 / Chapter 6.2 --- Future Work --- p.155 / Reference --- p.157

Wan King Tin = La2/3Ca1/3MnO3薄膜的各向異性磁致電阻 / 尹擎天. / Thesis submitted in: August 2003. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2004. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / Wan King Tin = La2/3Ca1/3MnO3 bo mo de ge xiang yi xing ci zhi dian zu / Yin Qingtian. / Acknowledgments --- p.i / Abstract --- p.ii / 論文摘要 --- p.iv / Table of Contents --- p.v / List of figures --- p.vii / List of tables --- p.xi / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Introduction to Colossal Magnetoresistance (CMR) --- p.1 / Chapter 1.2 --- Origin of CMR --- p.6 / Chapter 1.3 --- Anisotropic Magnetoresistance (AMR) of LCMO Thin Film --- p.8 / Chapter 1.4 --- Properties near Tc / Chapter 1.4.1 --- Sharpness of transition --- p.13 / Chapter 1.4.2 --- Expansivity --- p.16 / Chapter 1.5 --- The motivation of this work --- p.19 / References --- p.20 / Chapter Chapter 2 --- Experimental methods / Chapter 2.1 --- Preparation of LCMO thin films --- p.23 / Chapter 2.2 --- Measurement of resistance and anisotropic magnetoresistance --- p.25 / References --- p.30 / Chapter Chapter 3 --- Properties of anisotropic magnetoresistance of single layer LCMO thin film / Chapter 3.1 --- Magnetic Field dependence of AMR / Chapter 3.1.1 --- In-plane AMR --- p.31 / Chapter 3.1.2 --- Out-of-plane AMR --- p.55 / Chapter 3.2 --- Temperature dependence of AMR --- p.65 / Chapter 3.3 --- Effect of c axis alignment --- p.75 / Chapter 4.4 --- "Effect of thickness, sharpness and Tp to AMR and their correlations " --- p.83 / References --- p.101 / Chapter Chapter 4 --- AMR of LCMO/PCMO Multilayer --- p.102 / References --- p.113 / Chapter Chapter 5 --- Conclusion --- p.114 / References --- p.117

Cheng, Kai Hong. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2004. / Includes bibliographical references (leaves 134-141). / Abstracts in English and Chinese. / Abstract --- p.i / Acknowledgement --- p.iv / Table of Contents --- p.v / List of Figures --- p.viii / List of Tables --- p.xix / Chapter iii. --- Table of Contents / Chapter Chapter 1 --- Introduction --- p.1 / Chapter 1.1 --- Semiconductor spintronics --- p.1 / Chapter 1.1.1 --- Overview --- p.1 / Chapter 1.2 --- Dilute magnetic semiconductors (DMS) --- p.2 / Chapter 1.2.1 --- Historical background --- p.3 / Chapter 1.2.2 --- Their importance and significance --- p.4 / Chapter 1.2.3 --- Material systems showing room temperature ferromagnetism --- p.5 / Chapter 1.3 --- Cobalt (iron)-doped titanium dioxide as DMS --- p.7 / Chapter 1.3.1 --- Structures and properties of titanium dioxide --- p.8 / Chapter 1.3.2 --- Various preparation techniques of cobalt (iron)-doped titanium dioxide --- p.10 / Chapter 1.3.3 --- This thesis --- p.13 / Chapter Chapter 2 --- Sample Preparation and Characterization Techniques --- p.14 / Chapter 2.1 --- Sample preparation --- p.14 / Chapter 2.1.1 --- RF magnetron sputtering --- p.14 / Chapter 2.1.2 --- MEVVA ion implantation --- p.17 / Chapter 2.1.3 --- Sample preparation conditions --- p.19 / Chapter 2.2 --- Characterization techniques --- p.24 / Chapter 2.2.1 --- Structural characterization --- p.24 / Chapter 2.2.1.1 --- Rutherford backscattering spectrometry (RBS) --- p.24 / Chapter 2.2.1.2 --- X-ray diffraction (XRD) --- p.26 / Chapter 2.2.1.3 --- X-ray photoelectron spectroscopy (XPS) --- p.28 / Chapter 2.2.1.4 --- Transmission electron microscopy (TEM) --- p.31 / Chapter 2.2.2 --- Vibrating sample magnetometry (VSM) --- p.33 / Chapter 2.2.3 --- Temperature varying resistivity measurements --- p.35 / Chapter Chapter 3 --- Characterization of Titanium Dioxide Samples --- p.40 / Chapter 3.1 --- RBS results --- p.40 / Chapter 3.2 --- XRD results --- p.43 / Chapter 3.3 --- XPS results --- p.47 / Chapter 3.4 --- Summary --- p.51 / Chapter Chapter 4 --- Characterization of Cobalt-implanted Titanium Dioxide Sample --- p.53 / Chapter 4.1 --- Cobalt dose dependence --- p.53 / Chapter 4.1.1 --- RBS results --- p.53 / Chapter 4.1.2 --- XRD results --- p.65 / Chapter 4.1.3 --- VSM results --- p.69 / Chapter 4.1.4 --- Temperature varying resistivity measurements --- p.75 / Chapter 4.2 --- Effects of annealing temperature --- p.77 / Chapter 4.2.1 --- RBS results --- p.77 / Chapter 4.2.2 --- XRD results --- p.79 / Chapter 4.2.3 --- XPS results --- p.83 / Chapter 4.2.4 --- TEM results --- p.88 / Chapter 4.2.5 --- VSM results --- p.91 / Chapter 4.2.6 --- Temperature varying resistivity measurements --- p.97 / Chapter 4.3 --- Summary --- p.99 / Chapter Chapter 5 --- Characterization of Iron-implanted Titanium Dioxide Samples --- p.101 / Chapter 5.1 --- Iron dose dependence --- p.101 / Chapter 5.1.1 --- RBS results --- p.101 / Chapter 5.1.2 --- XRD results --- p.107 / Chapter 5.1.3 --- VSM results --- p.110 / Chapter 5.1.4 --- Temperature varying resistivity measurements --- p.114 / Chapter 5.2 --- Effects of annealing temperature --- p.116 / Chapter 5.2.1 --- RBS results --- p.116 / Chapter 5.2.2 --- XRD results --- p.117 / Chapter 5.2.3 --- VSM results --- p.119 / Chapter 5.2.4 --- Temperature varying resistivity measurements --- p.121 / Chapter 5.3 --- Summary --- p.122 / Chapter Chapter 6 --- Conclusion and future work --- p.125 / Appendices --- p.127 / Bibliography --- p.134 / Publications --- p.141 / Chapter iv. --- List of Figures / Fig. 1.1 Crystal structures for two most stable polymorphs of TiO2: (a) anatase; and (b) rutile --- p.9 / Fig. 2.1 Schematic of RF sputtering system --- p.15 / Fig. 2.2 Motion of electrons emitted for the target surface (a) in the applied magnetic field (-z direction); (b) in the applied electric field (-y direction) and magnetic field (-z direction) --- p.16 / Fig. 2.3 Schematic of the implanter with the MEVVA ion source --- p.17 / Fig. 2.4 The TRIM ion distribution profile of Co atoms in anatase TiO2 by implantation to a Co dose of 2.2 x 1016 cm-2 at an extraction voltage of 65 kV --- p.21

