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The Global ETD Search service is a free service for researchers
to find electronic theses and dissertations. This service is
provided by the
Networked Digital Library of Theses and Dissertations.
Our metadata is collected from universities around the world. If you manage a university/consortium/country archive and want to be added, details can be found on the NDLTD website.
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Showing 551 to 560 of 6292 (0.047 seconds)Spelling suggestions: "subject:"his films"" "subject:"his wilms""
| 551 |
Structure and properties of sputtered ZnO transducers.Fahmy, Aly Hassan. January 1971 (has links)
No description available.
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| 552 |
Nanometer scale electrical characterization of thin dielectric films /Lee, David Timothy. January 2002 (has links)
No description available.
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| 553 |
Thermoelectrically generated chage imbalance in superconducting aluminum films /Heidel, David Frank January 1980 (has links)
No description available.
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| 554 |
Structural analyses of selected modern science-fiction films /Popovich, George Lee January 1987 (has links)
No description available.
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| 555 |
Electrical conduction in discontinuous gold films on an insulating subtrate /Dryer, Joseph Ernest January 1972 (has links)
No description available.
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| 556 |
The behavior and misfit dislocations during interdiffusion /Shinohara, Kazumitsu January 1972 (has links)
No description available.
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| 557 |
Field ion microscopic study of films of molybdenum, platinum and tantalum vapor deposited on tungsten /Boateng, Antwi January 1974 (has links)
No description available.
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| 558 |
The identification of surface interactions in thin magnetic garnet films /Yen, Peng January 1977 (has links)
No description available.
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| 559 |
Surface torques and their effects on the boundary parameters in ferromagnetic insulator thin films /Summers, Herbert Richard January 1979 (has links)
No description available.
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| 560 |
Processing of Thin Film DevicesDelpak, Ramzi 01 January 1984 (has links) (PDF)
The ability to do thin film processing has been established at UCF. This paper describes the facilities available. RF and DC sputtering was used for material deposition. The parameters for both were established experimentally, and the results are presented. Resistor and capacitor test patterns were used to test the accuracy of the system. The devices were fabricated and tested; experimental results are discussed.
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