Li Chak Ming = 18O氧同位素效應對La0.67Ca0.33MnO3薄膜之影響 / 李澤銘. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2005. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / Li Chak Ming = 18O yang tong wei su xiao ying dui La0.67Ca0.33MnO3 bo mo zhi ying xiang / Li Zeming. / Acknowledgement --- p.i / Abstract --- p.ii / 論文摘要 --- p.iii / Table of Contents --- p.iv / List of Figures --- p.viii / List of Tables --- p.xi / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Magnetoresistance (MR) 1 - --- p.1 / Chapter 1.1.1 --- Magnetoresistance (MR) 1 - --- p.1 / Chapter 1.1.2 --- Giant Magnetoresistance (GMR) 1 - --- p.1 / Chapter 1.1.3 --- Anisotropy Magnetoresistance (AMR) 1 - --- p.2 / Chapter 1.1.4 --- Colossal Magnetoresistance (CMR) --- p.1-4 / Chapter 1.1.5 --- Double exchange mechanism 1 - --- p.6 / Chapter 1.1.6 --- Jahn-Teller effect --- p.1-6 / Chapter 1.1.7 --- Tolerance factor 1 - --- p.7 / Chapter 1.1.8 --- The effect of doping --- p.1-10 / Chapter 1.2 --- Possible origin of oxygen isotope effect --- p.1-12 / Chapter 1.3 --- Our approach --- p.1-14 / Chapter 1.4 --- Scope of this thesis work --- p.1-14 / Chapter Chapter 2 --- Experimental methods / Chapter 2.1 --- Thin film deposition --- p.2-1 / Chapter 2.1.1 --- Facing Target Sputering (FTS) --- p.2-1 / Chapter 2.1.2 --- Vacuum system --- p.2-4 / Chapter 2.2 --- Annealing systems --- p.2-6 / Chapter 2.2.1 --- Oxygen annealing system --- p.2-6 / Chapter 2.2.2 --- Oxygen exchange system --- p.2-8 / Chapter 2.2.3 --- Vacuum annealing system --- p.2-10 / Chapter 2.3 --- Characterization --- p.2-12 / Chapter 2.3.1 --- a -step profilometer --- p.2-12 / Chapter 2.3.2 --- X-ray diffraction (XRD) --- p.2-12 / Chapter 2.3.3 --- Resistance measurement --- p.2-15 / Chapter Chapter 3 --- Epitaxial growth of LCMO single layer thin film / Chapter 3.1 --- Fabrications and characterization of La0.67Ca0.33MnO3 target --- p.3-1 / Chapter 3.2 --- Substrate materials --- p.3-6 / Chapter 3.3 --- Preparation of LCMO thin film --- p.3-8 / Chapter 3.3.1 --- Deposition conditions --- p.3-8 / Chapter 3.3.2 --- Deposition procedure --- p.3-10 / Chapter 3.3.3 --- Post-annealing effect --- p.3-13 / Chapter Chapter 4 --- Oxygen in LCMO thin film / Chapter 4.1 --- Introduction --- p.4-1 / Chapter 4.2 --- High Pressure Oxygenation --- p.4-2 / Chapter 4.3 --- Characterization --- p.4-7 / Chapter 4.3.1 --- Determination of oxygen content --- p.4-9 / Chapter 4.3.2 --- "Tolerance factor, t" --- p.4-12 / Chapter Chapter 5 --- Oxygen isotope effect in LCMO thin film / Chapter 5.1 --- Introduction --- p.5-1 / Chapter 5.2 --- Identification on successiveness of oxygen exchange --- p.5-4 / Chapter 5.2.1 --- Sample preparation --- p.5-4 / Chapter 5.2.2 --- Oxygen annealing treatment --- p.5-4 / Chapter 5.2.3 --- Identification of 18O by SIMS --- p.5-4 / Chapter 5.3 --- Investigation of isotope effect on LCMO thin film --- p.5-7 / Chapter 5.3.1 --- Sample preparation --- p.5-7 / Chapter 5.3.2 --- Oxygen exchange --- p.5-7 / Chapter 5.3.3 --- Vacuum annealing --- p.5-9 / Chapter 5.3.4 --- Isotope effect --- p.5-9 / Chapter 5.4 --- Conclusions --- p.5-19 / Chapter Chapter 6 --- Isotope effect on the hopping activation energy / Chapter 6.1 --- Introduction --- p.6-1 / Chapter 6.1.1 --- Variable range hopping --- p.6-2 / Chapter 6.1.2 --- Small polaron models --- p.6-2 / Chapter 6.2 --- Activation energy --- p.6-4 / Chapter 6.3 --- Discussions --- p.6-9 / Chapter Chapter 7 --- Conclusions --- p.7-1

In addition, through a simple post-thermal treatment of TiO2 thin films on glass with trifluoroacetic acid (TFA), the thin films showed enhancement in the photocatalytic decomposition of acetone in air. XPS, FTIR and PL results revealed that the TFA complex bound on the surface of TiO 2 acted as an electron scavenger, and thus reduced the recombination of photo-generated electrons and holes. / Part I. TiO2 films on stainless steel prepared by dip coating in a nonionic microemulsion solution were investigated. These thin films have been shown to have much higher photocatalytic activity than films on glass substrates. XPS showed that Fe3+ and Fe 2+ ions, which were diffused from stainless steel substrate into TiO 2 films during high temperature calcination, behaved as dopants to significantly affect its photocatalytic activity of the films. The TiO2 films also exhibited excellent photo-induced hydrophilicity and antibacterial effect on the sterilization of Bacillus pumilus. / Part II. New approaches have been developed for the fabrication of visible light photocatalysts. MoS2 and WS2 were coupled to TiO2 by an in situ photo-reduction deposition method, taking advantage of the reducing power of TiO2 particles. The synthesis of CdSe sensitized TiO2 using an ultrasound-driven approach was also reported. The photocatalytic degradation of methylene blue and 4-chlorophenol was employed to evaluate their visible light photocatalytic activity. The small band gap semiconductors acting as photo-sensitizers not only extended the spectral response of TiO2 to the visible region but also improved their photocatalytic efficiency. The blue shift in the absorption onset confirmed the size-quantization of photosensitizers, which altered the conduction and valence band levels in the coupled semiconductor systems making it possible to utilize visible light in photocatalysis. (Abstract shortened by UMI.) / Two important aspects of the TiO2 photocatalysis were studied in this thesis. The first part reports on the improvement of photocatalytic performance of TiO2 films through approaches such as post-thermal treatment, surface modification and metal doping. The second part describes the fabrication of visible light TiO2 photocatalyts by means of coupling with small band gap semiconductor photo-sensitizers and non-metal doping. / Ho Wing-kei. / "May 2005." / Adviser: Jimmy C. Yu. / Source: Dissertation Abstracts International, Volume: 67-01, Section: B, page: 0294. / Thesis (Ph.D.)--Chinese University of Hong Kong, 2005. / Includes bibliographical references. / Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. / Electronic reproduction. [Ann Arbor, MI] : ProQuest Information and Learning, [200-] System requirements: Adobe Acrobat Reader. Available via World Wide Web. / Abstracts in English and Chinese. / School code: 1307.

"March 2002." / The numerals in title are subscript. / Thesis (Ph.D.)--Chinese University of Hong Kong, 2002. / Includes bibliographical references. / Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. / Mode of access: World Wide Web. / Abstracts in English and Chinese.